IP Library › Granted Patent US 10,342,985
Granted Patent B2
US 10,342,985 · App. 16/022,201 · Granted Jul 9, 2019

Treatment apparatus using high frequency waves and method for controlling same

Inventor: Kwang Chon Ko (Gyeonggi-do, KR)
Assignee: Lutronic Corporation
A61N1/40A61B5/0531A61B5/6848A61B18/1477A61H39/002A61H99/00A61N1/06A61N1/328A61B2018/0047A61B2018/00875A61B2018/143A61B2562/046A61H2039/005A61H2201/0157A61H2230/655
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Quick Facts
Patent No.
US 10,342,985
App. No.
16/022,201
Granted
Jul 9, 2019
Kind
B2
Abstract

The present invention relates to a treatment apparatus using high frequency waves, and to a method for controlling same. The treatment apparatus using high frequency waves comprises: a high frequency wave generating unit; a plurality of needles for providing, into the skin of a user, high frequency energy transferred from the high frequency wave generating unit; and a driving unit for inserting the plurality of needles into the skin of the user, wherein the apparatus further comprises a control unit for controlling the driving unit such that the plurality of needles are inserted into a first target point within the skin and then move to a second target point.

Claims (23)

1. A treatment method using RF treatment apparatus, the treatment method comprising:

inserting a plurality of needles into a subcutaneous area; and

providing RF energy to multiple target points of the subcutaneous area located at least two different depths through ends of the plurality of needles so as to treat the subcutaneous area three-dimensionally.

2. The treatment method of claim 1 , wherein some part of the multiple target points is located at a first depth of the subcutaneous area and other part of the multiple target points is located at a second depth of the subcutaneous area, wherein the first depth is different from the first depth.

3. The treatment method of claim 2 , wherein the first depth is deeper by not less than 0.5 mm and not more than 3 mm than the second depth.

4. The treatment method of claim 1 , wherein the step for providing RF energy to multiple target points comprises,

providing RF energy to a first depth of the subcutaneous area through the ends of the plurality of needles;

locating the ends of the plurality of needles to a second depth of the subcutaneous area, wherein the second depth is different from the first depth; and

providing RF energy to the second depth of the subcutaneous area through the ends of the plurality of needles.

5. The treatment method of claim 4 , wherein during the step for providing RF energy to the first depth or the step for providing RF energy to the second depth, an impedance of a portion where the ends of the plurality of the needle are located is measure and parameter of RF energy is controlled based on the measured impedance.

6. The treatment method of claim 4 , wherein during the step for providing RF energy to the first depth, an impedance of the first depth is measured and at least one parameter of RF energy is controlled based on the measured impedance of the first depth, and

wherein during the step for providing RF energy to the second depth, an impedance of the second depth is measured and at least one parameter of RF energy is controlled based on the measured impedance of the second depth.

7. A treatment method using RF treatment apparatus, the treatment method comprising:

inserting a plurality of needles into a subcutaneous area having multiple layers of tissue; and

providing RF energy to the multiple layers of the subcutaneous area located at least two different depths through ends of the plurality of needles so as to treat the subcutaneous area three-dimensionally.

8. The treatment method of claim 7 , wherein one layer of the multiple layers is located at a first depth of the subcutaneous area and other layer of the multiple layers is located at a second depth of the subcutaneous area, wherein the first depth is different from the first depth.

9. The treatment method of claim 8 , wherein the first depth is deeper by not less than 0.5 mm and not more than 3 mm than the second depth.

10. The treatment method of claim 7 , wherein the step for providing RF energy to the multiple layers comprises,

providing RF energy to a first depth of the subcutaneous area through the ends of the plurality of needles;

locating the ends of the plurality of needles to a second depth of the subcutaneous area, wherein the second depth is different from the first depth; and

providing RF energy to the second depth of the subcutaneous area through the ends of the plurality of needles.

11. The treatment method of claim 10 , wherein during the step for providing RF energy to the first depth, an impedance of the first depth is measured and at least one parameter of RF energy is controlled based on the measured impedance of the first depth, and

wherein during the step for providing RF energy to the second depth, an impedance of the second depth is measured and at least one parameter of RF energy is controlled based on the measured impedance of the second depth.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 4, 2018
From: KO, KWANG CHON
To: LUTRONIC CORPORATION
Reel/Frame 047664/0874 →
Priority Claims (1)
KR 10-2011-0074202 · Jul 26, 2011 · national
Continuity (4)
Continuation 15664522 · Jul 31, 2017
Continuation 15167467 · May 27, 2016
Continuation 14234864
Related Publication 20180304089A1 · Oct 25, 2018
Cited By (2)
US 12,465,752 US 12,722,019