METHODS FOR CHROMIUM COATING
The present disclosure provides methods for forming a metal layer adjacent to a substrate, comprising providing a substrate comprising carbon at a concentration of at least about 0.001 wt % and one or more of silicon, manganese, titanium, vanadium, aluminum and nitrogen, and depositing a first layer comprising a metal adjacent to the substrate. Next, the first layer and the substrate may be subjected to annealing under conditions that are sufficient to generate a second layer from the first layer adjacent to the substrate. The second layer may comprise the carbon and the metal as a metal carbide.
1 .- 55 . (canceled)
56 . A method for forming a metal-containing part, comprising:
(a) providing a substrate comprising carbon at a concentration of at least about 0.001 wt. % as measured by x-ray photoelectron spectroscopy (XPS);
(b) using a slurry to deposit a first layer comprising at least one metal adjacent to said substrate, wherein said at least one metal is selected from chromium and nickel; and
(c) subjecting said first layer and said substrate to annealing under conditions that are sufficient to generate a second layer from said first layer adjacent to said substrate, wherein said second layer comprises said carbon and said at least one metal as a metal carbide, thereby forming said metal-containing part comprising said second layer and said substrate, wherein said second layer comprises domains of said metal carbide and domains without said metal carbide.
57 . The method of claim 56 , wherein said at least one metal comprises chromium.
58 . The method of claim 56 , wherein said at least one metal comprises nickel.
59 . The method of claim 56 , wherein said at least one metal comprises chromium and nickel.
60 . The method of claim 56 , wherein said slurry comprises an alloying agent, a metal halide activator and a solvent, and wherein said alloying agent comprises said metal.
61 . The method of claim 60 , wherein said alloying agent comprises carbon.
62 . The method of claim 60 , wherein said metal halide activator comprises a monovalent metal, a divalent metal or a trivalent metal.
63 . The method of claim 56 , wherein said substrate comprises steel.
64 . The method of claim 56 , wherein said first layer has a pattern or morphology that facilitates formation of said metal carbide.
65 . The method of claim 56 , wherein said second layer is an outermost layer.
66 . The method of claim 56 , wherein in (a), said carbon is at a concentration of at least about 0.01 wt. % as measured by XPS.
67 . The method of claim 56 , wherein in (a), said carbon is at a concentration of at least about 0.1 wt. % as measured by XPS.
68 . A method for forming a metal layer adjacent to a substrate, comprising:
(a) providing a substrate comprising carbon at a concentration of at least about 0.001 wt. % as measured by x-ray photoelectron spectroscopy (XPS);
(b) using a slurry to deposit a first layer comprising at least one metal adjacent to said substrate, wherein said slurry has a viscosity from about 1 centipoise (cP) to 200 cP at a shear rate of shear rate of 1000 s −1 ; and
(c) subjecting said first layer and said substrate to annealing under conditions that are sufficient to generate a second layer from said first layer adjacent to said substrate, wherein said second layer comprises said carbon and said at least one metal as a metal carbide, thereby forming said metal-containing part comprising said second layer and said substrate, wherein said second layer comprises domains of said metal carbide and domains without said metal carbide.
69 . The method of claim 68 , wherein said slurry comprises an alloying agent, a metal halide activator and a solvent, and wherein said alloying agent comprises said metal.
70 . The method of claim 69 , wherein said alloying agent comprises carbon.
71 . The method of claim 69 , wherein said metal halide activator comprises a monovalent metal, a divalent metal or a trivalent metal.
72 . The method of claim 68 , wherein said substrate comprises steel.
73 . The method of claim 68 , wherein said first layer has a pattern or morphology that facilitates formation of said metal carbide.
74 . The method of claim 68 , wherein said slurry has a viscosity from about 1 centipoise (cP) to 150 cP at a shear rate of shear rate of 1000 s −1 .
75 . The method of claim 68 , wherein said second layer is an outermost layer.