Chemically-sensitive field effect transistors, systems, and methods for manufacturing and using the same
View Patent ↗This invention concerns Chemically-sensitive Field Effect Transistors (ChemFETs) that are preferably fabricated using semiconductor fabrication methods on a semiconductor wafer, and in preferred embodiments, on top of an integrated circuit structure made using semiconductor fabrication methods. The instant ChemFETs typically comprise a conductive source, a conductive drain, and a channel composed of a one-dimensional ( 1 D) or two-dimensional ( 2 D) transistor nanomaterial, which channel extends from the source to the drain and is fabricated using semiconductor fabrication techniques on top of a wafer. The ChemFET also includes a gate, often the gate voltage is provided through a fluid or solution proximate the ChemFET. Such ChemFETs, preferably configured in independently addressable arrays, may be employed to detect a presence and/or concentration changes of various analyte types in chemical and/or biological samples, including nucleic acid hybridization and/or sequencing reactions.
1. A chemically-sensitive field effect transistor having a multi-layered structure, comprising:
a substrate layer having an extended body;
a first and second insulating layer positioned above the extended body of the substrate layer, the second insulating layer being positioned above the first insulating layer;
a source electrode and a drain electrode each having one or more surfaces, the one or more surfaces defining a boundary between an interior portion and an exterior portion of each electrode, at least a portion of the one or more surfaces of the source and drain electrodes being disposed at least partially within the first insulating layer, the source electrode being separated from the drain electrode by a distance;
a graphene layer positioned between the first and second insulating layers and contacting at least the exterior portion of the one or more surfaces of each of the source and drain electrodes, the graphene layer extending a length a first exterior portion of the source electrode to a first portion of the drain electrode thereby forming a channel between the source and drain electrodes; and
one or more surface structures forming a gate that overlaps at least a portion of the source and the drain electrodes, the one or more surface structures being at least partially positioned in the second insulating layer.
2. The chemically-sensitive field effect transistor according to claim 1 , wherein the multi-layered structure is configured so as to shift an I−V curve or an I−Vg curve in response to a chemical reaction occurring within the well of the chemically-sensitive field effect transistor.
3. The chemically-sensitive field effect transistor according to claim 2 , wherein the substrate layer comprises silicon, and the first insulating layer comprises silicon di-oxide.
4. The chemically-sensitive field effect transistor according to claim 3 , wherein the first and second insulating layers comprise a single layer.
5. The chemically-sensitive field effect transistor according to claim 2 , wherein a length of the channel from the source to the drain ranges from 0.05 micron to 3 microns, and a width of the channel ranges from 0.05 micron to 2 microns.
6. The chemically-sensitive field effect transistor according to claim 2 , wherein one or more of the first and second insulating layers comprise an analyte-sensitive dielectric layer.
7. The chemically-sensitive field effect transistor according to claim 6 , wherein the analyte-sensitive dielectric layer comprises an oxide layer.
8. The chemically-sensitive field effect transistor according to claim 7 , wherein the analyte-sensitive dielectric layer is comprised of one of an aluminum oxide, a silicon dioxide, a hafnium dioxide, a zirconium dioxide, a lanthanum oxide, a tantalum oxide, a titanium oxide, an iron oxide, and a yttrium oxide.
9. The chemically-sensitive field effect transistor according to claim 8 , wherein the second insulating layer is composed of a polyimide, BCB, silicon oxide, a silicon nitride, a silicon oxynitride or a silicon carbide.
10. The chemically-sensitive field effect transistor according to claim 6 , further comprising a well structure, the well structure being positioned in one or more of the first and second insulating layers and having side walls and a bottom defining a reaction chamber, the bottom being positioned proximate at least a portion of the graphene layer of the channel, the reaction chamber being configured for the performance of a biological reaction.
11. The chemically-sensitive field effect transistor according to claim 10 , wherein the biological reaction involves a biological material, wherein the biological material comprises one or more of a nucleotide, a nucleic acid, a protein, or other biological molecule.
12. A chemically-sensitive field effect transistor having a multi-layered structure, comprising:
a substrate layer having an extended body;
a first drain electrode and a first source electrode each having a top surface and a bottom surface, the top surface separated from the bottom surface by opposing outer and inner side portions, each pair of opposed side portions and each of the bottom surfaces of the first drain and first source electrodes being at least partially disposed within the substrate layer, the first drain electrode being separated from the first source electrode by a first distance;
a first insulating layer positioned above the extended body of the substrate layer;
a first structure positioned at least partially in the first insulating layer and extending at least the first length so as to form a gate between the first drain and first source electrodes, the gate contacting at least a portion of each of the first drain and first source electrodes;
a second source electrode and a second drain electrode each having a top surface and a bottom surface, the top surface separated from the bottom surface by opposing outer and inner side portions, each of the opposed side portions and each of the bottom surfaces of the second source and second drain electrodes being disposed at least partially within the first insulating layer, the second source electrode being separated from the second drain electrode by a second distance;
a second insulating layer positioned above the first insulating layer;
a graphene layer positioned between the first and second insulating layers and extending a length from at least the inner side portion of the second source electrode to the inner side portion of the second drain electrode thereby forming a channel between the source and drain electrodes, the graphene layer contacting the top surface of the second source and second drain electrodes and not extending beyond either outer side portion of the source and drain electrodes; and
one or more second structures forming a second gate that overlaps at least a portion of the second source and the second drain electrodes.
13. The chemically-sensitive field effect transistor according to claim 12 , wherein the multi-layered structure is configured so as to shift an I−V curve or an I−Vg curve in response to a chemical reaction occurring within the chamber of the chemically-sensitive field effect transistor.
14. The chemically-sensitive field effect transistor according to claim 13 , further comprising a well structure, the well structure being positioned in one or more of the first and second insulating layers and having side walls and a bottom defining a reaction chamber, the bottom being positioned proximate at least a portion of the graphene layer of the channel, the reaction chamber being configured for the performance of a biological reaction.
15. The chemically-sensitive field effect transistor according to claim 14 , wherein the biological reaction involves a biological material, wherein the biological material comprises one or more of a nucleotide, a nucleic acid, a protein, or other biological molecule.
16. The chemically-sensitive field effect transistor according to claim 15 , wherein one or more of the first and second insulating layers comprise an analyte-sensitive dielectric layer.
17. A chemically-sensitive field effect transistor having a multi-layered structure, comprising:
a substrate layer having an extended body;
a first insulating layer positioned above the extended body of the substrate layer; and
a first and a second pair of source and drain electrodes being at least partially positioned in the first insulating layer, each source and drain electrode of each pair being separated from one another by a distance, the first pair of source and drain electrodes being coupled together by a first gate structure, and the second pair of source and drain electrodes being coupled together by a channel, the channel being formed of a graphene layer, the graphene layer contacting a surface of each of the second pair of source and drain electrodes.
18. The chemically-sensitive field effect transistor according to claim 17 , wherein the multi-layered structure is configured so as to shift an I−V curve or an I−Vg curve in response to a chemical reaction occurring within the well of the chemically-sensitive field effect transistor.
19. The chemically-sensitive field effect transistor according to claim 18 , further comprising a well structure, the well structure being positioned in one or more of the first and second insulating layers and having side walls and a bottom defining a reaction chamber, the bottom being positioned proximate at least a portion of the graphene layer of the channel, the reaction chamber being configured for the performance of a biological reaction.
20. The chemically-sensitive field effect transistor according to claim 19 , wherein the biological reaction involves a biological material, wherein the biological material comprises one or more of a nucleotide, a nucleic acid, a protein, or other biological molecule.