IP Library Granted Patent US 11,147,166
Granted Patent B2
US 11,147,166 · App. 16/001,973 · Granted Oct 12, 2021

Method for producing semiconductor device

Inventors: Tomoaki Shibata (Tokyo, JP); Hanako Yori (Tokyo, JP); Tomonori Minegishi (Tokyo, JP); Hidenori Abe (Tokyo, JP); Takashi Masuko (Tokyo, JP); Shunsuke Otake (Tokyo, JP)
Assignee: SHOWA DENKO MATERIALS CO., LTD.
H05K3/284G01P1/127H01L21/56H05K1/0393H05K3/28H01L21/561H01L23/3121H01L25/18H01L2924/0002H01L2924/12041H01L2924/1421H01L2924/1434H05K1/189H05K3/0052H05K2201/0108H05K2201/0129H05K2201/0133H05K2201/0154H05K2201/0158H05K2201/0162H05K2201/10098H05K2201/10151Y10T29/4913
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Quick Facts
Patent No.
US 11,147,166
App. No.
16/001,973
Granted
Oct 12, 2021
Kind
B2
Abstract

Disclosed is a method for producing a semiconductor device including a circuit board having a flexible resin layer that encapsulates a circuit component. The method may include a step of immersing a flexible substrate in an encapsulant, drying the encapsulant, and thereby encapsulating the circuit component with the encapsulant; and a step of curing the encapsulant, and thereby forming a flexible resin layer.

Claims (10)

1. A method for producing a semiconductor device including a circuit board having a flexible substrate, a circuit component mounted on the flexible substrate, and a flexible resin layer encapsulating the circuit component,

the method comprising:

a step of laminating an encapsulant on the flexible substrate, and thereby encapsulating the circuit component with the encapsulant; and

a step of curing the encapsulant, and thereby forming the flexible resin layer,

wherein the recovery factor R of the flexible resin layer is 80% or higher, the recovery factor R is calculated by the formula R=Y/X, wherein X is the strain added to a measurement sample of the flexible resin layer during a first tensile test, and Y is the position at which load begins to be applied when the measurement sample is subsequently returned to the initial position and a second tensile test is performed.

2. The method according to claim 1 , further comprising a step of cutting the circuit board.

3. The method according to claim 1 , wherein the flexible resin layer includes at least one selected from the group consisting of a polyimide resin, an acrylic resin, a silicone resin, a urethane resin, an epoxy resin, and a polyethylene glycol resin.

4. The method according to claim 1 , wherein the flexible substrate and the flexible resin layer are transparent in the visible light region.

5. The method according to claim 1 , wherein the two or more kinds of the circuit components are provided.

6. A semiconductor device obtainable by the method according to claim 1 .

Assignments (4)
CHANGE OF ADDRESS Recorded Feb 14, 2024
From: RESONAC CORPORATION
To: RESONAC CORPORATION
Reel/Frame 066599/0037 →
CHANGE OF NAME Recorded Mar 8, 2023
From: SHOWA DENKO MATERIALS CO., LTD.
To: RESONAC CORPORATION
Reel/Frame 062992/0805 →
CHANGE OF NAME Recorded Jun 15, 2021
From: HITACHI CHEMICAL COMPANY, LTD.
To: SHOWA DENKO MATERIALS CO., LTD.
Reel/Frame 056595/0571 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 7, 2018
From: SHIBATA, TOMOAKI; YORI, HANAKO; MINEGISHI, TOMONORI; ABE, HIDENORI; MASUKO, TAKASHI; OTAKE, SHUNSUKE
To: HITACHI CHEMICAL COMPANY, LTD.
Reel/Frame 046009/0175 →