Granted Patent
B2
US 11,021,793 · App. 15/994,961 · Granted Jun 1, 2021
Group 6 transition metal-containing compositions for vapor deposition of group 6 transition metal-containing films
Inventors:
Rocio Arteaga (Tsukuba, JP); Raphael Rochat (Tsukuba, JP); Antonio Sanchez (Trsukuba, JP); Jean-Marc Girard (Versailles, FR); Nicolas Blasco (Grenoble, FR); Santiago Marques-Gonzalez (Tsukuba, JP); Clément Lansalot-Matras (Princeton, NJ); Jooho Lee (Seoul, KR); Zhiwen Wan (Plano, TX)
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Abstract
Disclosed are Group 6 transition metal-containing thin film forming precursors to deposit Group 6 transition metal-containing films on one or more substrates via vapor deposition processes.
Claims (2)
1. A Group 6 transition metal-containing film forming composition comprising a precursor, wherein the precursor is MoO 2 Cl 2 .(methyl hexanoate) 2 or MoO 2 Cl 2 .(amyl acetate) 2 .
2. A Group 6 transition metal-containing film forming composition comprising a precursor, wherein the precursor is MoO 2 Cl 2 .( n Bu-O—CH 2 —CH 2 —O- n Bu).
Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST
Recorded Nov 7, 2018
From: ARTEAGA, ROCIO; ROCHAT, RAPHAEL; SANCHEZ, ANTONIO; MARQUES-GONZALEZ, SANTIAGO; GIRARD, JEAN-MARC; BLASCO, NICOLAS; LANSALOT-MATRAS, CLEMENT; LEE, JOOHO; WAN, ZHIWEN
To: L'AIR LIQUIDE, SOCIÉTÉ ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCÉDÉS GEORGES CLAUDE
Reel/Frame 047439/0304 →
Continuity (1)