Concentric semi-circular split profiling for computed tomographic imaging of electronic beams

1. An apparatus for analyzing an electron beam, comprising:

a circular sensor disk adapted to receive the electron beam, said circular sensor disk having a central axis;

an inner semi-circular slit in said circular sensor disk wherein said inner semi-circular slit extends at least 180 degrees of arc with respect to said central axis of said circular sensor disk;

an outer semi-circular slit in said circular sensor disk wherein said outer semi-circular slit extends at least 180 degrees of arc with respect to said central axis of said circular sensor disk and wherein said outer semi-circular slit is spaced from said first semi-circular slit by a fixed distance;

a system for sweeping the electron beam radially outward from said central axis to said inner semi-circular slit and outer second semi-circular slit;

a sensor structure operatively connected to said circular sensor disk wherein said sensor structure receives the electron beam when it passes over said inner semi-circular slit and said outer semi-circular slit; and

a device for measuring the electron beam that is intercepted by said inner semi-circular slit and said outer semi-circular slit.

2. The apparatus for analyzing an electron beam of claim 1

wherein said inner semi-circular slit in said circular sensor disk extends more than 180 degrees of arc with respect to said central axis of said circular sensor disk but less than 360 degrees of arc with respect to said central axis of said circular sensor disk and

wherein said outer semi-circular slit in said circular sensor disk extends more than 180 degrees of arc with respect to said central axis of said circular sensor disk but less than 360 degrees of arc with respect to said central axis of said circular sensor disk.

3. The apparatus for analyzing an electron beam of claim 2 wherein said device for measuring the electron beam that is intercepted by said inner semi-circular slit and said outer semi-circular slit includes a Faraday cup.

4. The apparatus for analyzing an electron beam of claim 3 wherein said Faraday cup is an annular ring that extends around said central axis.

5. The apparatus for analyzing an electron beam of claim 3 wherein said Faraday cup is an annular ring that extends around said central axis and is located beneath said circular sensor disk.

6. The apparatus for analyzing an electron beam of claim 3 wherein said Faraday cup is a partial annular ring that extends more than 180 degrees of arc with respect to said central axis of said circular sensor disk but less than 360 degrees of arc with respect to said central axis.

7. The apparatus for analyzing an electron beam of claim 3 wherein said Faraday cup is a partial annular ring that extends more than 180 degrees of arc with respect to said central axis of said circular sensor disk but less than 360 degrees of arc with respect to said central axis and is located beneath said inner semi-circular slit and said outer semi-circular slit.

8. The apparatus for analyzing an electron beam of claim 1 further comprising

a central hole in said circular sensor disk that receives the electron beam and

a beam stop beneath said central hole in said circular sensor disk wherein said beam stop receives the electron beam that passes through said central hole in said circular sensor disk.

9. The apparatus for analyzing an electron beam of claim 1 further comprising

a hole in said circular sensor disk that receives the electron beam and

a Faraday cup device for measuring the electron beam beneath said hole in said circular sensor disk wherein said Faraday cup device receives the electron beam that passes through said hole in said circular sensor disk.

10. The apparatus for analyzing an electron beam of claim 9 wherein said Faraday cup device is located beneath said hole in said circular sensor disk and is aligned with said central axis of said circular sensor disk.

11. The apparatus for analyzing an electron beam of claim 9 wherein said Faraday cup device is located beneath said hole in said circular sensor disk and is offset from said central axis of said circular sensor disk.

12. The apparatus for analyzing an electron beam of claim 1 further comprising an additional semi-circular slit in said circular sensor disk wherein said additional semi-circular slit extends more than 180 degrees of arc with respect to said central axis of said circular sensor disk but less than 360 degrees of arc with respect to said central axis of said circular sensor disk.

13. The apparatus for analyzing an electron beam of claim 1

wherein said inner semi-circular slit in said circular sensor disk extends more than 180 degrees of arc with respect to said central axis of said circular sensor disk but less than 200 degrees of arc with respect to said central axis of said circular sensor disk and

wherein said outer semi-circular slit in said circular sensor disk extends more than 180 degrees of arc with respect to said central axis of said circular sensor disk but less than 200 degrees of arc with respect to said central axis of said circular sensor disk.

14. An apparatus for analyzing an electron beam, comprising:

circular sensor disk means for receiving the electron beam, said circular sensor disk means having a central axis;

an inner semi-circular slit in said circular sensor disk means wherein said inner semi-circular slit extends more than 180 degrees of arc with respect to said central axis of said circular sensor disk means but less than 360 degrees of arc with respect to said central axis of said circular sensor disk means;

an outer semi-circular slit in said circular sensor disk means wherein said outer semi-circular slit extends more than 180 degrees of arc with respect to said central axis of said circular sensor disk means but less than 360 degrees of arc with respect to said central axis of said circular sensor disk means and wherein said outer semi-circular slit is spaced from said first semi-circular slit by a fixed distance;

a system for sweeping the electron beam radially outward from said central axis to said inner semi-circular slit and outer second semi-circular slit;

a sensor structure operatively connected to said circular sensor disk means wherein said sensor structure receives the electron beam when it passes over said inner semi-circular slit and said outer semi-circular slit; and

a device for measuring the electron beam that is intercepted by said inner semi-circular slit and said outer semi-circular slit.

15. The apparatus for analyzing an electron beam of claim 14

wherein said inner semi-circular slit in said circular sensor disk means extends more than 180 degrees of arc with respect to said central axis of said circular sensor disk but less than 200 degrees of arc with respect to said central axis of said circular sensor disk and

wherein said outer semi-circular slit in said circular sensor disk means extends more than 180 degrees of arc with respect to said central axis of said circular sensor disk but less than 200 degrees of arc with respect to said central axis of said circular sensor disk.

16. The apparatus for analyzing an electron beam of claim 14 further comprising an additional semi-circular slit in said circular sensor disk means wherein said additional semi-circular slit extends more than 180 degrees of arc with respect to said central axis of said circular sensor disk but less than 360 degrees of arc with respect to said central axis of said circular sensor disk.

17. A method of analyzing an electron beam, comprising the steps of:

providing a circular sensor adapted to receive the electron beam, said circular electron beam diagnostic sensor having a central axis;

providing an inner semi-circular slit in said circular sensor disk wherein said inner semi-circular slit extends more than 180 degrees of arc with respect to said central axis of said circular sensor disk but less than 360 degrees of arc with respect to said central axis of said circular sensor disk;

providing an outer semi-circular slit in said circular sensor disk wherein said second semi-circular slit extends more than 180 degrees of arc with respect to said central axis of said circular sensor disk but less than 360 degrees of arc with respect to said central axis of said circular sensor disk and wherein said second semi-circular slit is spaced from said first semi-circular slit by a fixed distance;

sweeping the electron beam radially outward from said central axis to said inner semi-circular slit and said outer semi-circular slit;

using a sensor structure operatively connected to said circular sensor disk to receive the electron beam when it passes over said inner semi-circular slit and said outer semi-circular slit; and

measuring the electron beam that is intercepted by said inner semi-circular slit and said outer semi-circular slit.

18. The method of analyzing an electron beam of claim 17 wherein said step of providing a circular sensor adapted to receive the electron beam comprises providing a circular sensor Faraday cup adapted to receive the electron beam.

19. The method of analyzing an electron beam of claim 17 further comprising

the step of providing a central hole in said circular sensor disk that receives the electron beam and

providing a beam stop beneath said central hole in said circular sensor disk wherein said beam stop receives the electron beam that passes through said hole in said circular sensor disk.

20. The method of analyzing an electron beam of claim 17 further comprising

the step of providing a hole in said circular sensor disk that receives the electron beam and

providing a Faraday cup device beneath said hole in said circular sensor disk wherein said Faraday cup device receives the electron beam that passes through said hole in said circular sensor disk.

21. The method of analyzing an electron beam of claim 20 wherein said step of providing a Faraday cup device beneath said hole in said circular sensor disk wherein said Faraday cup device is located beneath said hole in said circular sensor disk and is aligned with said central axis of said circular sensor disk.

22. The method of analyzing an electron beam of claim 20 wherein said step of providing a Faraday cup device beneath said hole in said circular sensor disk wherein said Faraday cup device is located beneath said hole in said circular sensor disk and is offset from said central axis of said circular sensor disk.

23. The method for analyzing an electron beam of claim 17

wherein said step of providing an inner semi-circular slit in said circular sensor disk comprises providing an inner semi-circular slit in said circular sensor disk that extends more than 180 degrees of arc with respect to said central axis of said circular sensor disk but less than 200 degrees of arc with respect to said central axis of said circular sensor disk and

wherein said step of providing an outer semi-circular slit in said circular sensor disk comprises providing an outer semi-circular slit in said circular sensor disk that extends more than 180 degrees of arc with respect to said central axis of said circular sensor disk but less than 200 degrees of arc with respect to said central axis of said circular sensor disk.