Patent Assignment
Reel/Frame 041345/0585
Change of Address
Recorded: 2017-01-12
Pages: 9
Assignor
AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.À R.L.
Executed: 2016-10-01
Assignee
AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.À R.L.
46 PLACE GUILLAUME II, LUXEMBOURG, L-1648, LUXEMBOURG
Covered Properties
(76)
Novel Silazane and/or Polysilazane Compounds and Methods of Making
Patent:
6,329,487 →
Application:
09/439,871 →
Polysilazane/Polysiloxane Block Copolymers
Thermally Stable, Moisture Curable Polysilazanes and Polysiloxazanes
Polysilazane-Modified Polyamine Hardeners for Epoxy Resins
Use of Polysilazane for the Production of Hydrophobically and Oleophobically Modified Surfaces
Process Solutions Containing Surfactants
Process Solutions Containing Surfactants
Process Solutions Containing Surfactants
Use of Polysilazanes for Coating Metal Strips
Coatings Containing Polysilazanes for Metal and Polymer Surfaces
Method for Improving the Corrosion Resistance and Lightfastness of Painted Aluminum Oxide Layers
Coatings Comprisings Polysilazane for Preventing Scaling and Corrosion
Color-Pigmented Paint Composition Having High Covering Powder, Increased Scratch Resistance, and Easy-to-Clean Properties
Articles with Low Hydrogen Permeation and Their Use
Application:
12/670,176 →
Publication:
US 2010/0266840
Polysilazane-Containing Coatings For Increasing The Conversion Efficiency Of Encapsulated Solar Cells
Method For Producing Ceramic Passivation Layers on Silicon For Solar Cell Manufacture
Compositions of Neutral Layer for Directed Self Assembly Block Copolymers and Processes Thereof
Solar Cells With A Barrier Layer Based On Polysilazane
Low Dielectric Photoimageable Compositions and Electronic Devices Made Therefrom
Methods and Materials for Removing Metals in Block Copolymers
Neutral Layer Polymer Composition for Directed Self Assembly and Processes Thereof
Positive Photosensitive Material
Negative-Working Thick Film Photoresist
Antireflective Compositions and Methods of Using Same
Use of Polysilazanes for Coating Metal Strips
Application:
13/547,219 →
Publication:
US 2012/0276410
Antireflective Coating Composition and Process Thereof
Developable Bottom Anti-Reflective Coating
Positive Working Photosensitive Material
Stable Metal Compounds, Their Compositions and Methods
Template for Self Assembly and Method of Making a Self Assembled Pattern
Composition Comprising a Polymeric Thermal Acid Generator and Processes Thereof
Antireflective Coating Composition and Process Thereof
Spin-On Compositions of Soluble Metal Oxide Carboxylates and Methods of Their Use
Stable Metal Compounds as Hardmasks and Filling Materials, Their Compositions and Methods of Use
Underlayer Composition for Promoting Self Assembly and Method of Making and Using
Underlayer Composition for Promoting Self Assembly and Method of Making and Using
Spin Coatable Metallic Hard Mask Compositions and Processes Thereof
Methods and Materials for Removing Metals in Block Copolymers
Compositions of Neutral Layer for Directed Self Assembly Block Copolymers and Processes Thereof
Antireflective Coating Compositions and Processes Thereof
Inorganic Polysilazane Resin
Application:
14/377,001 →
Publication:
US 2015/0004421
Negative-Working Photosensitive Siloxane Composition
Negative-Working Photosensitive Siloxane Composition
Method for Forming Dense Silicic Film
Composition for Forming Fine Resist Pattern and Pattern Formation Method Using Same
Aromatic Imide Compound and Method for Producing Same
Positive-Type Photosensitive Siloxane Composition
Method for Forming of Siliceous Film and Siliceous Film Formed Using Same
Polyoxometalate and Heteropolyoxometalate Compositions and Methods for Their Use
Composition for Forming Resist Underlayer
Silicon Containing Block Copolymers for Direct Self-Assembly Application
Defect Reduction Methods and Composition for via Formation in Directed Self-Assembly Patterning
Application:
14/527,962 →
Publication:
US 2016/0122580
Composition for Forming Topcoat Layer and Resist Pattern Formation Method Employing the Same
Metal Hardmask Composition and Processes for Forming Fine Patterns on Semiconductor Substrates
Block Copolymers with Surface-Active Junction Groups, Compositions and Processes Thereof
Composite of Metal Oxide Nanoparticles and Silsesquioxane Polymer, Method for Producing Same, and Composite Material Produced Using Composite Thereof
Composition for Forming Overlay Film, and Resist Pattern Formation Method Employing the Same
Composite of Silicon Oxide Nanoparticles and Silsesquioxane Polymer, Method for Producing Same, and Composite Material Produced Using Composite Thereof
Bottom Antireflective Materials and Compositions
Application:
14/692,064 →
Publication:
US 2015/0227043
Substrate Processing Method, Substrate Processing Apparatus, Method of Manufacturing Semiconductor Device and Non-Transitory Computer-Readable Recording Medium
Fine Resist Pattern-Forming Composition and Pattern Forming Method Using Same
Composition for Forming Fine Resist Pattern, and Pattern Formation Method Using Same
Composition for Forming Topcoat Layer and Resist Pattern Formation Method Employing the Same
Rinsing Liquid for Lithography and Pattern Forming Method Using Same
Photoresist Composition and Method of Manufacturing Substrate for Display Device by Using the Same
Novel Compositions and Processes for Self-Assembly of Block Copolymers
Patent:
9,574,104 →
Application:
14/885,328 →
Coating Composition
Encapsulation Material for Light Emitting Diodes
Film-Forming Composition and Film-Forming Method Using Same
Novel Compositions and Use Thereof for Modification of Substrate Surfaces
Negative-Working Photoresist Compositions for Laser Ablation and Use Thereof
Application:
14/976,498 →
Publication:
US 2017/0176856
Materials Containing Metal Oxides, Processes for Making Same, and Processes for Using Same
Functionalized Porous Carbon, Methods for Making Same, and Methods for Using Same to Remove Contaminants from a Fluid
Application:
14/978,462 →
Publication:
US 2017/0173562
Silicon-Containing Heat- or Photo-Curable Composition
Perhydropolysilazane, Composition Containing Same, and Method for Forming Silica Film Using Same
Hybrid Material for Optoelectronic Applications
Related Assignments
(18)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest
Dec 8, 2009
From: BRAND, STEFAN; DIERDORF, ANDREAS; LIEBE, HUBERT; OSTEROD, FRANK
To: CLARIANT INTERNATIONAL, LTD.
Reel/Frame 023618/0957 →
Assignment of Assignor's Interest
May 10, 2012
From: AIR PRODUCTS AND CHEMICALS, INC.
To: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
Reel/Frame 028191/0393 →
Assignment of Assignor's Interest
May 31, 2012
From: WU, HENGPENG; CAO, YI; HONG, SUNGEUN; YIN, JIAN
To: AZ ELECTRONIC MATERIALS USA CORP.
Reel/Frame 028315/0234 →
Assignment of Assignor's Interest
Jul 26, 2012
From: CLARIANT FINANCE (BVI) LIMITED
To: AZ ELECTRONIC MATERIALS (LEXEMBOURG) S.A.R.L.
Reel/Frame 028642/0290 →
Assignment of Assignor's Interest
Jul 27, 2012
From: CLARIANT FINANCE (BVI) LIMITED
To: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
Reel/Frame 028663/0046 →
Assignment of Assignor's Interest
Jan 15, 2013
From: CLARIANT FINANCE (BVI) LIMITED
To: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
Reel/Frame 029659/0793 →
Address Change
Jul 22, 2013
From: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
To: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
Reel/Frame 030845/0545 →
Assignment of Assignor's Interest
Feb 12, 2014
From: AZ ELECTRONIC MATERIALS USA CORP.
To: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
Reel/Frame 032205/0673 →
Assignment of Assignor's Interest
Jul 9, 2014
From: CLARIANT FINANCE (BVI) LIMITED
To: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
Reel/Frame 033271/0903 →
Change of Address
Jul 15, 2014
From: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
To: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
Reel/Frame 033329/0264 →
Assignee Address Change
Aug 13, 2014
From: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
To: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
Reel/Frame 033523/0211 →
Assignment of Assignor's Interest
Aug 20, 2014
From: CLARIANT PRODUKTE (DEUTSCHLAND) GMBH
To: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
Reel/Frame 033571/0733 →
Change of Assignee Address
Nov 6, 2014
From: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
To: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
Reel/Frame 034180/0430 →
Assignment of Assignor's Interest
Feb 20, 2017
From: AIR PRODUCTS AND CHEMICALS, INC.
To: VERSUM MATERIALS US, LLC
Reel/Frame 041772/0733 →
Change of Legal Entity
Jul 27, 2020
From: AZ ELECTRONIC MATERIALS S.À R.L.
To: AZ ELECTRONIC MATERIALS GMBH
Reel/Frame 053323/0760 →
Merger
Jul 27, 2020
From: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.À R.L.
To: RIDGEFIELD ACQUISITION
Reel/Frame 053324/0198 →
Merger
Jul 27, 2020
From: RIDGEFIELD ACQUISITION
To: AZ ELECTRONIC MATERIALS S.À R.L.
Reel/Frame 053323/0591 →
Assignment of Assignor's Interest
Jul 27, 2020
From: AZ ELECTRONIC MATERIALS GMBH
To: MERCK PATENT GMBH
Reel/Frame 053323/0770 →