Antireflective coating composition and process thereof

1. An antireflective coating composition comprising a crosslinkable polymer, where the crosslinkable polymer comprises at least one unit of fused aromatic moiety, at least one unit with a phenylene moiety, and at least one hydroxybiphenyl unit, furthermore where the polymer comprises a crosslinking moiety of structure (4),

where R′ 3 , R″ 3 and R′″ 3 are independently hydrogen or a C 1 -C 4 alkyl.

2. The antireflective coating composition of claim 1 , where the crosslinkable polymer comprises at least one unit 1′, at least one unit 1″ and at least one unit 1′″

where A is a fused aromatic ring, B has a structure (2), and unit 1′″ is a group of structure (3),

where R 1 is H or C 1 -C 4 alkyl, R 2 is H or C 1 -C 4 alkyl, D and D′ are independently selected from a group consisting of hydrogen, hydroxyl and C 1 -C 4 alkyl, E and E′ are independently hydrogen or a group of structure 4, furthermore where the polymer comprises a crosslinking moiety of structure (4),

where R′ 3 , R″ 3 and R′″ 3 are independently hydrogen or a C 1 -C 4 alkyl.

3. The composition of claim 1 , where the fused aromatic moiety consists of 2 to 8 fused aromatic rings.

4. The composition of claim 1 , where the unit of fused aromatic moiety has structure (6) where D is independently selected from a group consisting of hydrogen, and C 1 -C 4 alkyl and E is independently selected from the group consisting of hydrogen or a group of structure 4

5. The composition of claim 1 , where the polymer further comprises unit of structure (8), where F is a fused aromatic ring moiety, D″ is chosen from the group consisting of hydrogen, hydroxyl C 1 -C 4 alkyl, substituted C 1 -C 4 alkyl, alkoxy, aryl, substituted aryl, alkylaryl, haloalkyl, amino and aminoalkyl, and E″ is hydrogen or a group of structure 4,

6. The composition of claim 5 , where the fused aromatic ring moiety F comprises 2-8 aromatic rings.

7. The composition of claim 1 , where the fused aromatic moiety has 2 to 5 aromatic rings.

8. The composition of claim 1 , where the fused aromatic moiety has 3 or 4 aromatic rings.

9. The composition of claim 1 , where the composition further comprises a thermal acid generator.

10. The composition of claim 1 , where the polymer has a carbon content of greater than 80 weight % by solid content.

11. The antireflective coating composition claim 1 having a carbon content of greater than 80 weight % by solid content after heating to 400° C.

12. A process for manufacturing a microelectronic device, comprising;

a) providing a substrate with a first layer of an antireflective coating composition from claim 1 ;

b) optionally, providing at least a second antireflective coating layer over the first antireflective coating composition layer;

b) coating a photoresist layer above the antireflective coating layers;

c) imagewise exposing to radiation the photoresist layer;

d) developing the photoresist layer with an aqueous alkaline developing solution.

13. The process of claim 12 , where the second antireflective coating comprises silicon.

14. The process of claim 13 , where the photoresist is imageable with radiation from 240 nm to 12 nm.