IP Library Granted Patent US 10,431,417
Granted Patent B2
US 10,431,417 · App. 16/090,452 · Granted Oct 1, 2019

Charged particle beam device and sample holder

Inventors: Akira Ikeuchi (Tokyo, JP); Shigeru Haneda (Tokyo, JP); Yoshinobu Hoshino (Tokyo, JP)
Assignee: Hitachi High-Technologies Corporation
H01J37/20G01N1/28H01J37/22H01J37/222H01J37/28H01J2237/20214
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Quick Facts
Patent No.
US 10,431,417
App. No.
16/090,452
Granted
Oct 1, 2019
Kind
B2
Abstract

In order to provide a sample holder capable of easily searching for an observation field of view, the sample holder includes a sample placement portion including a first top surface on which a counterbore part is formed and a rotational axis for rotating the first top surface horizontally, the counterbore part being aligned by being mounted with a sample supporting member having a pattern for alignment, a sample base portion including an opening through which the sample placement portion is capable of moving vertically and a second top surface around the opening, and a sample cover portion which has conductivity and is pressed down toward a direction of the second top surface of the sample base portion, so that a top surface of the sample supporting member placed on the sample placement portion and the second top surface of the sample base portion are flush with each other.

Claims (38)

1. A charged particle beam device comprising a charged particle source, a sample holder placed with a sample thereon, a charged particle beam optical system in which the sample is irradiated with a charged particle emitted from the charged particle source as a charged particle beam, a detector detecting a signal emitted from the sample, and a controller controlling each constituent element, wherein

the sample holder includes

a sample placement portion including a first top surface on which a counterbore part is formed and a rotational axis for rotating the first top surface horizontally, the counterbore part being aligned by being mounted with a sample supporting member having a pattern for alignment including a central marker and a pattern and an address marker for analyzing magnification and a rotation angle,

a sample base portion including an opening through which the sample placement portion is capable of moving vertically and a second top surface around the opening, and

a sample cover portion which has conductivity, includes a window through which the pattern for alignment of the sample supporting member is exposed, and is pressed down toward a direction of the second top surface of the sample base portion, so that a top surface of the sample supporting member placed on the sample placement portion and the second top surface are flush with each other.

2. The charged particle beam device according to claim 1 , wherein

the pattern for analyzing the magnification and rotation angle is a grid pattern.

3. The charged particle beam device according to claim 1 , wherein

the sample supporting member further includes a front and back direction recognition marker.

4. The charged particle beam device according to claim 1 , wherein

the sample supporting member is made of an insulative material and is formed with a conductive coating on a surface thereof.

5. The charged particle beam device according to claim 1 , wherein

the charged particle beam device further includes a sample moving mechanism which displaces a position or an orientation of the sample holder or both thereof.

6. The charged particle beam device according to claim 1 , wherein

the sample holder includes a plurality of sets of the sample placement portion and the sample cover portion.

7. A charged particle beam device comprising a charged particle source, a sample holder placed with a sample, a charged particle beam optical system in which the sample is irradiated with a charged particle emitted from the charged particle source as a charged particle beam, a detector detecting a signal emitted from the sample, and a controller controlling each constituent element, wherein

the sample holder includes

a sample placement portion including a first top surface on which a counterbore part is formed and a rotational axis for rotating the first top surface horizontally, the counterbore part being aligned by being mounted with a sample supporting member having a pattern for alignment including a central marker and a pattern and an address marker for analyzing magnification and a rotation angle,

a sample base portion including an opening through which the sample placement portion is capable of moving vertically and a second top surface around the opening, and

a sample cover portion which has conductivity, includes a window through which the pattern for alignment of the sample supporting member is exposed, and is pressed down toward a direction of the second top surface of the sample base portion, so that a top surface of the sample supporting member placed on the sample placement portion and the second top surface are flush with each other,

the controller includes

a first image processor which processes first imaging data including a pattern obtained by using an optical microscope for analyzing the magnification and rotation angle of the sample supporting member and the central marker or the address marker,

a second image processor which processes second imaging data including a pattern obtained by using a detector for analyzing the magnification and rotation angle of the sample supporting member and the central marker,

a pattern data storage unit in which pattern data including shape data and coordinate data of the pattern for alignment is stored, and

a position magnification calculating unit which calculates observation magnification using the first image data processed by the first image processor, the second image data processed by the second image processor, and the pattern data stored in the pattern data storage unit, and relative positional information of pattern coordinates and a field-of-view position.

8. The charged particle beam device according to claim 7 , wherein

the controller further includes a field-of-view alignment unit which calculates positional information for obtaining the same field of view as the field of view obtained with the optical microscope.

9. The charged particle beam device according to claim 7 , wherein

the sample holder includes a plurality of sets of the sample placement portion and the sample cover portion, and

the controller is recorded with center position of each sample placement portion.

10. A sample holder comprising:

a sample placement portion including a first top surface on which a counterbore part is formed and a rotational axis for rotating the first top surface horizontally, the counterbore part being aligned by being mounted with a sample supporting member having a pattern for alignment including a central marker and a pattern and an address marker for analyzing magnification and a rotation angle;

a sample base portion including an opening through which the sample placement portion is capable of moving vertically and a second top surface around the opening; and

a sample cover portion which has conductivity, includes a window through which the pattern for alignment of the sample supporting member is exposed, and is pressed down toward a direction of the second top surface of the sample base portion, so that a top surface of the sample supporting member placed on the sample placement portion and the second top surface are flush with each other.

11. The sample holder according to claim 10 , wherein

the counterbore part of the sample placement portion is a portion for performing alignment between the central marker of the sample supporting member and the rotational axis of the sample placement portion.

12. The sample holder according to claim 10 , wherein

the sample holder includes a plurality of sets of the sample placement portion and the sample cover portion.

Assignments (2)
CHANGE OF NAME AND ADDRESS Recorded Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 1, 2018
From: IKEUCHI, AKIRA; HANEDA, SHIGERU; HOSHINO, YOSHINOBU
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 047021/0996 →
Continuity (1)
Related Publication 20190122853A1 · Apr 25, 2019