GAS SUPPLY NOZZLE, SUBSTRATE PROCESSING APPARATUS, AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM
Provided is a technology including a nozzle base end portion which is provided in a processing chamber processing a substrate to extend in a vertical direction and into which a processing gas processing the substrate is introduced, a nozzle distal end portion which is configured in a U shape and in which a gas supply hole supplying the processing gas is provided to a side surface of the substrate, and a gas residence suppressing hole which is provided in a downstream end of the nozzle distal end portion and has a diameter larger than that of the gas supply hole.
1 . A gas supply nozzle comprising:
an upstream side pipe for introducing a gas;
a folded portion connected to a downstream end of the upstream side pipe, for reversing a flowing direction of the gas;
a downstream side pipe connected to a downstream end of the folded portion;
a set of a plurality of gas supply holes, disposed at a side surface of the upstream side pipe or the downstream side pipe, each hole of the set of a plurality of gas supply holes being opened for flowing the gas to a direction different from the folding direction of the folded portion; and
a gas residence suppressing hole, disposed at a downstream bottom end of the downstream side pipe, for flowing the gas to a longitudinal direction of the downstream side pipe, a total area of the gas residence suppressing hole being larger than at least an area of a gas supply hole of the set of the plurality of gas supply holes, and the total area of the gas residence supplying hole being smaller than a cross-sectional area of the downstream side pipe.
2 . The gas supply nozzle according to claim 1 ,
wherein the gas residence suppressing hole is comprised of a single hole.
3 . The gas supply nozzle according to claim 1 ,
wherein the gas residence suppressing hole is comprised of plural holes.
4 . The gas supply nozzle according to claim 1 ,
wherein the set of a plurality of gas supply holes is disposed at least at a side surface of the downstream side pipe.
5 . The gas supply nozzle according to claim 4 ,
wherein the gas residence suppressing hole is comprised of a single hole.
6 . The gas supply nozzle according to claim 4 ,
wherein the gas residence suppressing hole is comprised of plural holes.
7 . A gas supply nozzle comprising:
an upstream side pipe for introducing a gas;
a folded portion connected to a downstream end of the upstream side pipe, for reversing a flowing direction of the gas;
a downstream side pipe connected to a downstream end of the folded portion;
a first set of a plurality of gas supply holes, arranged in a longitudinal direction in a side of the upstream side pipe, each hole of the first set of the plurality of gas supply holes being opened for flowing the gas to a direction different from the folding direction of the folded portion; and
a second set of a plurality of gas supply holes, arranged in a longitudinal direction in a side of the downstream side pipe, each hole of the second set of the plurality of gas supply holes being opened for flowing the gas to a direction different from the folding direction of the folded portion,
wherein a first hole in the first set of the plurality of gas supply holes on the upstream side pipe, and a second hole in the second set of the plurality of gas supply holes on the downstream side pipe, are arranged in one plane crossing a longitudinal direction of the upstream or downstream side pipes.
8 . The gas supply nozzle according to claim 7 , further comprising:
a gas residence suppressing hole, disposed at a downstream bottom end of the downstream side pipe, for flowing the gas to a longitudinal direction of the downstream side pipe, a total area of the gas residence suppressing hole being larger than at least an area of a gas supply hole of the set of the plurality of gas supply holes, and the total area of the gas residence supplying hole being smaller than a cross-sectional area of the downstream side pipe.
9 . The gas supply nozzle according to claim 8 ,
wherein the gas residence suppressing hole is comprised of a single hole.
10 . The gas supply nozzle according to claim 8 ,
wherein the gas residence suppressing hole is comprised of plural holes.
11 . A substrate processing apparatus comprising:
a heater having a cylindrical shape, being vertically installed;
a reaction tube installed inside the heater;
a processing chamber formed in a cylindrical hollow portion of the reaction tube, the processing chamber having an exhaust outlet of an exhaust pipe at lower position of the processing chamber;
a boat supporting a plurality of substrates to be in a horizontal posture and to be arranged in a vertical direction; and
a first gas supply nozzle including:
an upstream side pipe standing vertically between an inner wall of the reaction tube and the plurality of substrates supported by the boat, for introducing a gas;
a folded portion connected to a downstream end of the upstream side pipe, for reversing a flowing direction of the gas;
a downstream side pipe connected to a downstream end of the folded portion;
a first set of a plurality of gas supply holes, arranged in a longitudinal direction in a side of the upstream side pipe, each hole of the first set of the plurality of gas supply holes being opened for flowing the gas to a direction different from the folding direction of the folded portion; and
a second set of a plurality of gas supply holes, arranged in a longitudinal direction in a side of the downstream side pipe, each hole of the second set of the plurality of gas supply holes being opened for flowing the gas to a direction different from the folding direction of the folded portion,
wherein a first pair of holes, comprised of a first hole in the first set of the plurality of gas supply holes, and a first hole in the second set of the plurality of gas supply holes, is arranged horizontally in a first plane, for flowing the gas to a first substrate of the plurality of substrates.
12 . The substrate processing apparatus according to claim 11 , further comprising:
a second pair of holes, comprised of a second hole in the first set of the plurality of gas supply holes, and a second hole in the second set of the plurality of gas supply holes, is arranged horizontally in a second plane adjacent to the first plane, for flowing the gas to a second substrate of the plurality of substrates, adjacent to the first substrate.
13 . The substrate processing apparatus according to claim 12 , wherein an upstream end of the first gas supply nozzle is connected to a source gas supply system for supplying a source gas to the processing chamber, the source gas is at least one selected from the group consisting of an inorganic-based halosilane source gas, an organic-based halosilane source gas, a halogen group-free inorganic-based silane source gas, a halogen group-free organic-based silane source gas, and a halogen group-free amino-based (amine-based) silane source gas.
14 . The substrate processing apparatus according to claim 12 , further comprising:
a gas residence suppressing hole, disposed at a downstream bottom end of the downstream side pipe, for flowing the gas downward to a longitudinal direction of the downstream side pipe, a total area of the gas residence suppressing hole being larger than at least an area of a gas supply hole of the set of the plurality of gas supply holes, and the total area of the gas residence supplying hole being smaller than a cross-sectional area of the downstream side pipe.
15 . The substrate processing apparatus according to claim 14 ,
wherein the gas residence suppressing hole is provided to a position lower than a region where the substrates are supported, and arranged in a vicinity of the exhaust outlet of the exhaust pipe.
16 . The gas supply nozzle according to claim 15 ,
wherein the gas residence suppressing hole is comprised of a single hole.
17 . The gas supply nozzle according to claim 15 ,
wherein the gas residence suppressing hole is comprised of plural holes.