Method of producing an optoelectronic component, and optoelectronic component

1. A method of producing an optoelectronic component comprising:

providing an optoelectronic semiconductor chip comprising a layer sequence arranged on a substrate, wherein the layer sequence comprises a contact side comprising two electrical contact locations, said contact side facing away from the substrate;

arranging the optoelectronic semiconductor chip on a temporary carrier such that the contact side faces the temporary carrier;

arranging a sacrificial layer above the temporary carrier such that the optoelectronic semiconductor chip is embedded into the sacrificial layer;

detaching the optoelectronic semiconductor chip with the surrounding sacrificial layer from the temporary carrier;

arranging the optoelectronic semiconductor chip with the surrounding sacrificial layer on an auxiliary carrier such that the contact side faces away from the auxiliary carrier;

arranging a molding material above the auxiliary carrier such that a housing is formed that at least partly encloses the optoelectronic semiconductor chip, wherein the contact side is covered by the molding material;

detaching the housing from the auxiliary carrier; and

dissolving away the sacrificial layer.

2. The method according to claim 1 , further comprising, after detaching the housing from the auxiliary carrier, removing the substrate, wherein the layer sequence remains at the molding material of the housing.

3. The method according to claim 2 , further comprising, after removing the substrate, arranging a wavelength-converting material in a free space produced as a result of removing the substrate.

4. The method according to claim 2 , wherein removing the substrate is carried out by a laser detaching process.

5. The method according to claim 4 , wherein the substrate is formed as a sapphire substrate.

6. The method according to claim 1 , wherein embedding the optoelectronic semiconductor chip into the sacrificial layer is carried out by immersing the optoelectronic semiconductor chip in the material of the sacrificial layer.

7. The method according to claim 1 , further comprising, after dissolving away the sacrificial layer, arranging a wavelength-converting material above the optoelectronic semiconductor chip.

8. The method according to claim 1 , further comprising, after dissolving away the sacrificial layer,

arranging a potting material in a free space produced as a result of dissolving away the sacrificial layer.

9. The method according to claim 1 , further comprising, before arranging the optoelectronic semiconductor chip on the auxiliary carrier,

galvanically depositing internal electrical contact pads at the electrical contact locations of the optoelectronic semiconductor chip.

10. The method according to claim 1 , further comprising, before arranging the optoelectronic semiconductor chip on the auxiliary carrier,

galvanically depositing internal electrical contact pads at the electrical contact locations of the optoelectronic semiconductor chip,

depositing the internal electrical contact pads is carried out before arranging the optoelectronic semiconductor chip on the temporary carrier, and

the internal electrical contact pads are embedded into the temporary carrier such that the layer sequence is in contact with the temporary carrier.

11. The method according to claim 9 , further comprising, after arranging the molding material,

removing a part of the molding material to expose the internal electrical contact pads; and

arranging external electrical contact pads electrically conductively connected to the internal electrical contact pads at an exterior side of the housing.

12. The method according to claim 1 ,

wherein the optoelectronic semiconductor chip is arranged together with a plurality of further optoelectronic semiconductor chips on the auxiliary carrier,

a housing assemblage comprising a plurality of housings is formed from the molding material, and

the housing assemblage is subsequently divided to singulate the housing.