IP Library Granted Patent US 9,534,145
Granted Patent B2
US 9,534,145 · App. 14/430,740 · Granted Jan 3, 2017

Method for forming dense silicic film

View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 9,534,145
App. No.
14/430,740
Granted
Jan 3, 2017
Kind
B2
Abstract

The present invention provides a dense silicic film and a producing method thereof. This method comprises coating a composition for coating film, which comprises a polymer having a silazane bond on a substrate, on a substrate, irradiating with light having a maximal peak in the range of 160-179 nm wavelength, and then irradiating with light having 10-70 nm wavelength longer maximal peak wavelength than the light used in the previous irradiation.

Claims (28)

1. A method for producing silicic dense film comprising:

(1) a composition preparing step, in which a composition for a coating film comprising a polymer having a silazane bond and a solvent is prepared;

(2) a coating step, in which a coated film is formed by coating said composition for a coating film on a substrate;

(3) the first irradiating step, in which said coated film is irradiated with light having a maximal peak in the range of 160-179 nm wavelength; and

(4) the second irradiating step, in which the coated film after the first irradiating step is irradiated with light having 10-70 nm wavelength longer maximal peak wavelength than the light used in the first irradiating step,

and further wherein each irradiating step is carried out in an inert gas atmosphere where the oxygen concentration in said inert gas atmosphere is equal to or less than 100 ppm.

2. The method according to claim 1 , wherein irradiation light, which has a maximal peak in the range of 180-230 nm wavelength, is used at said second irradiating step (4).

3. The method according to claim 1 , wherein irradiation light, which has a maximal peak in the range of 165-175 nm wavelength, is used at said first irradiating step.

4. The method according to claim 1 , further comprising ( 5 ) the third irradiating step, in which the coated film after the second irradiating step is irradiated with light having 10-60 nm wavelength longer maximal peak wavelength than the light used in the second irradiating step.

5. The method according to claim 4 , wherein irradiation light, which has a maximal peak in the range of 180-230 nm wavelength, is used at the third irradiating step.

6. The method according to claim 1 , wherein said polymer having a silazane bond is a polysilazane.

7. The method according to claim 6 , wherein the polysilazane is a perhydropolysilazane.

8. The method according to claim 6 , wherein the polysilazane is an organopolysilazane.

9. The method according to any of claim 1 , wherein the composition for coating film further comprises an additive.

10. The method according to claim 9 , wherein said additive is an amine compound.

11. The method according to claim 10 , wherein said amine compound is selected from the group consisting of monoamine compounds, diamine compounds, allylamine compounds, benzylamine compounds, pyrrole compounds, pyridine compounds, pyrazine compounds,—alkoxyalkylamine compounds, aminoalkylether compounds, and disilazane compounds.

12. The method according to claim 9 , wherein said additive is a metal complex compound.

13. The method according to claim 12 , wherein said metal complex compound contains metal selected from the group consisting of nickel, titanium, platinum, rhodium, cobalt, iron, cobalt, iridium, aluminum, ruthenium, palladium, rhenium and tungsten.

14. The method according to claim 12 , wherein said metal complex compound has an acetylacetonato group, a carbonyl group or a carboxylate group.

15. The method according to claim 14 , wherein said carboxylate group is a residue of carboxylic acid selected from the group consisting of formic acid, acetic acid, propionic acid, butyric acid, octane acid, lauric acid, stearic acid, oleic acid, lactic acid, succinic acid and citric acid.

16. The method according to claim 1 , wherein said inert gas atmosphere is nitrogen gas atmosphere.

17. A dense silicic film produced by the method according to claim 1 .

18. The method according to claim 4 wherein said polymer having a silazane bond is a polysilazane.

19. A method for producing silicic dense film comprising:

(1) a composition preparing step, in which a composition for a coating film comprising a polymer having a silazane bond and a solvent is prepared;

(2) a coating step, in which a coated film is formed by coating said composition for a coating film on a substrate;

(3) the first irradiating step, in which said coated film is irradiated with light having a maximal peak in the range of 160-179 nm wavelength; and

(4) the second irradiating step, in which the coated film after the first irradiating step is irradiated with light having 10-70 nm wavelength longer maximal peak wavelength than the light used in the first irradiating step, and further wherein each irradiating step is carried out in vacuum.

Assignments (6)
MERGER Recorded Jul 27, 2020
From: RIDGEFIELD ACQUISITION
To: AZ ELECTRONIC MATERIALS S.À R.L.
Reel/Frame 053323/0591 →
CHANGE OF LEGAL ENTITY Recorded Jul 27, 2020
From: AZ ELECTRONIC MATERIALS S.À R.L.
To: AZ ELECTRONIC MATERIALS GMBH
Reel/Frame 053323/0760 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 27, 2020
From: AZ ELECTRONIC MATERIALS GMBH
To: MERCK PATENT GMBH
Reel/Frame 053323/0770 →
MERGER Recorded Jul 27, 2020
From: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.À R.L.
To: RIDGEFIELD ACQUISITION
Reel/Frame 053324/0198 →
CHANGE OF ADDRESS Recorded Jan 12, 2017
From: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.À R.L.
To: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.À R.L.
Reel/Frame 041345/0585 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 22, 2016
From: OZAKI, YUKI; SAKURAI, TAKAAKI; KOBAYASHI, MASAKAZU
To: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
Reel/Frame 039496/0550 →