IP Library Granted Patent US 10,854,665
Granted Patent B2
US 10,854,665 · App. 16/038,422 · Granted Dec 1, 2020

Semiconductor device and method of forming curved image sensor region robust against buckling

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Quick Facts
Patent No.
US 10,854,665
App. No.
16/038,422
Granted
Dec 1, 2020
Kind
B2
Abstract

A semiconductor wafer has a plurality of non-rectangular semiconductor die with an image sensor region. The non-rectangular semiconductor die has a circular, elliptical, and shape with non-linear side edges form factor. The semiconductor wafer is singulated with plasma etching to separate the non-rectangular semiconductor die. A curved surface is formed in the image sensor region of the non-rectangular semiconductor die. The non-rectangular form factor effectively removes a portion of the base substrate material in a peripheral region of the semiconductor die to reduce stress concentration areas and neutralize buckling in the curved surface of the image sensor region. A plurality of openings or perforations can be formed in a peripheral region of a rectangular or non-rectangular semiconductor die to reduce stress concentration areas and neutralize buckling. A second semiconductor die can be formed in an area of the semiconductor wafer between the non-rectangular semiconductor die.

Claims (28)

1. A semiconductor die, comprising:

a base substrate material including a side edge, wherein the side edge is non-linear, the base substrate material comprising a first side and a second side with a thickness between the first side and the second side, the base substrate material forming a surface;

an opening or perforation formed through the thickness in the base substrate material adjacent to the side edge;

wherein the surface of the base substrate material forms a curved surface out to the side edge.

2. The semiconductor die of claim 1 , further including an image sensor region formed in the base substrate material.

3. The semiconductor die of claim 1 , wherein the side edge is concave.

4. The semiconductor die of claim 1 , wherein the side edge is convex.

5. The semiconductor die of claim 1 , further including a substrate comprising a recess, wherein the curved surface extends in parallel with a surface of the substrate within the recess.

6. The semiconductor die of claim 5 , wherein the semiconductor die contacts the curved surface for an entire width of the semiconductor die.

7. The semiconductor die of claim 5 , further including an epoxy disposed between the base substrate material and the substrate.

8. A semiconductor die, comprising:

a base substrate material including a side edge, the base substrate material comprising a first side and a second side with a thickness between the first side and the second side, the base substrate material forming a surface;

a plurality of openings or perforations formed through the thickness of the base substrate material adjacent to the side edge;

wherein the surface of the base substrate material forms a curved surface out to the side edge.

9. The semiconductor die of claim 8 , further including an image sensor region formed in the base substrate material.

10. The semiconductor die of claim 8 , wherein the side edge is concave.

11. The semiconductor die of claim 8 , wherein the side edge is convex.

12. The semiconductor die of claim 8 , further including a substrate comprising a recess, wherein the curved surface extends in parallel with a surface of the substrate within the recess.

13. The semiconductor die of claim 12 , wherein the semiconductor die contacts the curved surface for an entire width of the semiconductor die.

14. The semiconductor die of claim 12 , further including an epoxy disposed between the base substrate material and the substrate.

15. A semiconductor die, comprising:

a base substrate material including four side edges, wherein each side edge of the four side edges is non-linear, the base substrate material comprising a first side and a second side with a thickness between the first side and the second side, the base substrate material forming a surface;

wherein the surface of the base substrate material forms a curved surface out to each side edge.

16. The semiconductor device of claim 15 , wherein the semiconductor die is non-rectangular.

17. The semiconductor device of claim 15 , wherein the side edges are concave.

18. The semiconductor device of claim 15 , wherein the non-rectangular semiconductor die includes a circular or elliptical shape.

19. The semiconductor device of claim 15 , further including a plurality of openings or perforations formed in the semiconductor die.

20. The semiconductor device of claim 15 , further including a substrate comprising a recess, wherein the semiconductor die extends into the recess.

Assignments (3)
RELEASE OF SECURITY INTEREST IN PATENTS RECORDED AT REEL 047399, FRAME 0631 Recorded Jun 23, 2023
From: DEUTSCHE BANK AG NEW YORK BRANCH, AS COLLATERAL AGENT
To: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC; FAIRCHILD SEMICONDUCTOR CORPORATION
Reel/Frame 064078/0001 →
SECURITY INTEREST Recorded Nov 1, 2018
From: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC; FAIRCHILD SEMICONDUCTOR CORPORATION
To: DEUTSCHE BANK AG NEW YORK BRANCH, AS COLLATERAL AGENT
Reel/Frame 047399/0631 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 18, 2018
From: BOETTIGER, ULRICH; SULFRIDGE, MARC ALLEN; PERKINS, ANDREW EUGENE
To: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
Reel/Frame 046381/0724 →