Compositions for forming a protective film against basic aqueous hydrogen peroxide solution, and pattern formation method
A composition for forming a protective film against basic aqueous hydrogen peroxide solution, including a crosslinker having, in one molecule, two or more groups at least one selected from the group consisting of a glycidyl group, a terminal epoxy group, an epoxycyclopentyl group, an epoxycyclohexyl group, an oxetanyl group, a vinyl ether group, an isocyanate group, and a blocked isocyanate, a compound having a group of Formula (1): (wherein X 1 is a substituent reacting with the crosslinker, R 0 is a direct bond or a C 1-2 alkylene group, X 2 is a C 1-2 alkyl group, C 1-2 alkoxy group, or fluoro group, a is an integer of 0-2, b is an integer of 1-3, c is an integer of 0-4, and b and c satisfy a relational expression of 1≤(b+c)≤5) on a side chain or a terminal and having a weight average molecular weight of 800 or more, and an organic solvent.
1. A composition for forming a protective film against basic aqueous hydrogen peroxide solution, comprising
a crosslinker having, in one molecule, two or more groups that are at least one selected from the group consisting of
a glycidyl group,
a terminal epoxy group,
an epoxycyclopentyl group,
an epoxycyclohexyl group,
an oxetanyl group,
a vinyl ether group,
an isocyanate group, and
a blocked isocyanate;
a compound having a group of the following Formula (1):
where
X 1 is a substituent reacting with the crosslinker,
R 0 is a direct bond or a C 1-2 alkylene group,
X 2 is a C 1-2 alkyl group, a C 1-2 alkoxy group, or fluoro group,
a is an integer of 0 to 2,
b is an integer of 1 to 3, when b is 2 or 3, groups of -R 0 -X 1 are optionally different from each other,
c is an integer of 0 to 4, when c is 2, 3, or 4, the groups of X 2 are optionally different from each other, and
b and c satisfy a relational expression of 1≤(b+c)≤5, wherein the group of Formula (1) is on a side chain or a terminal of the compound, and the compound has a weight average molecular weight of 800 or more; and
an organic solvent.
2. A composition for forming a protective film against basic aqueous hydrogen peroxide solution, comprising
a crosslinker having, in one molecule, two or more groups that are at least one selected from the group consisting of
a glycidyl group,
a terminal epoxy group,
an epoxycyclopentyl group,
an epoxycyclohexyl group,
an oxetanyl group,
a vinyl ether group,
an isocyanate group, and
a blocked isocyanate group;
a compound having a group of the following Formula (2):
where
R 1 is a direct bond or a linear or branched alkylene group having a carbon atom number of 1 to 8, and
X 1 is a substituent reacting with the crosslinker, wherein the group of Formula (2) is on a side chain or a terminal of the compound, and the compound has a weight average molecular weight of 800 or more; and
an organic solvent.
3. The composition for forming a protective film against basic aqueous hydrogen peroxide solution according to claim 1 , wherein the substituent X 1 reacting with the crosslinker is a group of the following Formula (3), (4), (5), (6), (7), (8), (9), (10), or (11):
where
R 2 is a linear, branched, or cyclic alkyl group having a carbon atom number of 1 to 8,
R 3 is a hydrogen atom or a linear, branched, or cyclic hydrocarbon group having a carbon atom number of 1 to 8, and
e is 0 or 1.
4. The composition for forming a protective film against basic aqueous hydrogen peroxide solution according to claim 3 , wherein the substituent X 1 reacting with the crosslinker is the group of Formula (3), (5), or (6).
5. The composition for forming a protective film against basic aqueous hydrogen peroxide solution according to claim 1 , wherein the amount of the crosslinker to be added is an amount capable of sealing the substituent X 1 in an amount of 20% by mole to 150% by mole when the total amount of the substituent X 1 reacting with the crosslinker in the compound having a weight average molecular weight of 800 or more is made 100% by mole.
6. The composition for forming a protective film against basic aqueous hydrogen peroxide solution according to claim 1 , wherein the crosslinker has two or more glycidyl groups, terminal epoxy groups, or epoxycyclohexyl groups in one molecule.
7. The composition for forming a protective film against basic aqueous hydrogen peroxide solution according to claim 1 , wherein the blocked isocyanate group is a group of the following Formula (11) or (12):
where
R 4 and R 5 are each independently a C 1-5 alkyl group,
R 6 is a C 1-5 alkyl group, d is an integer of 1 to 3, and
when d is 2 or 3, C 1-5 alkyl groups of R 6 are optionally different from each other.
8. The composition for forming a protective film against basic aqueous hydrogen peroxide solution according to claim 1 , further comprising a crosslinking catalyst.
9. The composition for forming a protective film against basic aqueous hydrogen peroxide solution according to claim 1 , further comprising a surfactant.
10. A method for forming a pattern comprising: forming a protective film on a semiconductor substrate optionally having an inorganic film on a surface thereof using the composition for forming a protective film against basic aqueous hydrogen peroxide solution according to claim 1 ; forming a resist pattern on the protective film; dry etching the protective film using the resist pattern as a mask to expose the surface of the inorganic film or the semiconductor substrate; and wet etching the inorganic film or the semiconductor substrate with a basic aqueous hydrogen peroxide solution using the dry-etched protective film as a mask, followed by washing.