Siloxazane compound and composition comprising the same, and method for producing silceous film using the same
To provide a siloxazane compound capable of shortening the time of a siliceous film producing process and a composition comprising the same. A siloxazane compound having a specific structure, wherein the ratio of the number of O atoms to the total number of O atoms and N atoms is 5% or more and 25% or less, and in the spectrum of the siloxazane compound obtained by 29 Si-NMR in accordance with the inverse gate decoupling method, the ratio of the area of the peak detected in −75 ppm to −90 ppm is 4.0% or less to the area of the peak detected in −25 ppm to −55 ppm; and a composition comprising the same.
1. A siloxazane compound having repeating units represented by the following general formulae (I) and (II)
wherein R a and R b each independently represent a hydrogen atom, an alkyl group, an alkenyl group, a cycloalkyl group, or an aryl group, provided that at least one of the two R a bonded to one Si atom is a hydrogen atom,
in the siloxazane compound, the ratio of the number of O atoms to the total number of O atoms and N atoms is 5% or more and 25% or less, and
in the spectrum of the siloxazane compound obtained by 29 Si-NMR in accordance with the inverse gate decoupling method, the ratio of the area of the peak detected in −75 ppm to −90 ppm to the area of the peak detected in −25 ppm to −55 ppm is 4.0% or less.
2. The compound according to claim 1 , wherein the mass average molecular weight of the siloxazane compound is 1,500 or more and 52,000 or less.
3. The compound according to claim 2 , wherein R a and R b are hydrogen atoms.
4. A method for producing the compound according to claim 3 , which comprises reacting a perhydropolysilazane with water in the presence of an amine.
5. The method for producing the compound according to claim 4 , wherein the amine is pyridine.
6. A composition comprising the compound according to claim 3 and a solvent.
7. The composition according to claim 6 , wherein the solvent is selected from the group consisting of (a) aromatic compounds, (b) saturated hydrocarbon compounds, (c) unsaturated hydrocarbons, (d) ethers, (e) esters, and (f) ketones.
8. A method for producing the compound according to claim 1 , which comprises reacting a perhydropolysilazane with water in the presence of an amine.
9. The method for producing the compound according to claim 8 , wherein the amine is pyridine.
10. A composition comprising the compound according to claim 1 and a solvent.
11. The composition according to claim 10 , wherein the solvent is selected from the group consisting of (a) aromatic compounds, (b) saturated hydrocarbon compounds, (c) unsaturated hydrocarbons, (d) ethers, (e) esters, and ( 0 ketones.
12. A method for producing a siliceous film, which comprises coating the composition according to claim 11 on a substrate and heating it.
13. The method for producing a siliceous film according to claim 12 , wherein the heating is performed in a steam atmosphere.
14. A method for manufacturing an electronic device, which comprises coating the composition according to claim 11 on a substrate and heating it.
15. A method for producing a siliceous film, which comprises coating the composition according to claim 10 on a substrate and heating it.
16. The method for producing a siliceous film according to claim 15 , wherein the heating is performed in a steam atmosphere.
17. A method for manufacturing an electronic device, which comprises coating the composition according to claim 10 on a substrate and heating it.