Imprint apparatus, imprint method, and method of manufacturing semiconductor device
According to one embodiment, an imprint apparatus includes a first light source positioned to irradiate a substrate with light, a second light source positioned to irradiate the substrate with light, an illuminance changing portion selectively configured to change the illuminance distribution of light from the first light source on an irradiation surface on the substrate, and a controller configured to control the first light source, the second light source and the illuminance changing portion to irradiate the substrate with light from the first light source, and to subsequently irradiate the substrate with light from the second light source directly through the template.
1. An imprint apparatus, comprising:
a half-silvered mirror positioned to reflect light received from a first angle towards a shot region of a substrate and to transmit light received from a second angle towards the shot region of the substrate;
a first light source positioned to emit light towards the half-silvered mirror from the first angle;
a second light source positioned to emit light towards the half-silvered mirror from the second angle;
an illuminance changing portion configured to change the distribution of light from the first light source before the light reaches the half-silvered mirror, the illuminance changing portion comprises:
a photomask substrate, and
a shielding film on the photomask substrate, the shielding film having a square frame shaped opening with a frame width of 1 mm or less;
a template stage configured to position a template that is smaller in size than the photomask substrate, the template stage positioning the template to be between the half-silvered mirror and the substrate;
a controller configured to control the first light source to emit light and irradiate the shot region on the substrate with the light from the first light source via the half-silvered mirror, the light from the first light source having a distribution changed by the illuminance changing portion, and then after the shot region has been irradiated with the light having the changed distribution from the first light source to control the second light source to emit light without a distribution changed by the illuminance changing portion to irradiate the shot region on the substrate, wherein
the first light source is an ultraviolet light source, and
the second light source is an ultraviolet light source.
2. The imprint apparatus according to claim 1 , wherein the illuminance changing portion reduces the irradiation of light at a central portion of the shot region relative to the irradiation of light at an edge portion of the shot region.
3. The imprint apparatus according to claim 2 , wherein the illuminance changing portion causes the light emitted from the first light source to be received in the shot region in an irradiation pattern by passing the light emitted from the first light source through the photomask substrate that is positioned between the first light source and the half-silvered mirror.
4. The imprint apparatus according to claim 1 , wherein the controller is configured to control the first light source so as to partially cure an edge portion of a resist in the shot region on the substrate, and the second light source so as to fully cure the resist in the shot region on the substrate after the edge portion has been partially cured.
5. The imprint apparatus according to claim 1 , wherein the illuminance changing portion comprises a turret on which at least two photomask substrates can be included, the turret being configured to permit each of the at least two photomask substrates to be selectively positioned between the first light source and the half-silvered mirror.
6. The imprint apparatus according to claim 5 , wherein the illuminance changing portion reduces the irradiation of light at a central portion of the shot region relative to the irradiation of light at an edge portion of the shot region.
7. The imprint apparatus according to claim 1 , wherein the second angle is orthogonal to a surface of the substrate.
8. The imprint apparatus according to claim 6 , wherein the first angle is perpendicular to the second angle.
9. The imprint apparatus according to claim 1 , wherein the template stage is further configured to bring the template into contact with a resist material on the substrate.
10. The imprint apparatus according to claim 1 , wherein the controller is configured to control the first light source and the illuminance changing portion such that light from the first light source irradiates only an outermost circumference of the shot region on the substrate.
11. An imprint apparatus, comprising:
a half-silvered mirror positioned to reflect light received from a first angle towards a shot region on a substrate and to transmit light received from a second angle towards the shot region on the substrate;
a first ultraviolet light source positioned to emit light towards the half-silvered mirror from the first angle;
a second ultraviolet light source positioned to emit light towards the half-silvered mirror from the second angle;
an illuminance changing portion configured to change the distribution of light received at the substrate from the first ultraviolet light source, but not from the second ultraviolet source, the illuminance changing portion comprises:
a photomask substrate, and
a shielding film on the photomask substrate, the shielding film having a square frame shaped opening with a frame width of 1 mm or less; and
a template stage configured to position a template that is smaller in size than the photomask substrate, the template stage positioning the template to be between the half-silvered mirror and the substrate.
12. The imprint apparatus according to claim 11 , further comprising:
a controller configured to control the first ultraviolet light source emit light to irradiate the shot region on the substrate, and then to control the second ultraviolet light source to emit light to irradiate the shot region on the substrate.
13. The imprint apparatus according to claim 12 , wherein the controller is configured to control the first ultraviolet light source so as to partially cure an edge portion of a resist in the shot region on the substrate, and the second ultraviolet light source so as to fully cure the resist in the shot region on the substrate after the edge portion has been partially cured.
14. The imprint apparatus according to claim 11 , wherein the illuminance changing portion reduces the irradiation of light at a central portion of the shot region relative to the irradiation of light at an edge portion of the shot region.
15. The imprint apparatus according to claim 14 , wherein the illuminance changing portion causes the light emitted from the first ultraviolet light source to be received in the shot region in an irradiation pattern by passing the light emitted from the first ultraviolet light source through the photomask substrate that is positioned between the first ultraviolet light source and the half-silvered mirror.
16. The imprint apparatus according to claim 11 , wherein the illumination changing portion comprises a turret on which at least two photomask substrate can be included, the turret being configured to permit each of the at least two photomask substrates to be selectively positioned between the first ultraviolet light source and the half-silvered mirror.