Perhydropolysilazane, composition containing same, and method for forming silica film using same
View Patent ↗[Problem] To provide a perhydropolysilazane making it possible to form a siliceous film with minimal defects, and a curing composition comprising the perhydropolysilazane. [Means for Solution] The present invention provides a perhydropolysilazane having a weight-average molecular weight of 5,000 to 17,000, characterized in that when 1 H-NMR of a 17% by weight solution of said perhydropolysilazane dissolved in xylol is measured, the ratio of the amount of SiH 1,2 based on the aromatic ring hydrogen content of the xylol is 0.235 or less and the ratio of the amount of NH based on the aromatic ring hydrogen content of the xylol is 0.055 or less, and a curing composition comprising the perhydropolysilazane. The present invention also provides a method for forming a siliceous film, comprising coating the curing composition on a substrate and heating.
1. A perhydropolysilazane having a weight-average molecular weight of 5,000 to 17,000, characterized in that when 1 H-NMR of a 17% by weight solution of said perhydropolysilazane dissolved in xylol is measured, the ratio of the amount of SiH 1,2 based on the amount of the aromatic ring hydrogen content of the xylol is 0.235 or less and the ratio of the amount of NH based on the amount of the aromatic ring hydrogen content of the xylol is 0.055 or less, wherein the perhydropolysilazane contains a structure of the following formula:
2. The perhydropolysilazane according to claim 1 , wherein the perhydropolysilazane comprises a repeating unit selected from the group consisting of the general formulae (Ia), (Ib), (Ic), (Id), (Ie), and (If) and a terminal group of the formula (Ig).
3. The perhydropolysilazane according to claim 1 , wherein the weight-average molecular weight is 5,700 to 15,000.
4. A curing composition comprising the perhydropolysilazane according to claim 1 and a solvent.
5. The curing composition according to claim 4 , wherein said solvent is selected from a group consisting of (a) an aromatic compound, (b) a saturated hydrocarbon compound, (c) an unsaturated hydrocarbon compound, (d) an ether, (e) an ester, and (f) a ketone.
6. The curing composition according to claim 4 , wherein the composition comprises 0.1 to 70 mass% of the perhydropolysilazane based on the total amount of the composition.
7. A method for forming a siliceous film, comprising coating the curing composition according to claim 4 on a substrate and heating.
8. The method for forming a siliceous film according to claim 7 , wherein said heating is performed under a water vapor atmosphere.
9. A curing composition comprising the perhydropolysilazane according to claim 2 and a solvent.
10. A curing composition comprising the perhydropolysilazane according to claim 3 and a solvent.
11. The curing composition according to claim 5 , wherein the composition comprises 0.1 to 70 mass% of the perhydropolysilazane based on the total amount of the composition.
12. The curing composition according to claim 6 , wherein the composition comprises 0.1 to 70 mass% of the perhydropolysilazane based on the total amount of the composition.