Patent Assignment
Reel/Frame 063724/0340
Change of Name
Recorded: 2023-05-23
Pages: 5
Assignor
FROM NOVA MEASURING INSTRUMENTS LTD.
Executed: 2023-05-04
Assignee
NOVA LTD.
5 DAVID FIKES ST., REHOVOT 7632805, ISRAEL
Covered Properties
(106)
Process Control for Micro-Lithography
Method and Apparatus for Process Control in Semiconductor Manufacture
Method and System for Controlling the Photolithography Process
Apparatus for Integrated Monitoring of Wafers and for Process Control in Semiconductor Manufacturing and a Method for Use Thereof
Method and Apparatus for Quantitative Phase Analysis of Textured Polycrystalline Materials
Patent:
6,678,347 →
Application:
10/205,717 →
Method and Apparatus for Thin Film Thickness Mapping
Wafer Monitoring System
Method and System for Thin Film Characterization
Method and System for Overlay Measurement
Method and System for Monitoring a Process of Material Removal from the Surface of a Patterned Structure
Method and System for Thickness Measurements of Thin Conductive Layers
Method and System for Measuring Thin Films
Optical Measurements of Line Edge Roughness
Optical System Operating with Variable Angle of Indidence
Thin Films Measurement Method and System
Buffer System for a Wafer Handling System
Method and System for Measuring Patterned Structures
Method and System for Positioning Articles with Respect to a Processing Tool
Method and Apparatus for Thin Film Thickness Mapping
Monitoring Apparatus and Method Particularly Useful in Photolithographically Processing Substrates
Method and System for Endpoint Detection
Apparatus for Integrated Monitoring of Wafers and for Process Control in Semiconductor Manufacturing and a Method for Use Thereof
Apparatus for Optical Inspection of Wafers During Processing
Method and Apparatus for Measurements of Patterned Structures
Vacuum Uv Based Optical Measuring Method and System
Optical Measurments of Patterned Articles
Reflective Optical System
Method and Apparatus for Measurements of Patterned Structures
Optical Measurement Device and Method
Lateral Shift Measurement Using an Optical Technique
Method and System for Thin Film Characterization
Monitoring Apparatus and Method Particularly Useful in Photolithographically
Lateral Shift Measurement Using an Optical Technique
Spectrometric Optical Method and System Providing Required Signal-to-Noise of Measurements
Reflective Optical System
Method and System for Measuring Patterned Structures
Method and System for Measuring Patterned Structures
Method and System for Measuring Patterned Structures
Thin Films Measurement Method and System
Vacuum Uv Based Optical Measuring Method and System
Method and System for Measuring Patterned Structures
Monitoring Apparatus and Method Particularly Useful in Photolithographically Processing Substrates
Method and System for Measuring in Patterned Structures
Thin Films Measurement Method and System
Method and System for Use in Monitoring Properties of Patterned Structures
Method and System for Endpoint Detection
Method and System for Measuring Patterned Structures
Optical Method and System Utilizing Operating with Deep or Vacuum Uv Spectra
Optical System and Method for Measurement of One or More Parameters of Via-Holes
Lateral Shift Measurement Using an Optical Technique
Method and System for Measuring Patterned Structures
Method and System for Measuring Patterned Structures
Line Edge Roughness Measuring Technique and Test Structure
Method and System for Endpoint Detection
Thin Films Measurement Method and System
Method and System for Endpoint Detection
Method and System for Use in Monitoring Properties of Patterned Structures
Lateral Shift Measurement Using an Optical Technique
Monitoring Apparatus and Method Particularly Useful in Photolithographically Processing Substrates
Process Control Using Non-Zero Order Diffraction
Optical System and Method for Measuring in Three-Dimensional Structures
Optical System and Method for Measurement of One or More Parameters of Via-Holes
Method and System for Use in Monitoring Properties of Patterned Structures
Optical System and Method for Measuring in Patterned Structures
Monitoring system and method for verifying measurements in patterned structures
Monitoring Apparatus and Method Particularly Useful in Photolithographically Processing Substrates
Optical Method and System for Detecting Defects in Three-Dimensional Structures
Optical Method and System for Measuring Isolated Features of a Structure
Optical Metrology for in-Situ Measurements
Method and System for Measuring Patterned Structures
Lateral Shift Measurement Using an Optical Technique
Optical Method and System for Critical Dimensions and Thickness Characterization
Optical Phase Measurement Method and System
Method and System for Improving Optical Measurements on Small Targets
Scatterometry Method and System
Method and System for Determining Strain Distribution in a Sample
Scatterometry System and Method
Patent:
10,372,845 →
Application:
14/927,850 →
Assembly for producing a plurality of beam bundles
Method and System for Optimizing Optical Inspection of Patterned Structures
Lateral Shift Measurement Using an Optical Technique
Surface Planarization System and Method
Overlay Design Optimization
Optical Critical Dimension Metrology
Method and System for Planning Metrology Measurements
Test Structures and Metrology Technique Utilizing the Test Structures for Measuring in Patterned Structures
Measurement System and Method for Measuring in Thin Films
Method and System for Improving Optical Measurements on Small Targets
Optical Phase Measurement Method and System
Optical Method and System for Defects Detection in Three-Dimensional Structures
Optical Metrology for in-Situ Measurements
Process Control Using Non-Zero Order Diffraction
Metrology Test Structure Design and Measurement Scheme for Measuring in Patterned Structures
Method and System for Optical Metrology in Patterned Structures
Test Structure for Use in Metrology Measurements of Patterns
Optical Phase Measurement Method and System
Optical Metrology for in-Situ Measurements
Method and System for Optical Characterization of Patterned Samples
Optical Critical Dimension Metrology
Hybrid Metrology Method and System
Method and System for Processing Patterned Structures
Optical System and Method for Measurements of Samples
Measuring Complex Structures in Semiconductor Fabrication
Optical Phase Measurement Method and System
Method and System for Optical Metrology in Patterned Structures
Tem-Based Metrology Method and System
Scatterometry System and Method
Related Assignments
(13)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest
Mar 1, 2002
From: BRILL, BOAZ; COHEN, YOEL
To: NOVA MEASURING INSTRUMENTS LTD.
Reel/Frame 012624/0366 →
Assignment of Assignor's Interest
Jul 26, 2002
From: KOZACZEK, KRZYSZTOF J.; KURTZ, DAVID S.; MORAN, PAUL R.; MARTIN, ROGER I.
To: HYPERNEX, INC.
Reel/Frame 013144/0696 →
Assignment of Assignor's Interest
Aug 21, 2002
From: KOZACZEK, KRZYSZTOF J.; KURTZ, DAVID S.; MORAN, PAUL R.; MARTIN, ROGER I.
To: HYPERNEX, INC.; INTERNATIONAL BUSINESS MACHINES CORP.
Reel/Frame 013223/0917 →
Assignment of Assignor's Interest
Nov 25, 2002
From: FINAROV, MOSHE
To: NOVA MEASURING INSTRUMENTS LTD.
Reel/Frame 013519/0307 →
Assignment of Assignor's Interest
Dec 19, 2002
From: FINAROV, MOSHE
To: NOVA MEASURING INSTRUMENTS LTD.
Reel/Frame 013594/0873 →
Assignment of Assignor's Interest
May 12, 2003
From: MACHAVARIANI, VLADIMIR; SCHEINER, DAVID; WEINGARTEN, AMIT; RAVID, AVI
To: NOVA MEASURING INSTRUMENTS LTD.
Reel/Frame 014063/0187 →
Assignment of Assignor's Interest
Aug 14, 2003
From: SCHEINER, DAVID; MANY, YOAV; GULIAMOV, RAHAMIM; GOV, SHAHAR
To: NOVA MEASURING INSTRUMENTS LTD
Reel/Frame 014389/0273 →
Assignment of Assignor's Interest
Aug 15, 2003
From: FINAROV, MOSHE; SCHEINER, DAVID
To: NOVA MEASURING INSTRUMENTS LTD.
Reel/Frame 014393/0657 →
Assignment of Assignor's Interest
Sep 24, 2003
From: COHEN, YOEL; FINAROV, MOSHE; VINOKUR, KLARA
To: NOVA MEASURING INSTRUMENTS LTD.
Reel/Frame 014524/0309 →
Assignment of Assignor's Interest
Dec 1, 2003
From: DVIR, ERAN
To: NOVA MEASURING INSTRUMENTS LTD.
Reel/Frame 014744/0735 →
Assignment of Assignor's Interest
Nov 1, 2004
From: BRILL, BOAZ
To: NOVA MEASURING INSTRUMENTS LTD.
Reel/Frame 016552/0919 →
Assignment of Assignor's Interest
Feb 25, 2005
From: BRILL, BOAZ; FINAROV, MOSHE; SCHEINER, DAVID
To: NOVA MEASURING INSTRUMENTS LTD.
Reel/Frame 016999/0458 →
Assignment of Assignor's Interest
Sep 15, 2006
From: HYPERNEX, INC.
To: NOVA MEASURING INSTRUMENTS LTD.
Reel/Frame 018260/0053 →