Ceramic hybrid insulator plate
The present disclosure generally relates to an electrostatic chuck for processing substrates. The electrostatic chuck includes a facilities plate and an insulator disposed between a cooling base and a ground plate. A support body is coupled to the cooling base for supporting a substrate thereon. A ring is configured to surround the insulator. The ring is formed from a material that is resistant to degradation from exposure to a manufacturing process. The ring optionally includes an extension configured to surround the facilities plate.
1. A process chamber comprising:
a body having a sidewall and a bottom;
a lid coupled to the body defining a process volume therein; and
an electrostatic chuck disposed in the process volume, the electrostatic chuck comprising:
a ground plate;
an insulator disposed on the ground plate;
a facilities plate disposed on the insulator;
a cooling base disposed on the facilities plate;
a support body disposed on the cooling base, the support body having an electrode therein; and
a ring disposed surrounding the entire insulator, wherein the ring is formed from a ceramic material, wherein the ring or an annular portion of the ring has a thickness that is substantially equal to a thickness of the insulator.
2. The process chamber of claim 1 , wherein the ring has an internal surface defining an opening through the ring, wherein the insulator is disposed in the opening.
3. The process chamber of claim 1 , wherein the ring comprises the annular portion and an extension.
4. The process chamber of claim 3 , wherein the insulator is surrounded by the annular portion and the facilities plate is surrounded by the extension.
5. The process chamber of claim 1 , wherein the insulator is formed from a polymeric material.
6. The process chamber of claim 1 , wherein the ring is formed from aluminum oxide or yttrium oxide.
7. An electrostatic chuck comprising:
a ground plate;
an insulator disposed on the ground plate;
a facilities plate disposed on the insulator;
a cooling base disposed on the facilities plate;
a support body disposed on the cooling base, the support body having an electrode therein; and
a ring disposed surrounding the entire insulator, wherein the ring is formed from a ceramic material and wherein a thickness of the ring or an annular portion of the ring is substantially equal to a thickness of the insulator.
8. The electrostatic chuck of claim 7 , further comprising:
a first seal disposed between the ring the facilities plate; and
a second seal disposed between the ring and the ground plate.
9. The electrostatic chuck of claim 8 , wherein the first seal, the second seal, and the ring isolate the insulator disposed within the ring.
10. The electrostatic chuck of claim 7 , wherein the ring has a radially inward surface defining an opening therethrough, and wherein the insulator is disposed within the opening.
11. The electrostatic chuck of claim 7 , wherein the insulator is formed from a polymeric material.
12. The electrostatic chuck of claim 7 , wherein the ring is formed from aluminum oxide or yttrium oxide.
13. An electrostatic chuck comprising:
a ground plate;
an insulator disposed on the ground plate;
a facilities plate disposed on the insulator;
a cooling base disposed on the facilities plate;
a support body disposed on the cooling base, the support body having an electrode therein; and
a ring comprising:
an annular portion surrounding the entire insulator; and
an extension extending from the annular portion, wherein the extension surrounds the facilities plate and a thickness of the annular portion is substantially equal to the thickness of the insulator.
14. The electrostatic chuck of claim 13 , further comprising:
a first seal disposed between the ring and the cooling base; and
a second seal disposed between the ring and the ground plate.
15. The electrostatic chuck of claim 14 , wherein the first seal, the second seal, and the ring isolate the insulator and the facilities plate disposed within the ring.
16. The electrostatic chuck of claim 13 , wherein the annular portion has a radially inward surface defining an opening therethrough, and wherein the insulator is disposed within the opening.
17. The electrostatic chuck of claim 13 , wherein the extension has a radially inward surface configured to surround the facilities plate.
18. The electrostatic chuck of claim 17 , wherein a shoulder is formed between the annular portion and the extension, wherein a portion of the facilities plate is disposed on the shoulder.
19. The electrostatic chuck of claim 13 , wherein the insulator is formed from a polymeric material.
20. The electrostatic chuck of claim 13 , wherein the ring is formed from aluminum oxide or yttrium oxide.