IP Library Granted Patent US 11,018,098
Granted Patent B2
US 11,018,098 · App. 16/118,723 · Granted May 25, 2021

Fabricated two-sided millimeter wave antenna using through-silicon-vias

Inventors: John F. Kaeding (Boise, ID); Owen R. Fay (Meridian, ID)
Assignee: Micron Technology, Inc.
H01L23/66H01L23/5384H01L24/09H01L25/0657H01L27/108H01Q1/2283H01L2223/6677H01L2224/02331H01L2224/02372
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Quick Facts
Patent No.
US 11,018,098
App. No.
16/118,723
Granted
May 25, 2021
Kind
B2
Abstract

A system may include a first semiconductor substrate having a first side and a second side opposite the first side. The system may further include multiple device layers positioned on the first side of the substrate. The system may also include a first portion of an antenna structure positioned within at least one of the multiple device layers. The system may include a second portion of the antenna structure positioned over the second side of the substrate. The system may further include a via passing through the substrate and electrically coupling the first portion of the antenna structure to the second portion of the antenna structure.

Claims (28)

1. A system comprising:

a first semiconductor device having a first side and a second side opposite the first side;

a mold compound region adjacent to the semiconductor device;

a redistribution layer positioned on the first side of the semiconductor device;

a first portion of an antenna structure formed within the redistribution layer;

a second portion of the antenna structure positioned over the second side of the first semiconductor device; and

a via passing through the mold compound region and electrically coupling the first portion of the antenna structure to the second portion of the antenna structure.

2. The system of claim 1 , further comprising:

one or more intervening layers between the second portion of the antenna and the mold compound region.

3. The system of claim 1 , further comprising:

a second semiconductor device stacked onto the first semiconductor device.

4. The system of claim 3 , further comprising:

one or more intervening semiconductor devices positioned between the first semiconductor device and the second semiconductor device.

5. The system of claim 1 , wherein the redistribution layer includes a first sublayer and a second sublayer.

6. The system of claim 1 , wherein the antenna structure is a millimeter wave antenna.

7. The system of claim 2 , wherein the one or more intervening layers includes additional mold compound.

8. The system of claim 2 , wherein the one or more intervening layers includes radio frequency shielding.

9. The system of claim 2 , wherein the one or more intervening layers includes insulator barriers.

10. The system of claim 3 , wherein the second portion of the antenna structure is positioned on the second semiconductor device.

11. The system of claim 3 , wherein the second semiconductor device corresponds to a packaged device.

12. The system of claim 3 , wherein the second semiconductor device is coupled to the first semiconductor device in a package-on-package configuration.

13. The system of claim 3 , wherein a stack interconnect structure electrically couples the second semiconductor device to the first semiconductor device.

14. The system of claim 4 , wherein the second semiconductor device and the intervening semiconductor devices are coupled to the first semiconductor device in a package-on-package configuration.

15. The system of claim 4 , wherein each of the intervening semiconductor devices has a substrate and a via passing through the substrate.

16. The system of claim 15 , wherein the first portion of the antenna structure is electrically coupled to the second portion of the antenna structure by the via.

17. The system of claim 5 , wherein the first sublayer is configured to route a set of connections from the first semiconductor device to a surface mount coupling structure.

18. The system of claim 17 , wherein the surface mount coupling structure includes a ball grid array.

19. The system of claim 5 , wherein the second sublayer includes the first portion of the antenna.

Assignments (5)
RELEASE OF SECURITY INTEREST Recorded Nov 14, 2019
From: JPMORGAN CHASE BANK, N.A., AS COLLATERAL AGENT
To: MICRON TECHNOLOGY, INC.
Reel/Frame 051028/0835 →
RELEASE OF SECURITY INTEREST Recorded Oct 14, 2019
From: MORGAN STANLEY SENIOR FUNDING, INC., AS COLLATERAL AGENT
To: MICRON TECHNOLOGY, INC.
Reel/Frame 050719/0550 →
SUPPLEMENT NO. 1 TO PATENT SECURITY AGREEMENT Recorded Nov 13, 2018
From: MICRON TECHNOLOGY, INC.
To: JPMORGAN CHASE BANK, N.A.., AS COLLATERAL AGENT
Reel/Frame 047630/0756 →
SUPPLEMENT NO. 10 TO PATENT SECURITY AGREEMENT Recorded Nov 13, 2018
From: MICRON TECHNOLOGY, INC.
To: MORGAN STANLEY SENIOR FUNDING, INC., AS COLLATERAL AGENT
Reel/Frame 048102/0420 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 31, 2018
From: KAEDING, JOHN F.; FAY, OWEN R.
To: MICRON TECHNOLOGY, INC.
Reel/Frame 046765/0725 →
Cited By (1)
US 12,525,518