Quantum dot devices with fins and partially wrapped gates
Disclosed herein are quantum dot devices, as well as related computing devices and methods. For example, in some embodiments, a quantum dot device may include: a base; a fin extending away from the base, wherein the fin has a first side face and a second side face, and the fin includes a quantum well layer; and a gate above the fin, wherein the gate extends down along the first side face.
1. A quantum dot device, comprising:
a base;
a first fin extending away from the base, wherein the first fin has a first side face and a second side face, and the first fin includes a quantum well layer;
a first gate above the first fin, wherein the first gate extends down along the first side face of the first fin by a first distance and the first gate extends down along the second side face of the first fin by a second distance, wherein the first distance is greater than 20 nanometers and the second distance is less than 5 nanometers;
a second fin extending away from the base, wherein the second fin has a first side face and a second side face, the second fin includes a quantum well layer, and the second side face of the second fin is between the second side face of the first fin and the first side face of the second fin; and
a second gate above the second fin, wherein the second gate extends down along the first side face of the second fin by a third distance and the second gate extends down along the second side face of the second fin by a fourth distance, wherein the third distance is greater than 20 nanometers and the fourth distance is less than 5 nanometers.
2. The quantum dot device of claim 1 , wherein the first distance is greater than 40 nanometers.
3. The quantum dot device of claim 1 , wherein the first gate does not extend down along the second side face of the first fin.
4. The quantum dot device of claim 1 , further comprising:
an insulating material between the first fin and the second fin.
5. The quantum dot device of claim 1 , wherein the third distance is greater than 40 nanometers.
6. The quantum dot device of claim 1 , wherein the second gate does not extend down along the second side face of the second fin.
7. The quantum dot device of claim 1 , wherein the quantum well layer includes silicon or germanium.
8. The quantum dot device of claim 1 , wherein the first gate includes a gate metal and a gate dielectric, and the gate dielectric is between the gate metal and the first fin.
9. The quantum dot device of claim 1 , wherein the first gate is one of a plurality of first gates above the first fin, and individual first gates of the plurality of first gates extend down along the first side face of the first fin.
10. The quantum dot device of claim 9 , wherein adjacent first gates of the plurality of first gates have a spacer material therebetween.
11. The quantum dot device of claim 1 , wherein the first fin has a tapered shape that is widest proximate to the base.
12. A quantum computing device, comprising:
a quantum processing device, wherein the quantum processing device includes a fin, the fin includes a quantum well layer, the quantum processing device includes a plurality of gates above the fin to control quantum dot formation in the fin, individual gates of the plurality of gates extend down a first side face of the fin at least to a depth of the quantum well layer in the fin, and the individual gates of the plurality of gates do not extend down a second side face of the fin at least to the depth of the quantum well layer in the fin; and
a non-quantum processing device, coupled to the quantum processing device, to control voltages applied to the plurality of gates.
13. The quantum computing device of claim 12 , further comprising:
a memory device to store data generated by quantum dots formed in the quantum well layer during operation of the quantum processing device.