Die
A semiconductor structure includes a wafer comprising a plurality of viewing fields defined thereon, a plurality of dies defined by a scribe line formed in each viewing field, a plurality of mark patterns formed in the scribe line, and a plurality of anchor pattern respectively formed in the review fields, the anchor patterns being different from the mark patterns.
1. A die, comprising:
mark patterns in three corners of the die and only an anchor pattern in one corner of the die, wherein the anchor pattern is different from the mark patterns.
2. The die according to claim 1 , wherein the mark patterns comprise alignment mark patterns.
3. The die according to claim 1 , wherein the anchor pattern and mark patterns comprise different shapes.
4. The die according to claim 1 , wherein the anchor pattern comprises a plurality of sub-patterns arranged therein, and at least a programmed defect is formed in one of the sub-patterns.
5. The die according to claim 4 , wherein the sub-patterns comprise semiconductor patterns, metal patterns, or insulating patterns.
6. The die according to claim 4 , wherein the programmed defect comprises a gap defect, a short-end defect, or a bridge defect.