IP Library Assignment 053323/0760
Patent Assignment
Reel/Frame 053323/0760

Change of Legal Entity

Recorded: 2020-07-27 Pages: 10
Assignor
AZ ELECTRONIC MATERIALS S.À R.L.
Executed: 2019-11-20
Assignee
AZ ELECTRONIC MATERIALS GMBH
FRANKFURTER STRASSE, DARMSTADT, 250 64293, GERMANY
Covered Properties (94)
Thermally Stable, Moisture Curable Polysilazanes and Polysiloxazanes
Patent: 6,652,978 →
Application: 10/075,729 →
Publication: US 2003/0083453
Process Solutions Containing Surfactants
Patent: 7,129,199 →
Application: 10/616,662 →
Publication: US 2004/0053800
Process Solutions Containing Surfactants
Patent: 7,521,405 →
Application: 10/804,513 →
Publication: US 2004/0204328
Process Solutions Containing Surfactants
Patent: 7,591,270 →
Application: 11/520,971 →
Publication: US 2007/0010409
Coatings Containing Polysilazanes for Metal and Polymer Surfaces
Patent: 8,309,228 →
Application: 11/991,718 →
Publication: US 2009/0286086
Color-Pigmented Paint Composition Having High Covering Powder, Increased Scratch Resistance, and Easy-to-Clean Properties
Patent: 8,470,924 →
Application: 12/600,050 →
Publication: US 2010/0305245
Compositions of Neutral Layer for Directed Self Assembly Block Copolymers and Processes Thereof
Patent: 8,691,925 →
Application: 13/243,640 →
Publication: US 2013/0078576
Low Dielectric Photoimageable Compositions and Electronic Devices Made Therefrom
Patent: 8,871,425 →
Application: 13/369,809 →
Publication: US 2013/0209754
Methods and Materials for Removing Metals in Block Copolymers
Patent: 8,686,109 →
Application: 13/416,669 →
Publication: US 2013/0233827
Neutral Layer Polymer Composition for Directed Self Assembly and Processes Thereof
Patent: 8,835,581 →
Application: 13/492,125 →
Publication: US 2013/0330668
Positive Photosensitive Material
Patent: 9,012,126 →
Application: 13/524,790 →
Publication: US 2013/0337380
Negative-Working Thick Film Photoresist
Patent: 8,906,594 →
Application: 13/524,811 →
Publication: US 2013/0337381
Antireflective Compositions and Methods of Using Same
Patent: 9,170,494 →
Application: 13/527,156 →
Publication: US 2013/0337379
Antireflective Coating Composition and Process Thereof
Patent: 8,906,592 →
Application: 13/563,877 →
Publication: US 2014/0038109
Developable Bottom Anti-Reflective Coating
Patent: 8,900,797 →
Application: 13/627,599 →
Publication: US 2014/0087311
Positive Working Photosensitive Material
Patent: 8,841,062 →
Application: 13/693,496 →
Publication: US 2014/0154624
Stable Metal Compounds, Their Compositions and Methods
Patent: 9,315,636 →
Application: 13/707,993 →
Publication: US 2014/0159278
Template for Self Assembly and Method of Making a Self Assembled Pattern
Application: 13/892,890 →
Publication: US 2014/0335324
Antireflective Coating Composition and Process Thereof
Patent: 9,152,051 →
Application: 13/917,022 →
Publication: US 2014/0370444
Spin-On Compositions of Soluble Metal Oxide Carboxylates and Methods of Their Use
Patent: 9,201,305 →
Application: 13/930,711 →
Publication: US 2015/0004801
Stable Metal Compounds as Hardmasks and Filling Materials, Their Compositions and Methods of Use
Patent: 9,296,922 →
Application: 14/015,222 →
Publication: US 2015/0064904
Underlayer Composition for Promoting Self Assembly and Method of Making and Using
Patent: 9,093,263 →
Application: 14/039,809 →
Publication: US 2015/0093912
Underlayer Composition for Promoting Self Assembly and Method of Making and Using
Patent: 9,181,449 →
Application: 14/107,325 →
Publication: US 2015/0166821
Spin Coatable Metallic Hard Mask Compositions and Processes Thereof
Patent: 9,409,793 →
Application: 14/154,929 →
Publication: US 2015/0200090
Methods and Materials for Removing Metals in Block Copolymers
Patent: 9,040,659 →
Application: 14/175,203 →
Publication: US 2014/0151330
Compositions of Neutral Layer for Directed Self Assembly Block Copolymers and Processes Thereof
Patent: 9,052,598 →
Application: 14/180,848 →
Publication: US 2014/0193754
Antireflective Coating Compositions and Processes Thereof
Patent: 9,274,426 →
Application: 14/295,656 →
Publication: US 2015/0309410
Negative-Working Photosensitive Siloxane Composition
Patent: 9,164,386 →
Application: 14/388,187 →
Publication: US 2015/0064613
Negative-Working Photosensitive Siloxane Composition
Patent: 9,684,240 →
Application: 14/388,189 →
Publication: US 2015/0331319
Method for Forming Dense Silicic Film
Patent: 9,534,145 →
Application: 14/430,740 →
Publication: US 2015/0252222
Aromatic Imide Compound and Method for Producing Same
Patent: 9,505,721 →
Application: 14/439,477 →
Publication: US 2015/0299132
Positive-Type Photosensitive Siloxane Composition
Patent: 9,580,567 →
Application: 14/439,870 →
Publication: US 2015/0291749
Method for Forming of Siliceous Film and Siliceous Film Formed Using Same
Application: 14/440,773 →
Publication: US 2015/0298980
Polyoxometalate and Heteropolyoxometalate Compositions and Methods for Their Use
Patent: 9,418,836 →
Application: 14/445,757 →
Publication: US 2015/0200091
Composition for Forming Resist Underlayer
Patent: 9,328,198 →
Application: 14/514,728 →
Publication: US 2015/0118624
Silicon Containing Block Copolymers for Direct Self-Assembly Application
Patent: 9,505,945 →
Application: 14/527,939 →
Publication: US 2016/0122579
Composition for Forming Topcoat Layer and Resist Pattern Formation Method Employing the Same
Patent: 9,804,493 →
Application: 14/549,911 →
Publication: US 2015/0147701
Metal Hardmask Composition and Processes for Forming Fine Patterns on Semiconductor Substrates
Patent: 9,499,698 →
Application: 14/619,603 →
Publication: US 2016/0230019
Composite of Metal Oxide Nanoparticles and Silsesquioxane Polymer, Method for Producing Same, and Composite Material Produced Using Composite Thereof
Patent: 9,505,888 →
Application: 14/652,666 →
Publication: US 2015/0329679
Composition for Forming Overlay Film, and Resist Pattern Formation Method Employing the Same
Patent: 9,810,988 →
Application: 14/652,667 →
Publication: US 2015/0331323
Composite of Silicon Oxide Nanoparticles and Silsesquioxane Polymer, Method for Producing Same, and Composite Material Produced Using Composite Thereof
Application: 14/652,672 →
Publication: US 2016/0194451
Substrate Processing Method, Substrate Processing Apparatus, Method of Manufacturing Semiconductor Device and Non-Transitory Computer-Readable Recording Medium
Patent: 9,502,239 →
Application: 14/707,350 →
Publication: US 2015/0262817
Fine Resist Pattern-Forming Composition and Pattern Forming Method Using Same
Patent: 9,921,481 →
Application: 14/768,660 →
Publication: US 2016/0002494
Composition for Forming Fine Resist Pattern, and Pattern Formation Method Using Same
Patent: 9,411,232 →
Application: 14/770,694 →
Publication: US 2016/0011508
Composition for Forming Topcoat Layer and Resist Pattern Formation Method Employing the Same
Patent: 9,482,952 →
Application: 14/773,047 →
Publication: US 2016/0011510
Rinsing Liquid for Lithography and Pattern Forming Method Using Same
Patent: 9,494,867 →
Application: 14/787,706 →
Publication: US 2016/0109805
Photoresist Composition and Method of Manufacturing Substrate for Display Device by Using the Same
Patent: 9,851,635 →
Application: 14/801,111 →
Publication: US 2016/0018731
Novel Compositions and Processes for Self-Assembly of Block Copolymers
Patent: 9,574,104 →
Application: 14/885,328 →
Film-Forming Composition and Film-Forming Method Using Same
Application: 14/913,821 →
Publication: US 2016/0244638
Novel Compositions and Use Thereof for Modification of Substrate Surfaces
Application: 14/975,969 →
Publication: US 2017/0174931
Negative-Working Photoresist Compositions for Laser Ablation and Use Thereof
Application: 14/976,498 →
Publication: US 2017/0176856
Materials Containing Metal Oxides, Processes for Making Same, and Processes for Using Same
Application: 14/978,232 →
Publication: US 2017/0176860
Silicon-Containing Heat- or Photo-Curable Composition
Patent: 9,817,312 →
Application: 15/031,668 →
Publication: US 2016/0266490
Perhydropolysilazane, Composition Containing Same, and Method for Forming Silica Film Using Same
Patent: 9,793,109 →
Application: 15/039,440 →
Publication: US 2016/0379817
Copolymerized Polysilazane, Manufacturing Method Therefor, Composition Comprising Same, and Method for Forming Siliceous Film Using Same
Application: 15/305,722 →
Publication: US 2017/0044401
Top-Layer Membrane Formation Composition and Method for Forming Resist Pattern Using Same
Application: 15/312,442 →
Publication: US 2017/0090288
Hybrid Material for Use as Coating Means in Optoelectronic Components
Application: 15/329,311 →
Publication: US 2017/0210944
Composition for Resist Patterning and Method for Forming Pattern Using Same
Application: 15/519,044 →
Publication: US 2017/0219927
Positive Type Photosensitive Siloxane Composition, Active Matrix Substrate, Display Apparatus, and Method of Manufacturing Active Matrix Substrate
Application: 15/546,596 →
Publication: US 2018/0017869
Composition for Forming Underlayer and Method for Forming Underlayer Therewith
Application: 15/550,490 →
Publication: US 2018/0039178
A Photosensitive Composition and Color Converting Film
Application: 15/553,594 →
Publication: US 2018/0046080
Compositions and Methods That Promote Charge Complexing Copper Protection During Low Pka Driven Polymer Stripping
Application: 15/554,578 →
Publication: US 2018/0074408
Composition for Forming Coating Film and Method for Forming Coating Film Using Same
Application: 15/567,846 →
Publication: US 2018/0201736
Optical Functional Film and Method for Producing the Same
Application: 15/570,110 →
Publication: US 2018/0149774
Inorganic Polysilazane Resin
Application: 15/591,796 →
Publication: US 2017/0240423
Negative-Working Photoresist Compositions for Laser Ablation and Use Thereof
Application: 15/628,711 →
Publication: US 2017/0285475
A Photosensitive Composition and Color Converting Film
Application: 15/764,080 →
Publication: US 2018/0284613
Method for Producing Silazane-Siloxane Copolymers and the Use of Such Copolymers
Application: 15/771,477 →
Publication: US 2018/0312641
High Heat Resistance Resist Composition and Pattern Forming Method Using the Same
Application: 15/773,029 →
Publication: US 2019/0033717
Composition for Forming Fine Resist Pattern and Pattern Forming Method Using Same
Application: 15/775,661 →
Publication: US 2018/0329301
Negative Type Photosensitive Composition Curable at Low Temperature
Application: 15/999,429 →
Publication: US 2021/0208503
Silazane-Siloxane Random Copolymers, Their Production and Use
Application: 16/077,870 →
Publication: US 2020/0255599
Positive Type Photosensitive Siloxane Composition
Application: 16/078,767 →
Publication: US 2019/0064660
Positive Working Photosensitive Material
Application: 16/079,711 →
Publication: US 2019/0064662
Composition for Forming Fine Pattern and Method for Forming Fine Pattern Using the Same
Application: 16/084,615 →
Publication: US 2019/0079398
Photosensitive Siloxane Composition
Application: 16/087,713 →
Publication: US 2019/0077961
Negative Type Photosensitive Composition Curable at Low Temperature
Application: 16/089,021 →
Publication: US 2020/0301277
Gap Filling Composition and Pattern Forming Method Using Low Molecular Weight Compound
Application: 16/090,992 →
Publication: US 2019/0113848
Composition for Forming Dense Siliceous Film
Application: 16/096,116 →
Publication: US 2019/0136088
Gap Filling Composition and Pattern Forming Method Using Composition Containing Polymer
Application: 16/303,813 →
Publication: US 2020/0319556
A Rinse Composition, a Method for Forming Resist Patterns and a Method for Making Semiconductor Devices
Application: 16/308,168 →
Publication: US 2019/0250515
Formulation for an Led Encapsulation Material
Application: 16/316,759 →
Publication: US 2020/0181332
Formulation for Led Encapsulation Material
Application: 16/316,776 →
Publication: US 2019/0300748
Enviromentally Stable, Thick Film, Chemically Amplified Resist
Application: 16/323,005 →
Publication: US 2020/0183278
Polymer Compositions for Self-Assembly Applications
Application: 16/323,102 →
Publication: US 2019/0161570
Bottom Antireflective Coating Forming Composition
Application: 16/324,299 →
Publication: US 2019/0171107
Composition for Black Matrix and Method for Producing Black Matrix Using the Same
Application: 16/325,937 →
Publication: US 2019/0204734
Chemically Amplified Positive Photoresist Composition and Pattern Forming Method Using Same
Application: 16/340,413 →
Publication: US 2019/0235382
Siloxazane Compound and Composition Comprising the Same, and Method for Producing Silceous Film Using the Same
Application: 16/462,803 →
Publication: US 2019/0300713
A Lithography Composition, a Method for Forming Resist Patterns and a Method for Making Semiconductor Devices
Application: 16/462,972 →
Publication: US 2019/0377263
Black Matrix Composition, Blck Matrix, and Black Matrix Production Method
Application: 16/467,246 →
Publication: US 2020/0277494
Novel Compositions and Processes for Self-Assembly of Block Copolymers
Application: 16/468,740 →
Publication: US 2020/0019062
Composition of Spin-on Materials Containing Metal Oxide Nanoparticles and an Organic Polymer
Application: 16/470,711 →
Publication: US 2020/0087534
Photosensitive Siloxane Composition
Application: 16/806,481 →
Publication: US 2020/0201179
Related Assignments (19)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest Dec 8, 2009
From: BRAND, STEFAN; DIERDORF, ANDREAS; LIEBE, HUBERT; OSTEROD, FRANK
To: CLARIANT INTERNATIONAL, LTD.
Reel/Frame 023618/0957 →
Assignment of Assignor's Interest May 10, 2012
From: AIR PRODUCTS AND CHEMICALS, INC.
To: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
Reel/Frame 028191/0393 →
Assignment of Assignor's Interest May 17, 2012
From: YIN, JIAN; WU, HENGPENG; THIYAGARAJAN, MUTHIAH; HONG, SUNGEUN
To: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
Reel/Frame 028224/0060 →
Assignment of Assignor's Interest May 31, 2012
From: WU, HENGPENG; CAO, YI; HONG, SUNGEUN; YIN, JIAN
To: AZ ELECTRONIC MATERIALS USA CORP.
Reel/Frame 028315/0234 →
Assignment of Assignor's Interest Jul 26, 2012
From: CLARIANT FINANCE (BVI) LIMITED
To: AZ ELECTRONIC MATERIALS (LEXEMBOURG) S.A.R.L.
Reel/Frame 028642/0290 →
Address Change Jan 23, 2013
From: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
To: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
Reel/Frame 029675/0068 →
Assignment of Assignor's Interest Oct 8, 2013
From: YAO, HUIRONG; RAHMAN, M. DALIL; MULLEN, SALEM K.; CHO, JOONYEON
To: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
Reel/Frame 031365/0186 →
Assignment of Assignor's Interest Oct 8, 2013
From: LIU, WEIHONG; LU, PING-HUNG; TOUKHY, MEDHAT; LAI, SOOKMEE
To: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
Reel/Frame 031365/0086 →
Assignment of Assignor's Interest Feb 12, 2014
From: AZ ELECTRONIC MATERIALS USA CORP.
To: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
Reel/Frame 032205/0673 →
Assignment of Assignor's Interest Apr 16, 2014
From: ZHANG, RUZHI; KIM, JIHOON; PATEL, BHARATKUMAR K.; WOLFER, ELIZABETH
To: AZ ELECTRONIC MATERIALS USA CORP.
Reel/Frame 032688/0648 →
Assignment of Assignor's Interest Apr 23, 2014
From: AZ ELECTRONIC MATERIALS USA CORP.
To: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
Reel/Frame 032736/0422 →
Change of Address Jul 15, 2014
From: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
To: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
Reel/Frame 033329/0264 →
Assignment of Assignor's Interest Aug 22, 2014
From: RAHMAN, M. DALIL; ANYADIEGWU, CLEMENT; MCKENZIE, DOUGLAS; CHO, JOONYEON
To: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
Reel/Frame 033594/0156 →
Assignment of Assignor's Interest Aug 22, 2014
From: YAO, HUIRONG; LIN, GUANYANG; CHO, JOONYEON
To: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
Reel/Frame 033593/0989 →
Change of Address Jan 12, 2017
From: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.À R.L.
To: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.À R.L.
Reel/Frame 041345/0585 →
Assignment of Assignor's Interest Feb 20, 2017
From: AIR PRODUCTS AND CHEMICALS, INC.
To: VERSUM MATERIALS US, LLC
Reel/Frame 041772/0733 →
Merger Jul 27, 2020
From: RIDGEFIELD ACQUISITION
To: AZ ELECTRONIC MATERIALS S.À R.L.
Reel/Frame 053323/0591 →
Merger Jul 27, 2020
From: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.À R.L.
To: RIDGEFIELD ACQUISITION
Reel/Frame 053324/0198 →
Assignment of Assignor's Interest Jul 27, 2020
From: AZ ELECTRONIC MATERIALS GMBH
To: MERCK PATENT GMBH
Reel/Frame 053323/0770 →