Adjustable bilayer capacitance structure for biomedical devices

1. A nanopore sequencing device, comprising:

a working electrode; and

a dielectric layer, wherein a portion of the dielectric layer is disposed above and covering a portion of the working electrode, and wherein the dielectric layer forms a surrounding side wall of a well, wherein the well has an opening above an uncovered portion of the working electrode; and

wherein the dielectric layer comprises a top surface, and wherein a membrane may form on top of the top surface and span across the opening of the well above the uncovered portion of the working electrode; and

wherein a base surface area of the working electrode is greater than a base surface area of the opening above the uncovered portion of the working electrode.

2. The nanopore sequencing device of claim 1 , wherein the dielectric layer comprises a first dielectric layer and a second dielectric layer, and wherein the first dielectric layer corresponds to a portion of the dielectric layer disposed horizontally adjacent to the working electrode and the second dielectric layer corresponds to the portion of the dielectric layer disposed above and covering a portion of the working electrode.

3. The nanopore sequencing device of claim 1 , wherein the base surface area of the working electrode and the base surface area of the opening are selected based on a ratio of a capacitance associated with the working electrode and a capacitance associated with a membrane that spans across the opening.

4. The nanopore sequencing device of claim 1 , wherein the base surface area of the working electrode is selected based on a desired impedance associated with the working electrode.

5. The nanopore sequencing device of claim 4 , wherein the desired impedance is substantially equivalent to an alternating current (AC) short circuit at an operating frequency.

6. The nanopore sequencing device of claim 1 , wherein the base surface area of the working electrode, the thickness of the working electrode, and the surface area per volume of the working electrode are selected based on a desired capacitance associated with the working electrode.

7. The nanopore sequencing device of claim 1 , wherein the base surface area of the opening is selected based on a desired RC time constant, and wherein the desired RC time constant comprises a resistance associated with a nanopore inserted in a membrane that spans across the opening and a capacitance associated with the membrane that spans across the opening.

8. The nanopore sequencing device of claim 1 , further comprising a hydrophobic layer formed above the top surface of the dielectric layer and surrounding the opening, wherein the hydrophobic layer facilitates formation of a lipid monolayer on the hydrophobic layer and facilitates formation of a lipid bilayer that spans across the opening.

9. The nanopore sequencing device of claim 8 , wherein the hydrophobic layer is formed by silanization.

10. The nanopore sequencing device of claim 1 , wherein the dielectric layer is formed using one of the following: glass, oxides, and nitrides.

11. The method of constructing a nanopore sequencing device, comprising:

constructing a working electrode; and

constructing a dielectric layer, wherein a portion of the dielectric layer is disposed above and covering a portion of the working electrode, and wherein the dielectric layer forms a surrounding side wall of a well, wherein the well has an opening above an uncovered portion of the working electrode; and

wherein the dielectric layer comprises a top surface, and wherein a membrane may form on top of the top surface and span across the opening of the well above the uncovered portion of the working electrode; and

wherein a base surface area of the working electrode is greater than a base surface area of the opening above the uncovered portion of the working electrode.

12. The method of claim 11 , wherein the dielectric layer comprises a first dielectric layer and a second dielectric layer, and wherein the first dielectric layer corresponds to a portion of the dielectric layer disposed horizontally adjacent to the working electrode and the second dielectric layer corresponds to the portion of the dielectric layer disposed above and covering a portion of the working electrode.

13. The method of claim 11 , further comprising: selecting the base surface area of the working electrode and the base surface area of the opening based on a ratio of a capacitance associated with the working electrode and a capacitance associated with a membrane that spans across the opening.

14. The method of claim 11 , further comprising selecting the base surface area of the working electrode based on a desired impedance associated with the working electrode.

15. The method of claim 14 , wherein the desired impedance is substantially equivalent to an alternating current (AC) short circuit at an operating frequency.

16. The method of claim 11 , further comprising selecting the base surface area of the working electrode, the thickness of the working electrode, and the surface area per volume of the working electrode based on a desired capacitance associated with the working electrode.

17. The method of claim 11 , further comprising selecting the base surface area of the opening based on a desired RC time constant, and wherein the desired RC time constant comprises a resistance associated with a nanopore inserted in a membrane that spans across the opening and a capacitance associated with the membrane that spans across the opening.

18. The method of claim 11 , further comprising forming a hydrophobic layer above the top surface of the dielectric layer and surrounding the opening, the hydrophobic layer facilitates formation of a lipid monolayer on the hydrophobic layer and facilitates formation of a lipid bilayer that spans across the opening.

19. The method of claim 18 , wherein the hydrophobic layer is formed by silanization.

20. The method of claim 11 , wherein the dielectric layer is formed using one of the following: glass, oxides, and nitrides.