IP Library Granted Patent US 10,629,733
Granted Patent B2
US 10,629,733 · App. 16/046,974 · Granted Apr 21, 2020

Method and apparatus for use in improving linearity of MOSFETs using an accumulated charge sink-harmonic wrinkle reduction

Inventors: Christopher N. Brindle (Poway, CA); Jie Deng (South Burlington, VT); Alper Genc (San Diego, CA); Chieh-Kai Yang (Poway, CA)
Assignee: pSemi Corporation
H01L29/7841H01L27/1203H01L28/00H01L29/0649H01L29/0688H01L29/0847H01L29/1087H01L29/1095H01L29/36H01L29/4908H01L29/78615H01L29/78654H01L29/78657H03K17/162
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Quick Facts
Patent No.
US 10,629,733
App. No.
16/046,974
Granted
Apr 21, 2020
Kind
B2
Abstract

A method and apparatus for use in improving linearity sensitivity of MOSFET devices having an accumulated charge sink (ACS) are disclosed. The method and apparatus are adapted to address degradation in second- and third-order intermodulation harmonic distortion at a desired range of operating voltage in devices employing an accumulated charge sink.

Claims (73)

1. An RF switch circuit for switching RF signals, comprising:

(A) a first RF port;

(B) a second RF port; and

(C) a pass transistor grouping having a first node coupled to the first RF port and a second node coupled to the second RF port, the pass transistor grouping comprising a first two or more accumulated charge control N-type MOSFETs (ACC N-MOSFETs) arranged in a stacked configuration; and

wherein:

(a) each ACC N-MOSFET of the first two or more ACC N-MOSFETs comprises:

(i) a first gate, a first drain, a first source, a first gate oxide layer, and a first body, wherein the first gate oxide layer is positioned between the first gate and the first body; and

(ii) two or more first accumulated charge sink (ACS) regions positioned proximate to portions of the first body, wherein each first ACS region of the two or more ACS regions is connected to the first body;

(b) the pass transistor grouping configured to couple the first RF port with the second RF port in a pass transistor grouping first state;

(c) the pass transistor grouping configured to isolate the first RF port from the second RF port in a pass transistor grouping second state, and wherein the pass transistor grouping is configured to have first bias voltages applied to the two or more ACS regions to remove or otherwise control, via the two or more first ACS regions, charge that, without the first bias voltages applied, would accumulate in the first body in the pass transistor grouping second state; and

(d) the first bias voltages being substantially negative with respect to ground, the first drain and the first source.

2. The RF switch circuit of claim 1 , further comprising a shunt transistor grouping having a first node coupled to the first RF port and a second node coupled to ground, and the shunt transistor grouping comprising a second two or more ACC N-MOSFETs arranged in a stacked configuration,

wherein:

(a′) each ACC N-MOSFET of the second two or more ACC N-MOSFETs comprises:

(i′) a second gate, a second drain, a second source, a second body and a second gate oxide layer, wherein the second gate oxide layer is positioned between the second gate and the second body; and

(ii') two or more second accumulated charge sink (ACS) regions positioned proximate to portions of the second body, and wherein each second ACS region of the two or more ACS regions is connected to the second body;

(b′) the shunt transistor grouping configured to shunt the first RF port with the first RF port being coupled to ground in a shunt transistor grouping first state;

(c′) the shunt transistor grouping configured to isolate the first RF port from ground in a shunt transistor grouping second state, and wherein the shunt transistor grouping is configured to have second bias voltages applied to the two or more second ACS regions to remove or otherwise control, via the two or more second ACS regions, charge that, without the second bias voltages applied, would accumulate in the second body in the shunt transistor grouping second state; and

(d′) the second bias voltages being substantially negative with respect to ground, the second drain and the second source.

3. The RF switch circuit of claim 2 , wherein:

the pass transistor grouping is controllable by a first switch control signal; and

the shunt transistor grouping is controllable by a second switch control signal.

4. The RF switch circuit of claim 3 , wherein:

the pass transistor grouping is enabled in the pass transistor grouping first state by the first switch control signal to couple the first RF port with the second RF port and the shunt transistor grouping is disabled in the shunt transistor grouping second state by the second switch control signal to isolate the first RF port from ground; and

the shunt transistor grouping is enabled in the shunt transistor grouping first state by the second switch control signal to shunt the first RF port to ground with the first RF port being coupled to ground and the pass transistor grouping is disabled in the pass transistor grouping second state by the first switch control signal to isolate the first RF port from the second RF port.

5. The RF switch circuit of claim 4 , wherein the first two or more ACC N-MOSFETs arranged in the stacked configuration include respective gate resistors coupled to respective gates of the first two or more ACC N-MOSFETs, and wherein the second two or more ACC N-MOSFETs arranged in the stacked configuration include respective gate resistors coupled to respective gates of the second two or more ACC N-MOSFETs.

6. The RF switch circuit of claim 4 , wherein the RF circuit is incorporated in a cellular communication device.

7. The RF switch circuit of claim 6 , wherein the cellular communication device includes a GSM mode of operation.

8. The RF switch circuit of claim 6 , wherein the cellular communication device is capable of transmitting in a cellular communication system at a level below −30 dBm for one or more harmonics of a fundamental frequency.

9. The RF switch circuit of claim 2 , wherein the first two or more ACC N-MOSFETs and the second two or more ACC N-MOSFETs respectively include a thin-film semiconductor layer in a silicon on insulator (SOI) substrate.

10. The RF switch circuit of claim 5 , wherein the RF switch circuit is included on a single die.

11. A single-pole, multiple-throw RF switch comprising:

a plurality of pass transistor groupings i, i=1, 2, ... N, with i being two or greater;

a plurality of corresponding first RF ports i, i=1, 2, ... N, with i being two or greater;

a second RF port;

wherein:

two or more pass transistor groupings of the plurality of pass transistor groupings to respectively couple two or more corresponding first RF ports with the second RF port;

the plurality of pass transistor groupings respectively comprises first two or more ACC N-MOSFETs arranged in a stacked configuration;

each ACC N-MOSFET of respective first two or more ACC N-MOSFETs comprises a first body, a first gate, a first drain, a first source and a first gate oxide layer, wherein the first gate oxide layer is positioned between the first gate and the first body, and two or more accumulated charge sink (ACS) regions are positioned proximate to portions of the first body, and wherein each first ACS region of the two or more ACS regions is connected to the first body;

one of the two or more pass transistor groupings, i, configured to couple one corresponding first RF port, i, with the second RF port in a pass transistor grouping first state;

other of the two or more pass transistor groupings, other than the one of the two or more pass transistor groupings, i, configured to isolate the two or more corresponding first RF ports, other than the one corresponding first RF port, i, from the second RF port, in a pass transistor grouping second state, and wherein the other pass transistor groupings of the two or more pass transistor groupings, other than the one of the two or more pass transistor groupings, i, are configured to have first bias voltages applied to the two or more first ACS regions to remove or otherwise control, via the two or more first ACS regions, charge that, without the first bias voltages applied, would accumulate in the first body in the pass transistor grouping second state;

the first bias voltages being substantially negative with respect to ground, the first drain and the first source.

12. The single-pole, multiple-throw RF switch of claim 11 , wherein:

(a) for the one of the two or more pass transistor groupings, i, in the pass transistor grouping first state; and

(b) for the other pass transistor groupings, other than the one of the two or more pass transistor groupings, i, in the pass transistor grouping second state;

the single-pole, multiple-throw RF switch to:

(i) for the one of the two or more pass transistor groupings, i, couple the one corresponding first RF port, i, with the second RF port; and

(ii) for the other pass transistor groupings of the two or more pass transistor groupings, other than the one of the two or more pass transistor groupings, i, isolate the two or more corresponding first RF ports, other than the one corresponding first RF port, i, from the second RF port.

13. The single-pole, multiple-throw RF switch of claim 12 , the ACC N- MOSFETs include respective gate resistors coupled to respective gates thereof.

14. The single-pole, multiple-throw RF switch of claim 12 , wherein the RF switch is incorporated in a cellular communication device.

15. The single-pole, multiple-throw RF switch of claim 14 , wherein the cellular communication device includes a GSM mode of operation.

16. The single-pole, multiple-throw RF switch of claim 14 , wherein the cellular communication device is capable of transmitting in a cellular communication system at a level below −30 dBm for one or more harmonics of a fundamental frequency.

17. The single-pole, multiple-throw RF switch of claim 12 , wherein the ACC N-MOSFETs respectively include a thin-film semiconductor layer in a silicon on insulator (SOI) substrate.

18. The single-pole, multiple-throw RF switch of claim 12 , wherein the single-pole, multiple-throw RF switch is included on a single die.

19. The single-pole, multiple-throw RF switch of claim 12 , and further comprising:

a plurality of shunt transistor groupings i, i=1, 2, ...N, i being two or greater, respectively corresponding to the plurality of pass transistor groupings i, i=1, 2, ..., N, i being two or greater;

two or more shunt transistor groupings of the plurality of shunt transistor groupings to respectively couple two or more corresponding first RF ports and ground in a shunt transistor grouping first state;

the plurality of shunt transistor groupings respectively comprises a second two or more ACC N-MOSFETs arranged in a stacked configuration;

each ACC-NMOSFET of the second two or more ACC N-MOSFETs comprises a second body, a second gate, a second drain, a second source and a second gate oxide layer, wherein the second gate oxide layer is positioned between the second gate and the second body, and the two or more second accumulated charge sink (ACS) regions positioned proximate to portions of the second body, wherein each second ACS region of the two or more ACS regions is connected to the second body;

one of the two or more shunt transistor groupings, i, configured to shunt one corresponding first RF port, i, to ground with the one corresponding RF port, i, being coupled to ground in the shunt transistor grouping first state;

other of the two or more shunt transistor groupings, other than the one of the two or more shunt transistor groupings, i, configured to isolate the two or more corresponding first RF ports, other than the one corresponding RF port, i, from ground in a shunt transistor grouping second state, and wherein the other shunt transistor groupings of the two or more shunt transistor groupings, other than the one of the two or more shunt transistor groupings, i, are configured to have second bias voltages applied to the two or more second ACS regions to remove or otherwise control, via the two or more second ACS regions, charge that, without the second bias voltages applied, would accumulate in the second body in the shunt transistor grouping second state;

the second bias voltages being substantially negative with respect to the ground, the second drain and the second source.

20. The single-pole, multiple-throw RF switch of claim 19 , wherein:

(a) for the one of the two or more shunt transistor groupings, i, in the shunt transistor grouping first state; and

(b) for the other shunt transistor groupings of the two or more shunt transistor groupings, other than the one of the two or more shunt transistor groupings, i, in the second shunt transistor grouping state;

the RF single-pole, multiple- throw switch to:

(i) for the one of the two or more shunt transistor groupings, i, shunt the one corresponding first RF port, i, to ground with the one corresponding first RF port, i, being coupled to ground; and

(ii) for the other shunt transistor groupings of the two or more shunt transistor groupings, other than the one of the two or more shunt transistor groupings, i, isolate the two or more corresponding first RF ports, other than the one corresponding RF port, i, from ground.

21. The RF switch of claim 5 , wherein the respective gate resistors have a value of at least 30 k ohms.

22. The RF switch of claim 13 , wherein the respective gate resistors have a value of at least 30 k ohms.

23. The RF switch of claim 1 , wherein the first bias voltages being substantially negative with respect to ground, the first drain and the first source comprise the first bias voltages being more than one volt negative with respect to ground, the first drain and the first source.

24. The RF switch of claim 2 , wherein the second bias voltages being substantially negative with respect to ground, the second drain and the second source comprise the second bias voltages being more than one volt negative with respect to ground, the second drain and the second source.

25. The RF switch circuit of claim 2 , comprising a single-pole, multiple-throw RF switch that comprises two or more of the RF switch circuits of claim 2 .

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 2, 2019
From: BRINDLE, CHRISTOPHER N.; DENG, JIE; GENC, ALPER; YANG, CHIEH-KAI
To: PEREGRINE SEMICONDUCTOR CORPORATION
Reel/Frame 049944/0956 →
CHANGE OF NAME Recorded Aug 2, 2019
From: PEREGRINE SEMICONDUCTOR CORPORATION
To: PSEMI CORPORATION
Reel/Frame 049950/0601 →
Continuity (14)
Continuation 15693182 · Aug 31, 2017
Continuation 15354723 · Nov 17, 2016
Continuation 14804198 · Jul 20, 2015
Continuation 14198315 · Mar 5, 2014
Continuation 13277108 · Oct 19, 2011
Continuation In Part 13053211 · Mar 22, 2011
Division 11484370 · Jul 10, 2006
Continuation In Part 13028144 · Feb 15, 2011
Division 11520912 · Sep 14, 2006
Continuation In Part 11484370 · Jul 10, 2006
Provisional Application 61405165 · Oct 20, 2010
Provisional Application 60698523 · Jul 11, 2005
Provisional Application 60718260 · Sep 15, 2005
Related Publication 20190088781A1 · Mar 21, 2019