Substrate support assembly with deposited surface features
An electrostatic chuck comprises a ceramic body comprising an embedded electrode and a first ceramic coating on a surface of the ceramic body, wherein the first ceramic coating fills pores in the ceramic body. The electrostatic chuck further comprises a second ceramic coating on the first ceramic coating and a plurality of elliptical mesas on the second ceramic coating, the plurality of elliptical mesas having rounded edges.
1. An electrostatic chuck comprising:
a ceramic body comprising an embedded electrode;
a first ceramic coating on a surface of the ceramic body, wherein the first ceramic coating fills pores in the ceramic body;
a second ceramic coating on the first ceramic coating; and
a plurality of elliptical mesas on the second ceramic coating, the plurality of elliptical mesas having rounded edges.
2. The electrostatic chuck of claim 1 , wherein the ceramic body comprises a material from the group consisting of AlN, TiO, TiN, SiC and Al 2 O 3 .
3. The electrostatic chuck of claim 1 , wherein the second ceramic coating comprises a material from the group consisting of Al 2 O 3 , AlN, Y 2 O 3 , Y 3 Al 5 O 12 (YAG), and AlON.
4. The electrostatic chuck of claim 1 , wherein the second ceramic coating comprises an amorphous ceramic comprising Yttrium, Aluminum and Oxygen, wherein at least 8% of the amorphous ceramic is Yttrium.
5. The electrostatic chuck of claim 1 , wherein the second ceramic coating comprises a rare earth oxide.
6. The electrostatic chuck of claim 5 , wherein the rare earth oxide is Y 2 O 3 .
7. The electrostatic chuck of claim 1 , wherein the plurality of elliptical mesas each comprises a material from the group consisting of Al 2 O 3 , AlN, Y 2 O 3 , Y 3 Al 5 O 12 (YAG), and AlON.
8. The electrostatic chuck of claim 1 , wherein the plurality of elliptical mesas comprises a plurality of circular mesas.
9. The electrostatic chuck of claim 8 , wherein the plurality of circular mesas have a diameter of about 0.5-2.0 mm and a thickness of about 2-20 microns.
10. The electrostatic chuck of claim 1 , wherein the second ceramic coating has a thickness of about 5-30 microns.
11. The electrostatic chuck of claim 1 , wherein the first ceramic coating comprises AlN or Al 2 O 3 .
12. The electrostatic chuck of claim 1 , wherein the first ceramic coating has an average surface roughness of about 4-10 micro-inches.
13. The electrostatic chuck of claim 1 , wherein the plurality of elliptical mesas are deposited mesas that lack sharp edges.
14. The electrostatic chuck of claim 1 , further comprising a deposited ring on the second ceramic coating at a perimeter of the body, wherein the deposited ring comprises a material selected from the group consisting of Al 2 O 3 , AlN, Y 2 O 3 , Y 3 Al 5 O 12 (YAG), and AlON.
15. An electrostatic chuck comprising:
a ceramic body comprising an embedded electrode;
a first ceramic coating on a surface of the ceramic body, wherein the first ceramic coating fills pores in the ceramic body;
a plurality of elliptical mesas on the first ceramic coating, the plurality of elliptical mesas having rounded edges; and
a second ceramic coating that covers the first ceramic coating and the plurality of elliptical mesas.
16. The electrostatic chuck of claim 15 , wherein:
the first ceramic coating comprises a first material selected from the group consisting of AlN and Al 2 O 3 ; and
the second ceramic coating comprises a second material selected from the group consisting of Al 2 O 3 , AlN, Y 2 O 3 , Y 3 Al 5 O 12 (YAG), and AlON.
17. The electrostatic chuck of claim 15 , wherein the plurality of elliptical mesas each comprise the first material or the second material.
18. A circular mask comprising:
a body; and
a plurality of elliptical through holes in the body, the plurality of elliptical through holes having an aspect ratio of approximately 1:2 to approximately 2:1, wherein at least one elliptical hole of the plurality of elliptical through holes comprises a flared top end and a flared bottom end, wherein the flared top end is to funnel particles through the at least one elliptical hole onto an electrostatic chuck to form an elliptical mesa on the electrostatic chuck, wherein the flared bottom end prevents the elliptical mesa from contacting the mask.
19. The circular mask of claim 18 , wherein the at least one elliptical hole is a circular hole having a diameter of approximately 0.5-2.0 mm and a thickness of approximately 1-3 mm.
20. The circular mask of claim 18 , wherein the flared top end and the flared bottom end each have a first diameter that is approximately 20-70% greater than a second diameter at a narrowest region of the at least one elliptical hole.