System, method and apparatus for polarization control
A polarization control device includes a first wave plate having a first surface profile and a second wave plate having a second surface profile complementary to the first surface profile. The optical axis of the first wave plate is orthogonal to the optical axis of the second wave plate. The first wave plate and the second wave plate are positioned to align the first surface profile with the second surface profile and maintain a constant thickness across the polarization control device. The first wave plate and the second wave plate may control polarization rotation as a continuous function of transverse position across a pupil plane of an optical system. The first wave plate and the second wave plate are separated by a sufficiently small distance so as to limit wave front distortion below a selected level.
1. An optical system for controlling point spread function comprising:
an illumination source configured to illuminate a surface of a sample;
a set of collection optics configured to collect illumination from the surface of a sample;
a detector including a plurality of pixels; and
a point spread function control device positioned substantially at a pupil plane of the optical system, the point spread function control device including:
a first wave plate having a first surface profile;
a second wave plate having a second surface profile complementary to the first surface profile,
the first wave plate and the second wave plate positioned so as to substantially align the first surface profile with the second surface profile and maintain a constant thickness of an assembly of the first wave plate and second wave plate,
the first wave plate and the second wave plate being configured to control at least one of polarization rotation and degree of coherence as a continuous function of transverse position across the pupil plane in order modify the point spread function of illumination in order to enhance an amount of energy received by one or more pixels of the detector.
2. The system of claim 1 , wherein the first wave plate and the second wave plate being configured to control at least one of polarization rotation and degree of coherence as a continuous function of transverse position across the pupil plane in order to split illumination into a first PSF and at least a second PSF in an image plane of the detector of illumination in order to enhance an amount of energy received by one or more pixels of the detector.
3. The system of claim 2 , wherein the detector adds the first PSF and the second PSF incoherently.
4. The system of claim 2 , wherein the detector adds the first PSF and the second PSF coherently.
5. The system of claim 1 , wherein the optical axis of the first wave plate is substantially orthogonal to the optical axis of the second wave plate.
6. The system of claim 1 , wherein the set of collection optics includes one or more refractive optical elements.
7. The system of claim 6 , wherein the one or more refractive optical elements includes a catadioptric objective.
8. The system of claim 1 , wherein the optical system is an inspection system.
9. The system of claim 1 , wherein the optical system is a high NA ultraviolet inspection system.
10. The system of claim 1 , wherein at least one of the first wave plate and the second wave plate is formed from an optical crystalline material.
11. The system of claim 10 , wherein the optical crystalline material comprises:
at least one of crystalline quartz and magnesium fluoride.
12. The system of claim 1 , wherein at least one of the first wave plate and the second wave plate is formed with at least one of magnetorheological finishing technique, an etching technique and an ion-beam machining technique.
13. The system of claim 1 , further comprising:
a polarization control device.
14. A point spread function control system comprising:
an illumination source configured to illuminate a surface of a sample;
a set of collection optics configured to collect illumination from the surface of a sample;
a detector including a plurality of pixels; and
a point spread function control device positioned substantially at a pupil plane of the optical system, the point spread function control device including:
a first wave plate having a first surface profile;
a second wave plate having a second surface profile complementary to the first surface profile,
the first wave plate and the second wave plate positioned so as to substantially align the first surface profile with the second surface profile and maintain a constant thickness of an assembly of the first wave plate and second wave plate,
the first wave plate and the second wave plate being configured to impart an optical delay as a continuous function of transverse position across a pupil plane of an optical system in order modify the point spread function of illumination in order to enhance an amount of energy received by one or more pixels of the detector.
15. The system of claim 14 , wherein the first wave plate and the second wave plate are configured to impart an optical delay as a continuous function of transverse position across a pupil plane of an optical system in order to split illumination into a first PSF and at least a second PSF in an image plane of the detector of illumination in order to enhance an amount of energy received by one or more pixels of the detector.
16. The system of claim 15 , wherein the detector adds the first PSF and the second PSF incoherently.
17. The system of claim 15 , wherein the detector adds the first PSF and the second PSF coherently.
18. The system of claim 14 , wherein the optical axis of the first wave plate is substantially orthogonal to the optical axis of the second wave plate.
19. The system of claim 14 , wherein the set of collection optics includes one or more refractive optical elements.
20. The system of claim 19 , wherein the one or more refractive optical elements includes a catadioptric objective.
21. The system of claim 14 , wherein the optical system is an inspection system.
22. The system of claim 14 , wherein the optical system is a high NA ultraviolet inspection system.
23. The system of claim 14 , wherein at least one of the first wave plate and the second wave plate is formed from an optical crystalline material.
24. The system of claim 23 , wherein the optical crystalline material comprises:
at least one of crystalline quartz and magnesium fluoride.
25. The system of claim 14 , wherein at least one of the first wave plate and the second wave plate is formed with at least one of magnetorheological finishing technique, an etching technique and an ion-beam machining technique.
26. The system of claim 14 , further comprising:
a polarization control device.