HEXAVALENT CHROMIUM FREE ETCH MANGANESE VACUUM EVAPORATION SYSTEM
Methods and systems for removing water from a manganese-based etchant bath are disclosed. Water is removed from the manganese-based etchant bath by transferring a portion of the manganese-based etchant bath to a vacuum evaporator for processing and transferring the concentrated portion of the manganese-based etchant bath back to the manganese-based etchant bath.
1 . A method for removing water from a source of manganese ions, the method comprising:
directing at least a portion of the source of manganese ions through a conduit, wherein the conduit comprises a filter for filtering undissolved particles;
concentrating the portion of the source of manganese ions with a vacuum evaporator;
returning the concentrated portion to a manganese-based etchant bath.
2 . The method according to claim 1 , wherein the concentrated portion comprises an acid.
3 . The method according to claim 2 , further comprising purifying the acid.
4 . The method according to claim 1 , wherein the vacuum evaporator further comprises a heat source.
5 . The method according to claim 1 , wherein the manganese-based etchant bath is configured to etch a substrate.
6 . The method according to claim 1 , wherein a second conduit returns the concentrated portion to the manganese-based etchant bath.
7 . The method according to claim 1 , wherein the first conduit further comprises a one-way valve for preventing the portion of the source of manganese ions from returning to the source of manganese ions via the conduit.
8 . A method for removing water from a manganese-based etchant bath, the method comprising:
directing at least a portion of a manganese-based etchant bath through a conduit, wherein the conduit comprises a one-way valve for prohibiting the portion of the manganese-based etchant bath from returning to the manganese-based etchant bath via the conduit;
concentrating the portion of the manganese-based etchant bath with a vacuum evaporator;
returning the concentrated portion to the manganese-based etchant bath.
9 . The method according to claim 8 , wherein the conduit further comprises further comprises a filter for filtering undissolved particles.
10 . The method according to claim 8 , wherein the concentrated portion comprises an acid.
11 . The method according to claim 10 , the acid is purified.
12 . The method according to claim 8 , wherein the vacuum evaporator further comprises a heat source.
13 . The method according to claim 8 , wherein the manganese-based etchant bath is configured to etch a substrate.
14 . The method according to claim 8 , wherein a second conduit returns the concentrated portion to the manganese-based etchant bath.
15 . A system for removing water from a manganese-based etchant bath, the system comprising:
a manganese-based etchant bath;
a first conduit connected at a first end the manganese-based etchant bath; and at a second end a vacuum evaporator, wherein the first conduit comprises a filter for filtering undissolved particulates and allows at least a portion of the manganese-based etchant bath to flow through the first conduit into the vacuum evaporator;
a vacuum evaporator for evaporating water from and concentrating the portion of the manganese-based etchant bath that flows through the first conduit; and
a second conduit for directing the concentrated portion from the vacuum evaporator to the manganese-based etchant bath.
16 . The system according to claim 15 , wherein the vacuum evaporator further comprises a heating source for heating the contents of the vacuum evaporator.
17 . The system according to claim 15 , wherein the manganese-based etchant bath is configured to etch a substrate.
18 . The system according to claim 15 , concentrated portion comprises an acid.
19 . The system according to claim 15 , wherein the first conduit is configured for one-way passage from the manganese-based etchant bath to the vacuum evaporator.