Lithography composition, a method for forming resist patterns and a method for making semiconductor devices
The present invention relates to a new lithography composition, the forming of resist patterns using the lithography composition, and a semiconductor device manufacturing method using the lithography composition in a photolithography method.
1. A lithography method for forming resist patterns comprising applying a rinse composition comprising a lithography material, water and a surfactant represented by the formula (I) below,
which is selected from the group consisting of:
and a mixture thereof
to a substrate,
wherein the method comprises
(1) applying a photosensitive resin composition on a substrate, with or without one or more intervening layers, to make a photosensitive resin composition layer,
(2) exposing the photosensitive resin composition layer to radiation,
(3) developing the exposed photosensitive resin composition layer to form a developed layer with resist patterns, and
(4) rinsing the developed layer with the rinse composition and wherein the lithography material is selected from the group consisting of 3-Hexyn-2,5-diol, 2,5-Dimethyl-3-hexyne-2,5-diol, 3,6-Dimethyl-4-octyne-3,6-diol, 1,4-Butynediol, 2,4-Hexadiyne-1,6-diol, 1,4-Butanediol, 2,2,3,3-Tetrafluoro-1,4-butanediol, 2,2,3,3,4,4,5,5-Octafluoro-1,6-hexanediol, cis-1,4-Dihydroxy-2-butene, and any mixture of any of these.
2. The lithography method for forming resist patterns according to claim 1 , wherein the photosensitive resin composition is a chemically amplified photosensitive resin composition and the exposure is an exposure with extreme ultra violet radiation.
3. The lithography method for forming resist patterns according to claim 1 , wherein the finest pitch size of the resist pattern on one whole circuit unit is on or more than 10 nm to on or less than 20 nm.
4. A semiconductor device manufacturing method comprising the lithography method for forming resist patterns according to claim 1 .
5. The semiconductor device manufacturing method according to claim 4 , further comprising;
making gaps in the substrate by using the formed resist patterns as a mask.
6. The lithography method for forming resist patterns according to claim 1 , wherein the content ratio of the surfactant represented by formula (I) is on or more than 0.005 and on or less than 0.5 mass % in the rinse composition.
7. The lithography method for forming resist patterns according to claim 1 , wherein the content ratio of the lithography material is on or more than 0.01 and on or less than 0.5 mass % in the rinse composition.
8. The lithography method for forming resist patterns according to claim 1 , wherein the rinse composition further comprises at least one additional component selected from acids, bases, surfactants other than the surfactant represented by formula (I) and an organic solvent other than 3-Hexyn-2,5-diol, 2,5-Dimethyl-3-hexyne-2,5-diol, 3,6-Dimethyl-4-octyne-3,6-diol, 1,4-Butynediol, 2,4-Hexadiyne-1,6-diol, 1,4-Butanediol, 2,2,3,3-Tetrafluoro-1,4-butanediol, 2,2,3,3,4,4,5,4-Octafluoro-1,6-hexanediol, cis-1,4-Dihydroxy-2-butene, and any mixture of any of these.
9. The lithography method for forming resist patterns according to claim 1 , wherein the rinse composition further comprises at least one additional component selected from fungicides, antimicrobial agents, preservatives and antifungal agents.
10. The lithography method for forming resist patterns according to claim 1 , wherein the water is present in the rinse composition from 80 to 99.98 mass %.
11. The lithography method for forming resist patterns according to claim 1 , wherein the water is present in the rinse composition from 95 to 99.98 mass %.