IP Library › Granted Patent US 11,104,989
Granted Patent B2
US 11,104,989 · App. 16/081,653 · Granted Aug 31, 2021

Chemical vapor deposition process to build 3D foam-like structures

Inventors: Manuela Loeblein (Singapore, SG); Siu Hon Tsang (Singapore, SG); Hang Tong Edwin Teo (Singapore, SG)
Assignee: Nanyang Technological University
C23C16/342C01B32/186C01B35/146C23C16/01C23C16/0227C23C16/0281C23C16/045C23C16/26B82Y40/00C01P2002/30C01P2004/03
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Quick Facts
Patent No.
US 11,104,989
App. No.
16/081,653
Granted
Aug 31, 2021
Kind
B2
Abstract

A chemical vapor deposition process comprising heating a porous metal template at a temperature range of 500 to 2000° C.; and passing a gas mixture comprising a carrier gas carrying along a vapor of an organometallic compound and at least one of a carbon precursor gas and a boron nitride precursor gas through the heated metal template is provided. The heating temperature causes the decomposition of the organometallic compound vapor into metal particles, the carbon precursor gas into graphene domains, and/or the boron nitride precursor gas into hexagonal-boron nitride domains. The graphene domains and/or the hexagonal-boron nitride domains nucleate and grow on the metal particles and the metal template to form a three-dimensional interconnected porous network of graphene and/or the hexagonal-boron nitride. A foam-like structure produced by a process as described above is also provided. A foam-like structure as described above for use in electrochemistry, solar cells, filler, thermal interface material, sensing or biological applications is further provided.

Claims (18)

1. A chemical vapor deposition process comprising:

heating a porous metal template at a temperature range of 500 to 2000° C.; and

passing a gas mixture comprising a carrier gas carrying along a vapor of an organometallic compound and at least one of a carbon precursor gas and a boron nitride precursor gas through the heated metal template,

wherein the heating temperature causes the decomposition of the organometallic compound vapor into metal particles, the carbon precursor gas into graphene domains, and/or the boron nitride precursor gas into hexagonal-boron nitride domains,

wherein the metal particles are deposited on the surface and within the pores of the metal template,

wherein the graphene domains and/or the hexagonal-boron nitride domains nucleate and grow on the metal particles and on and within the metal template to form a three-dimensional interconnected porous network of graphene and/or hexagonal-boron nitride, and

wherein the three-dimensional interconnected porous network of graphene and/or hexagonal-boron nitride comprises walls having a thickness of around 80 μm to 100 μm.

2. The process of claim 1 , wherein the metal template is macroporous.

3. The process of claim 1 , wherein the metal template comprises nickel or copper.

4. The process of claim 1 , wherein the organometallic compound comprises a metallocene.

5. The process of claim 4 , wherein the metallocene is selected from the group consisting of ferrocene, nickelocene, cobaltocene, ruthenocene, chromocene and osmocene.

6. The process of claim 4 , wherein the vapor of the metallocene is formed by the sublimation of the metallocene in powder form.

7. The process of claim 4 , wherein the vapor of the metallocene is formed by the boiling of the metallocene in solution form.

8. The process of claim 1 , wherein the metal particles accelerate the nucleation and growth of the graphene domains and/or the hexagonal-boron nitride domains.

9. The process of claim 1 , wherein the carbon precursor gas comprises an alkane, alkene or alcohol, up to a carbon chain of 4 carbon atoms.

10. The process of claim 1 , further comprising removing the metal template from the three-dimensional interconnected porous network of graphene and/or hexagonal-boron nitride.

11. The process of claim 10 , wherein the metal template is removed by contacting with an acid.

12. The process of claim 1 , wherein the carrier gas carries along a vapor of an organometallic compound and at least one of a carbon precursor gas and a boron nitride precursor gas into a chemical vapor deposition chamber prior to passing the gas mixture through the heated metal template.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 13, 2018
From: LOEBLEIN, MANUELA; TSANG, SIU HON; TEO, HANG TONG EDWIN
To: NANYANG TECHNOLOGICAL UNIVERSITY
Reel/Frame 047766/0415 →
Priority Claims (1)
SG 10201601834U · Mar 9, 2016 · national
Continuity (1)
Related Publication 20190093217A1 · Mar 28, 2019