Ultraviolet light-emitting element
An ultraviolet light-emitting element includes: a multilayer stack in which an n-type AlGaN layer, a light-emitting layer, a first p-type AlGaN layer, and a second p-type AlGaN layer are arranged in this order; a negative electrode; and a positive electrode. The first p-type AlGaN layer has a larger Al composition ratio than first AlGaN layers serving as well layers. The second p-type AlGaN layer has a larger Al composition ratio than the first AlGaN layers. The first p-type AlGaN layer and the second p-type AlGaN layer both contain Mg. The second p-type AlGaN layer has a higher maximum Mg concentration than the first p-type AlGaN layer. The second p-type AlGaN layer includes a region where an Mg concentration increases in a thickness direction thereof as a distance from the first p-type AlGaN layer increases in the thickness direction.
1. An ultraviolet light-emitting element, comprising:
a multilayer stack in which an n-type AlGaN layer having a first surface and a second surface, a light-emitting layer, a first p-type AlGaN layer, and a second p-type AlGaN layer are arranged such that:
the light-emitting layer is provided on the first surface of the n-type AlGaN layer,
the first p-type AlGaN layer is provided on one surface of the light-emitting layer, and
the second p-type AlGaN layer is provided on one surface of the first p-type AlGaN layer, the second p-type AlGaN layer having a single-layer structure and being a continuous layer;
wherein
a negative electrode is provided directly on a portion, not covered with the light-emitting layer, of the first surface of the n-type AlGaN layer, the first surface being located closer to the light-emitting layer than the second surface; and
a positive electrode provided directly on a surface of the second p-type AlGaN layer, the positive electrode making an ohmic contact with the second p-type AlGaN layer,
the light-emitting layer having a multi-quantum well structure in which a plurality of barrier layers and a plurality of well layers are alternately arranged,
each of the plurality of well layers being configured as a first AlGaN layer,
each of the plurality of barrier layers being configured as a second AlGaN layer having an Al composition ratio larger than an Al composition ratio of the first AlGaN layer, the Al composition ratio in a layer being the molar fraction of Al among the total moles of Al and Ga in the layer,
the n-type AlGaN layer having an Al composition ratio larger than the Al composition ratio of the first AlGaN layer,
the first p-type AlGaN layer having an Al composition ratio larger than the Al composition ratio of the first AlGaN layer,
the second p-type AlGaN layer having an Al composition ratio larger than the Al composition ratio of the first AlGaN layer,
the first p-type AlGaN layer and the second p-type AlGaN layer both containing Mg,
the second p-type AlGaN layer having a maximum Mg concentration higher than a maximum Mg concentration of the first p-type AlGaN layer,
the second p-type AlGaN layer including a region where an Mg concentration increases in a thickness direction of the second p-type AlGaN layer as a distance from the first p-type AlGaN layer increases in the thickness direction,
wherein
the Mg concentration of the second p-type AlGaN layer equals the maximum Mg concentration of the second p-type AlGaN layer at a depth halfway through the second p-type AlGaN layer in the thickness direction of the second p-type AlGaN layer.
2. The ultraviolet light-emitting element of claim 1 , wherein
in an Mg concentration profile in the thickness direction of the second p-type AlGaN layer, the maximum Mg concentration of the second p-type AlGaN layer is higher than 3×10 20 cm −3 and lower than 6×10 20 cm −3 .
3. The ultraviolet light-emitting element of claim 1 , wherein
the Al composition ratio of the second p-type AlGaN layer increases as the Mg concentration increases in the thickness direction of the second p-type AlGaN layer.
4. The ultraviolet light-emitting element of claim 1 , comprising a substrate supporting the multilayer stack,
wherein the multilayer stack is provided on one surface of the substrate such that:
the n-type AlGaN layer is provided on the one surface of the substrate,
the light-emitting layer is provided on the first surface of the n-type AlGaN layer,
the first p-type AlGaN layer is provided on the one surface of the light-emitting layer, and
the second p-type AlGaN layer is provided on the one surface of the first p-type AlGaN layer.
5. The ultraviolet light-emitting element of claim 2 , wherein
the Al composition ratio of the second p-type AlGaN layer increases as the Mg concentration increases in the thickness direction of the second p-type AlGaN layer.