IP Library Granted Patent US 10,483,464
Granted Patent B1
US 10,483,464 · App. 15/994,589 · Granted Nov 19, 2019

Resistive switching memory device

Inventors: Bhaswar Chakrabarti (Westmont, IL); Leonidas E. Ocola (Oswego, IL); Supratik Guha (Lemont, IL); Sushant Sonde (Lemont, IL)
Assignees: UCHICAGO ARGONNE, LLC; THE UNIVERSITY OF CHICAGO
H01L45/146H01L45/1253H01L45/1608
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 10,483,464
App. No.
15/994,589
Granted
Nov 19, 2019
Kind
B1
Abstract

Provided herein are resistive switching devices comprising a nanocomposite, an inert electrode and an active electrode. Also provided are methods for preparing and using the disclosed resistive switching devices.

Claims (35)

1. A resistive switching device comprising

a nanocomposite comprising a polymer with a metal oxide infiltrated throughout the polymer;

an inert electrode and;

an active electrode, wherein the inert electrode and the active electrode are separated by the nanocomposite, and the active electrode has an area of 1,000 μm 2 to 20,000 μm 2 .

2. The resistive switching device of claim 1 , wherein the polymer comprises poly(methyl methacrylate), polydimethyl siloxane, polyimide, bisphenol A novolac epoxy, or a mixture thereof.

3. The resistive switching device of claim 2 , wherein the polymer comprises poly(methyl methacrylate).

4. The resistive switching device of claim 1 , wherein the metal oxide comprises aluminum oxide (Al 2 O 3 ), titanium oxide (TiO 2 ), hafnium oxide (HfO 2 ), zinc oxide (ZnO), or a mixture thereof.

5. The resistive switching device of claim 4 , wherein the metal oxide comprises Al 2 O 3 .

6. The resistive switching device of claim 1 , wherein the nanocomposite has a thickness of 10 nm to 50 nm.

7. The resistive switching device of claim 6 , wherein the nanocomposite has a thickness of 10 nm.

8. The resistive switching device of claim 1 , wherein the nanocomposite comprises a porous section.

9. The resistive switching device of claim 8 , wherein the porous section of the nanocomposite comprises pore sizes of about 1 nm.

10. The resistive switching device of claim 1 , wherein the inert electrode comprises platinum, palladium, titanium, gold, or a mixture thereof.

11. The resistive switching device of claim 10 , wherein the inert electrode comprises platinum, titanium, or a combination of.

12. The resistive switching device of claim 1 , wherein the inert electrode has a thickness of 30 to 70 nm.

13. The resistive switching device of claim 1 , wherein the active electrode comprises gold or platinum and either silver or copper.

14. The resistive switching device of claim 13 , wherein the active electrode comprises a film of silver or copper with a gold layer on top.

15. The resistive switching device of claim 14 , wherein the film of silver or copper has a thickness of 5 to 20 nm and the gold layer has a thickness of 50 nm to 100 nm.

16. The resistive switching device of claim 1 , further comprising a silicon substrate under the inert electrode, optionally where the silicon substrate comprises a p-type dopant with resistivity of 1 to 10 Ω/cm.

17. The resistive switching device of claim 1 having a switching current of 500 nA to 100 μA, or an operating voltage of about 400 mV.

18. A method of preparing the resistive switching device of claim 1 comprising

(a) depositing the polymer on the first electrode by spin-coating to form a polymer layer, baking the polymer layer at a temperature of 180° C., and optionally irradiating a portion of the polymer layer with an electron beam to form a higher porosity polymer;

(b) infiltrating the polymer layer with a metal oxide using sequential infiltration synthesis via atomic layer deposition to form the nanocomposite; and

(c) depositing the second electrode on the nanocomposite by photolithography followed by electron beam evaporation of the second electrode metal or metals.

19. The method of claim 18 , wherein the second electrode is prepared by electron beam evaporation of silver or copper to a thickness of 10 nm then electron beam evaporation of gold to a thickness of 70 nm.

20. A resistive switching device comprising

a nanocomposite comprising a polymer with a metal oxide infiltrated throughout the polymer, and the nanocomposite having a porous section with pore sizes of about 1 nm;

an inert electrode and;

an active electrode,

wherein the inert electrode and the active electrode are separated by the nanocomposite.

21. A resistive switching device comprising

a nanocomposite comprising a polymer with a metal oxide infiltrated throughout the polymer;

an inert electrode and;

an active electrode comprising gold or platinum and either silver or copper,

wherein the inert electrode and the active electrode are separated by the nanocomposite.

Assignments (3)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 9, 2019
From: OCOLA, LEONIDAS
To: UCHICAGO ARGONNE, LLC
Reel/Frame 050664/0481 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 8, 2019
From: CHAKRABARTI, BHASWAR; GUHA, SUPRATIK; SONDE, SUSHANT
To: THE UNIVERSITY OF CHICAGO
Reel/Frame 050657/0124 →
CONFIRMATORY LICENSE Recorded Apr 3, 2019
From: UCHICAGO ARGONNE, LLC
To: UNITED STATES DEPARTMENT OF ENERGY
Reel/Frame 049439/0395 →