Wafer bonding method and structure thereof
Embodiments of wafer bonding method and structures thereof are disclosed. The wafer bonding method can include performing a plasma activation treatment on a front surface of a first and a front surface of a second wafer; performing a silica sol treatment on the front surfaces of the first and the second wafers; performing a preliminary bonding process of the first and second wafer; and performing a heat treatment of the first and the second wafers to bond the front surface of the first wafer to the front surface of the second wafers.
1. A wafer bonding method, comprising:
performing a plasma activation treatment on a front surface of a first wafer and a front surface of a second wafer;
performing a silica sol treatment on the front surfaces of the first and the second wafers such that a plurality of SiO 2 nanoparticles are adsorbed on the front surfaces of the first and second wafers;
applying a preliminary bonding process to the first and second wafer; and
performing a heat treatment to the first and second wafers to bond the front surface of the first wafer to the front surface of the second wafer.
2. The wafer bonding method of claim 1 , wherein the plasma activation treatment comprises using oxygen or nitrogen as a plasma gas and is performed with a processing pressure between about 0.05 mbar and 0.5 mbar, a high frequency discharge power between about 40 watts and 100 watts and a low frequency discharge power between about 10 watts and 40 watts.
3. The wafer bonding method of claim 2 , wherein the plasma activation treatment comprises using nitrogen as the plasma gas and is performed with a processing pressure at 0.3 mbar, the high frequency discharge power of about 60 watts, and the low frequency discharge power of about 25 watts.
4. The wafer bonding method of claim 2 , wherein the plasma activation treatment comprises using oxygen as the plasma gas and is performed with a processing pressure at 0.1 mbar, the high frequency discharge power of about 70 watts, and the low frequency discharge power of about 35 watts.
5. The wafer bonding method of claim 2 , wherein the plasma activation treatment comprises using oxygen as the plasma gas and is performed with a processing pressure at 0.5 mbar, the high frequency discharge power of about 60 watts, and the low frequency discharge power of about 30 watts.
6. The wafer bonding method of claim 2 , wherein the plasma activation treatment comprises using oxygen as the plasma gas and is performed with a processing pressure at 0.5 mbar, the high frequency discharge power of about 60 watts, and the low frequency discharge power of about 25 watts.
7. The wafer bonding method of claim 1 , wherein performing the silica sol treatment comprises rinsing the front surfaces of the first and the second wafers with the silica sol having the plurality of SiO 2 nanoparticles with a diameter smaller than 10 nm.
8. The wafer bonding method of claim 7 , wherein performing the silica sol treatment comprises rinsing the front surfaces of the first and the second wafers with the silica sol having the SiO 2 nanoparticles weight concentration between about 1% and 30%.
9. The wafer bonding method of claim 8 , wherein rinsing the front surfaces of the first and the second wafers with the silica sol comprises rotating the first and second wafers at a rotation speed of between about 50 rpm and 1000 rpm.
10. The wafer bonding method of claim 8 , wherein rinsing the front surfaces of the first and second wafers is performed for between about 10 and 30 seconds.
11. The wafer bonding method of claim 8 , further comprising a drying process after rinsing the front surfaces of the first and the second wafers with the silica sol and prior to the preliminary bonding process.
12. The wafer bonding method of claim 8 , further comprising, prior to rinsing the front surface of the first and the second wafers with the silica sol, water rinsing the front surfaces of the first and the second wafers.
13. The wafer bonding method of claim 1 , further comprising, prior to the preliminary bonding process, positioning the front surfaces of the first and the second wafers opposed to one another at a distance of between about 20 μm and 100 μm.
14. The wafer bonding method of claim 13 , wherein the preliminary bonding process comprises applying a first pressure between about 80 and 200 mbar at a center zone of the first and the second wafers to bring the center zones into contact.
15. The wafer bonding method of claim 14 , wherein the preliminary bonding process further comprises applying a second pressure at a first outer annular zone of the first and the second wafers to bring the first outer annular zones into contact.
16. The wafer bonding method of claim 15 , wherein the preliminary bonding process further comprises applying a third pressure at a second outer annular zone of the first and the second wafers to bring the wafers into full contact.
17. The wafer bonding method of claim 1 , wherein the heat treatment is performed at about 200-450° C. for about 1-2 hours under a nitrogen atmosphere.
18. The wafer bonding method of claim 17 , wherein the heat treatment comprises forming a covalent bond of at least 2.0 J/m 2 between the first and the second wafers.
19. A wafer bonding method, comprising:
performing a plasma activation treatment on a front surface of a first wafer and a front surface of a second wafer;
performing a silica sol treatment on the front surface of the first wafer or the front surface of the second wafer such that a plurality of SiO 2 nanoparticles are adsorbed on the front surfaces of the first and second wafers;
performing a preliminary bonding process on the first and second wafers; and
performing a heat treatment of the first and the second wafers to form a bond between the first and the second wafers.