Method and system for optical characterization of patterned samples
A method and system are presented for use in measuring on patterned samples, aimed at determining asymmetry in the pattern. A set of at least first and second measurements on a patterned region of a sample is performed, where each of the measurements comprises: directing illuminating light onto the patterned region along an illumination channel and collecting light reflected from the illuminated region propagating along a collection channel to be detected, such that detected light from the same patterned region has different polarization states which are different from polarization of the illuminating light, and generating a measured data piece indicative of the light detected in the measurement. Thus, at least first and second measured data pieces are generated for the at least first and second measurements on the same patterned region. The at least first and second measured data pieces are analyzed and output data is generated being indicative of a condition of asymmetry in the patterned region.
1. A method for use in measuring on patterned samples, the method consists essentially of:
performing first and second measurements on a patterned region of a sample and generating measured data comprising first and second data pieces for said first and second measurements, respectively, performed on the same patterned region, said performing of each of the first and second measurements comprising:
directing illuminating light onto said patterned region along an illumination channel and controlling polarization state of the illuminating light, such that the illuminating light in each of the first and second measurement sessions has a predetermined polarization state different from that of the other of the first and second measurements, wherein the predetermined polarization states of illuminating light of the first and second measurement sessions are selected out of linear polarization at ±45° with respect to p linear polarization state; and
collecting light reflected from said patterned region propagating along a collection channel to be detected while affecting polarization state of the reflected light propagating along the collection channel, such that light being detected in each of the first and second measurements has a predetermined polarization state which is different from a polarization state of the illuminating light in said measurement, wherein the predetermined polarization states of the light being detected in each of the first and second measurement sessions are orthogonal to the predetermined polarization states of illuminating light of the first and second measurement sessions, each of the first and second measured data pieces thereby corresponding to the detected light corresponding to a reflection response of the patterned region to the illuminating light having different polarization state; and
analyzing the first and second measured data pieces to determine a relation between them, providing a direct measure of a condition of asymmetry of the pattern in said patterned region, and generating output data indicative of the condition of asymmetry in said patterned region.
2. A method of claim 1 , wherein the first and second measured data pieces correspond to different polarization states of the detected light in said first and second measurements respectively.
3. A method of claim 1 , wherein said first and second measurements comprise spectral measurements, the illuminating and collected light having broad spectral range, thereby highlighting sensitivity of the relation between the first and second measured data pieces to misalignment of pattern features.