OLED substrate and method for manufacturing same

1. A method for manufacturing an organic light-emitting diode (OLED) substrate, comprising steps of:

a step S 10 of providing a substrate that includes a pixel area and a non-pixel area, wherein the pixel area includes a first pixel area, a second pixel area, and a third pixel area;

a step S 20 of forming a first sacrificial layer in the first pixel area and the second pixel area, forming a third light-emitting material layer on the substrate, and removing the first sacrificial layer to expose the first pixel area and the second pixel area and to form a third pixel area organic layer;

a step S 30 of forming a second sacrificial layer in the first pixel area and the third pixel area, forming a second light-emitting material layer on the substrate, and removing the second sacrificial layer to expose the first pixel area and the third pixel area and to form a second pixel area organic layer; and

a step S 40 of forming a third sacrificial layer in the second pixel area and the third pixel area, forming a first light-emitting material layer on the substrate, and removing the third sacrificial layer to expose the second pixel area and the third pixel area and to form a first pixel area organic layer;

wherein one of a vacuum evaporation technique, a physical vapor deposition technique, a chemical vapor deposition technique, and a pulsed laser deposition technique is used to form the first light-emitting material layer, the second light-emitting material layer, and the third light-emitting material layer.

2. The method for manufacturing the OLED substrate according to claim 1 , wherein the first pixel area, the second pixel area, or the third pixel area is one of blue pixel area, green pixel area, and red pixel area, and a color of the first pixel area, a color of the second pixel area, and a color of the third pixel area are different from each other.

3. The method for manufacturing the OLED substrate according to claim 2 , wherein a color of the first light-emitting material layer and the color of the first pixel area are same, a color of the second light-emitting material layer and the color of the second pixel area are same, and a color of the third light-emitting material layer and the color of the third pixel area are same.

4. The method for manufacturing the OLED substrate according to claim 1 , wherein the first sacrificial layer, the second sacrificial layer, and the third sacrificial layer are made of a binary fluoride.

5. The method for manufacturing the OLED substrate according to claim 4 , wherein an ink jet printing technique is used to form the first sacrificial layer, the second sacrificial layer, and the third sacrificial layer.

6. The method for manufacturing the OLED substrate according to claim 5 , wherein the step S 20 comprises:

forming the first sacrificial layer in the first pixel area and the second pixel area using the ink jet printing technique;

forming the third light-emitting material layer on the substrate; and

baking the substrate or performing a laser lift-off process on the substrate, so as to evaporate or sublimate the first sacrificial layer, and expose the first pixel area and the second pixel area.

7. The method for manufacturing the OLED substrate according to claim 6 , wherein the substrate is baked at a temperature lower than a decomposition temperature of the third light-emitting material layer and higher than a sublimation temperature of the first sacrificial layer.

8. The method for manufacturing the OLED substrate according to claim 1 , wherein in the step S 10 , the substrate includes a base plate and a pixel defining layer,

the pixel defining layer includes a plurality of pixel defining bodies that are spaced apart from each other at an interval,

a region confined by two adjacent pixel defining bodies is the pixel area, and

a region in which the pixel defining bodies are disposed is the non-pixel area.

9. A method for manufacturing an organic light-emitting diode (OLED) substrate, comprising steps of:

a step S 10 of providing a substrate that includes a pixel area and a non-pixel area, wherein the pixel area includes a first pixel area, a second pixel area, and a third pixel area;

a step S 20 of forming a first sacrificial layer in the first pixel area and the second pixel area, forming a third light-emitting material layer on the substrate, and removing the first sacrificial layer to expose the first pixel area and the second pixel area and to form a third pixel area organic layer;

a step S 30 of forming a second sacrificial layer in the first pixel area and the third pixel area, forming a second light-emitting material layer on the substrate, and removing the second sacrificial layer to expose the first pixel area and the third pixel area and to form a second pixel area organic layer; and

a step S 40 of forming a third sacrificial layer in the second pixel area and the third pixel area, forming a first light-emitting material layer on the substrate, and removing the third sacrificial layer to expose the second pixel area and the third pixel area and to form a first pixel area organic layer.

10. The method for manufacturing the OLED substrate according to claim 9 , wherein the first pixel area, the second pixel area, or the third pixel area is one of a blue pixel area, a green pixel area, and a red pixel area, and a color of the first pixel area, a color of the second pixel area, and a color of the third pixel area are different from each other.

11. The method for manufacturing the OLED substrate according to claim 10 , wherein a color of the first light-emitting material layer and the color of the first pixel area are same, a color of the second light-emitting material layer and the color of the second pixel area are same, and a color of the third light-emitting material layer and the color of the third pixel area are same.

12. The method for manufacturing the OLED substrate according to claim 9 , wherein the first sacrificial layer, the second sacrificial layer, and the third sacrificial layer are made of a binary fluoride.

13. The method for manufacturing the OLED substrate according to claim 12 , wherein an ink jet printing technique is used to form the first sacrificial layer, the second sacrificial layer, and the third sacrificial layer.

14. The method for manufacturing the OLED substrate according to claim 13 , wherein the step S 20 comprises:

forming the first sacrificial layer in the first pixel area and the second pixel area using the ink jet printing technique;

forming the third light-emitting material layer on the substrate; and

baking the substrate or performing a laser lift-off process on the substrate, so as to evaporate or sublimate the first sacrificial layer, and expose the first pixel area and the second pixel area.

15. The method for manufacturing the OLED substrate according to claim 14 , wherein the substrate is baked at a temperature lower than a decomposition temperature of the third light-emitting material layer and higher than a sublimation temperature of the first sacrificial layer.

16. The method for manufacturing the OLED substrate according to claim 9 , wherein in the step S 10 , the substrate includes a base plate and a pixel defining layer,

the pixel defining layer includes a plurality of pixel defining bodies that are spaced apart from each other at an interval,

a region confined by two adjacent pixel defining bodies is the pixel area, and

a region in which the pixel defining bodies are disposed is the non-pixel area.