Advanced oxidation process for the exfoliation of two dimensional matertals
A system for extracting two dimensional materials from a bulk material by functionalization of the bulk material in a reactor.
1. A method of exfoliating two-dimensional materials comprising:
adding a bulk material to a polar solvent in a reactor vessel;
dissolving ozone in the polar solvent that is chilled to between between 5° C. and 15° C.;
exposing the polar solvent to shear forces imparted by a shear emulsifier; and
exfoliating two-dimensional material from the bulk material.
2. The method of claim 1 , wherein the bulk material is selected from the group consisting of graphite, Molybdenum disulfide (MoS 2 ), Molybdenum diselenide (MoSe 2 ), hexagonal boron nitride (h-BN), Tungsten disulfide(WS 2 ), and Tungsten diselenide (WSe 2 ).
3. The method of claim 1 , wherein the two-dimensional material is graphene.
4. The method of claim 1 , wherein the two-dimensional material formed is from bulk is Molybdenum disulfide (MoS 2 ), Molybdenum diselenide (MoSe 2 ), hexagonal boron nitride (h-BN), Tungsten disulfide(WS 2 ), and Tungsten diselenide (WSe 2 ).
5. The method of claim 1 , wherein the two-dimensional material is single layer.
6. The method of claim 1 , wherein the two-dimensional material is few layer.
7. The method of claim 1 , wherein the two-dimensional material is multi layer.
8. The method of claim 1 , further comprising agitating the polar solvent.
9. The method of claim 8 , wherein the polar solvent has a temperature above 25° C.
10. The method of claim 1 , wherein no chemical preprocessing of the bulk material is necessary.
11. The method of claim 10 , further comprising exposing the solvent to ultraviolet (UV) radiation to enhance radical formation in the working H 2 O 2 or H 2 O or H 2 O/H 2 O 2 solvent.
12. The method of claim 1 , wherein the working solvent can be H 2 O 2 , H 2 O, an inert PFC, or a mixture of these in any combination.
13. A method of exfoliating two-dimensional materials comprising:
adding a bulk material to a polar solvent in a reactor vessel, the polar solvent selected from the group consisting of H 2 O 2 , H 2 O, or a combination thereof;
dissolving ozone in the polar solvent;
exposing the polar solvent to ultraviolet (UV) radiation to enhance radical formation in the polar solvent; and
exfoliating two-dimensional material from the bulk material by advanced oxidation process.
14. The method of claim 13 , wherein the bulk material is selected from the group consisting of graphite, Molybdenum disulfide (MoS 2 ), Molybdenum diselenide (MoSe 2 ), hexagonal boron nitride (h-BN), Tungsten disulfide(WS 2 ), and Tungsten diselenide (WSe 2 ).
15. The method of claim 13 , wherein the two-dimensional material is graphene.
16. The method of claim 13 , wherein the two-dimensional material formed is from bulk is Molybdenum disulfide (MoS 2 ), Molybdenum diselenide (MoSe 2 ), hexagonal boron nitride (h-BN), Tungsten disulfide(WS 2 ), and Tungsten diselenide (WSe 2 ).
17. The method of claim 13 , wherein the polar solvent is chilled from around room temperature to between 5° C. and 15° C.
18. The method of claim 13 , further comprising, after dissolving ozone in the polar solvent, agitating the polar solvent by ultrasound in combination with shear forces imparted by a shear emulsifier, facilitating the exfoliating.
19. The method of claim 18 , wherein the polar solvent has a temperature above 25° C.