Composition for forming topcoat layer and resist pattern formation method employing the same
Provided is a composition for forming a topcoat layer, the composition including a graphene derivative including a hydrophilic group; and a solvent. Also provided is a pattern formation method, including disposing a resist composition on a substrate, to form a resist layer; coating the resist layer with a composition including a graphene derivative including a hydrophilic group, and a solvent; heating the composition to harden the composition; subjecting the resist layer to exposure using extreme ultraviolet light; and developing exposed resist layer with an alkali aqueous solution.
1. A composition for forming a topcoat layer, the composition comprising:
a graphene derivative including a hydrophilic group;
a solvent; and
a binder including a deep-ultraviolet absorbing group, wherein:
the graphene derivative is present in an amount of about 0.5 to about 10 wt % based on a total weight of the composition,
the binder is present in an amount about 0.01 to about 10 wt % based on a total weight of the composition,
the graphene derivative and the binder are present in a weight ratio of about 30:70 to about 50:50 in the composition, and
an oxygen content of the graphene derivative is equal to or greater than about 1 wt % and equal to or less than about 10 wt % based on a total weight of the graphene derivative.
2. The composition as claimed in claim 1 , wherein the hydrophilic group is selected from a hydroxyl group, a carboxyl group, an amino group, an amido group, a nitro group, a cyano group, a polyalkyleneoxide group, and a sulfo group.
3. The composition as claimed in claim 1 , wherein the graphene derivative is obtained by oxidizing graphene.
4. The composition as claimed in claim 1 , wherein a weight average molecular weight of the graphene derivative is about 1000 to about 20000.
5. A composition for forming a topcoat layer, the composition comprising:
a nonionic surfactant;
a graphene derivative including a hydrophilic group;
a solvent; and
a binder including a deep-ultraviolet absorbing group, wherein:
the graphene derivative is present in an amount of about 0.5 to about 10 wt % based on a total weight of the composition,
the binder is present in an amount about 0.01 to about 10 wt % based on a total weight of the composition, and
an oxygen content of the graphene derivative is equal to or greater than about 1 wt % and equal to or less than about 10 wt % based on a total weight of the graphene derivative.
6. The composition as claimed in claim 5 , wherein an amount of the nonionic surfactant is about 0.01 to about 0.5 wt % based on a total weight of the composition.
7. A pattern formation method, comprising:
disposing a resist composition on a substrate, to form a resist layer;
coating the resist layer with a topcoat composition for forming a topcoat layer, the topcoat composition including:
a graphene derivative including a hydrophilic group; and
a solvent;
heating the topcoat composition to harden the topcoat composition;
subjecting the resist layer to exposure using extreme ultraviolet light; and
developing exposed resist layer with an alkali aqueous solution.
8. The pattern formation method as claimed in claim 7 , wherein the extreme ultraviolet light has a wavelength in a range of about 5 to about 20 nm.
9. The pattern formation method as claimed in claim 8 , wherein the topcoat composition has a thickness of about 1 to about 100 nm on the resist layer.
10. The pattern formation method as claimed in claim 7 , wherein the heating step is carried out at a temperature of about 25 to about 150° C.