Composition for forming dense siliceous film
View Patent ↗[Object] To provide a polysilazane-containing composition for forming a film. In order to form a dense and processable siliceous film, the composition is intended to be employed in a two-step conversion process comprising the steps of: forming a film having a dry surface from the composition provided that the conversion in to the siliceous substance proceeds insufficiently; and then subjecting the film to secondary processing. [Means] The present invention provides a polysilazane-containing film-forming composition comprising a particular amine compound, a polysilazane compound, and a solvent; and the invention also provides a process for forming a siliceous substance. In the process, the composition is applied to coat a substrate and thereafter converted into the siliceous substance. The particular amine compound has two amine groups, and the amine groups have at least one phenyl-substituted hydrocarbon group.
1. A composition comprising:
a) an amine compound represented by the following formula (I):
in which
each R A is independently hydrogen or a substituted or unsubstituted C 1 -C 10 hydrocarbon group provided that at least one R A is a phenyl-substituted C 1 -C 3 hydrocarbon group,
each R B is independently hydrogen or C 1 -C 10 hydrocarbon group, cyclic hydrocarbon group or unsaturated hydrocarbon group provided that both R B s are not hydrogens at the same time,
each of p1 and p2 is independently an integer of 0 to 3,
and p3 is an integer of 1 to 3;
b) a polysilazane compound;
and
c) a solvent.
2. The composition according to claim 1 , wherein said amine compound is represented by the formula (I) in which at least one of said R A s is a benzyl group.
3. The composition according to claim 1 , wherein said polysilazane compound comprises a repeating unit represented by the following formula (IIa):
in which
each of R C , R D and R E is independently hydrogen, an alkyl group, an alkenyl group, a cycloalkyl group, an aryl group, an alkylsilyl group, an alkylamino group, an alkoxy group, or a fluoroalkyl group, which contains a carbon atom directly connecting to the silicon atom, provided that at least one of R C , R D and R E is hydrogen atom,
and has a number average molecular weight of 50 to 50000.
4. The composition according to claim 2 , wherein said polysilazane compound comprises a repeating unit represented by the following formula (IIa):
in which
each of R C , R D and R E is independently hydrogen, an alkyl group, an alkenyl group, a cycloalkyl group, an aryl group, an alkylsilyl group, an alkylamino group, an alkoxy group, a fluoroalkyl group, which contains a carbon atom directly connecting to the silicon atom, provided that at least one of R C , R D and R E is hydrogen atom,
and has a number average molecular weight of 50 to 50000.
5. The composition according to claim 1 , which contains said amine compound in an amount of 1 to 35 weight parts based on 100 weight parts of said polysilazane compound.
6. The composition according to claim 1 , wherein said polysilazane compound is perhydropolysilazane.
7. The composition according to claim 1 , which contains said polysilazane compound in an amount of 0.01 to 30 weight parts based on 100 weight parts of said composition.
8. The composition according to claim 5 , wherein said polysilazane compound is perhydropolysilazane.
9. The composition according to claim 8 , which contains said polysilazane compound in an amount of 0.01 to 30 weight parts based on 100 weight parts of said composition.
10. The composition according to claim 1 , wherein said solvent is selected from the group consisting of alkyl ethers, aliphatic hydrocarbons, aliphatic cyclic hydrocarbons and aromatic hydrocarbons, and has a boiling point of 130° C. or above.
11. The composition according to claim 9 , wherein said solvent is selected from the group consisting of alkyl ethers, aliphatic hydrocarbons, aliphatic cyclic hydrocarbons and aromatic hydrocarbons, and has a boiling point of 130° C. or above.
12. A process for forming a siliceous film, which comprises the steps of: coating a substrate with the composition according to claim 1 , to form a film having surface dryness; and then subjecting the film to a treatment selected from the group consisting of heat treatment, humidifying treatment, light irradiation treatment, UV-ozone treatment, plasma treatment, corona treatment, electron beam treatment, and combinations thereof.
13. A process for forming a siliceous film, which comprises the steps of: coating a substrate with the composition according to claim 11 , to form a film having surface dryness; and then subjecting the film to a treatment selected from the group consisting of heat treatment, humidifying treatment, light irradiation treatment, UV-ozone treatment, plasma treatment, corona treatment, electron beam treatment, and combinations thereof.