IP Library Granted Patent US 10,559,748
Granted Patent B2
US 10,559,748 · App. 16/077,601 · Granted Feb 11, 2020

Tunnel magnetic resistance element and method for manufacturing same

Inventors: Yasuo Ando (Sendai, JP); Mikihiko Oogane (Sendai, JP); Kosuke Fujiwara (Sendai, JP); Junichi Jono (Tokyo, JP)
Assignees: TOHOKU UNIVERSITY; KONICA MINOLTA, INC.
H01L43/10G01R33/09G01R33/098H01F10/131H01F10/132H01F10/135H01F10/3272H01F41/307H01L43/02H01L43/08H01L43/12
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Quick Facts
Patent No.
US 10,559,748
App. No.
16/077,601
Granted
Feb 11, 2020
Kind
B2
Abstract

A tunnel magnetic resistance element includes the following, a fixed magnetic layer with a fixed direction of magnetization, a free magnetic layer in which the direction of magnetization changes, and an insulating layer which is positioned between the fixed magnetic layer and the free magnetic layer. The fixed magnetic layer, the free magnetic layer, and the insulating layer form a magnetic tunnel junction. A resistance of the insulating layer changes by a tunnel effect according to a difference in an angle between the direction of magnetization of the fixed magnetic layer and the direction of magnetization of the free magnetic layer. The free magnetic layer includes a ferromagnetic layer, a soft magnetic layer, and a magnetic bonding layer placed in between. Material of the magnetic bonding layer include Ru or Ta, and a layer thickness is 1.0 nm to 1.3 nm.

Claims (16)

1. A tunnel magnetic resistance element comprising:

a fixed magnetic layer in which a direction of magnetization is fixed;

a free magnetic layer which receives influence of a magnetic field from outside and in which the direction of magnetization changes; and

an insulating layer which is positioned between the fixed magnetic layer and the free magnetic layer,

wherein,

the fixed magnetic layer, the free magnetic layer, and the insulating layer form a magnetic tunnel junction,

a resistance of the insulating layer changes by a tunnel effect according to a difference in an angle between the direction of magnetization of the fixed magnetic layer and the direction of magnetization of the free magnetic layer,

the free magnetic layer includes a ferromagnetic layer joined to the insulating layer, a soft magnetic layer including NiFe, and a magnetic bonding layer placed in between, and

material of the magnetic bonding layer includes Ru or Ta, and a layer thickness is 1.0 nm to 1.3 nm.

2. A method for manufacturing a tunnel magnetic resistance element according to claim 1 comprising:

performing a first heat treatment on the tunnel magnetic resistance element at a first temperature while applying an external magnetic field; and

performing a second heat treatment at a second temperature lower than the first temperature while applying an external magnetic field in a direction different from the first heat treatment to make a direction of an easy magnetization axis of a ferromagnetic metal magnetization free layer different from a direction of an easy magnetization axis of a ferromagnetic metal magnetization fixed layer,

wherein the first temperature is set to 340° to 370°.

3. The tunnel magnetic resistance element of claim 1 , wherein the material of the magnetic bonding layer includes Ru.

4. The tunnel magnetic resistance element of claim 1 , wherein the fixed magnetic layer includes a further magnetic bonding layer arranged between a first ferromagnetic layer and a second ferromagnetic layer.

5. The tunnel magnetic resistance element of claim 4 , wherein the fixed magnetic layer further includes an antiferromagnetic layer disposed on one of the first ferromagnetic layer and the second ferromagnetic layer to influence crystallizing.

Assignments (3)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 2, 2024
From: KONICA MINOLTA, INC.
To: SPIN SENSING FACTORY CORP.; TOHOKU UNIVERSITY
Reel/Frame 069454/0046 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 20, 2022
From: KONICA MINOLTA, INC.
To: SPIN SENSING FACTORY CORP.
Reel/Frame 060253/0629 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 13, 2018
From: ANDO, YASUO; OOGANE, MIKIHIKO; FUJIWARA, KOSUKE; JONO, JUNICHI
To: TOHOKU UNIVERSITY; KONICA MINOLTA, INC.
Reel/Frame 046627/0745 →
Priority Claims (1)
JP 2016-029566 · Feb 19, 2016 · national
Continuity (1)
Related Publication 20190044058A1 · Feb 7, 2019