IP Library › Granted Patent US 10,746,614
Granted Patent B2
US 10,746,614 · App. 16/134,530 · Granted Aug 18, 2020

Stretchable multimodal sensor and method of fabricating of the same

Inventors: Sang Hun Jeon (Seoul, KR); Min Hyun Jung (Sejong-si, KR); Kung Won Rhie (Seoul, KR); Chang Jin Yun (Seoul, KR)
Assignee: Korea University Research and Business Foundation, Sejong Campus
G01L1/26A61B5/01A61B5/02108A61B5/02444A61B5/1036A61B5/6801G01J1/0403G01J1/42G01K7/16G01K7/186G01L1/18A61B2562/0247A61B2562/0261A61B2562/0271A61B2562/12A61B2562/164G01J2001/446
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Quick Facts
Patent No.
US 10,746,614
App. No.
16/134,530
Granted
Aug 18, 2020
Kind
B2
Abstract

A stretchable multimode sensor and a method of fabricating the same are provided. The stretchable multimode sensor may include a substrate which is formed of a flexible material and includes a pressure sensor area, an optical sensor area, a temperature sensor area and a switching element area, a pressure sensor which is disposed on the pressure sensor area and includes an amorphous metal, an optical sensor which is disposed on the optical sensor area and includes an amorphous metal, and a temperature sensor which is disposed on the temperature sensor area and includes an amorphous metal, and a switching element which is disposed on the switching element area and includes an amorphous metal.

Claims (14)

1. A method of fabricating an amorphous thin film, the method comprising:

disposing a source including two or more kinds of metal chemical elements, and a substrate in a chamber; and

performing a sputtering process to fabricate an amorphous thin film on the substrate from the source,

wherein flexibility of the amorphous thin film is controlled by controlling a process pressure in the chamber,

wherein the substrate is a polymer substrate, and

wherein the polymer substrate is cooled or quenched after the fabrication of the amorphous thin film such that a wrinkle structure is generated at the amorphous thin film.

2. The method of claim 1 , wherein the process pressure in the chamber is a minimum pressure which generates plasma in the chamber.

3. The method of claim 1 , wherein a length of a void extending from a surface of the amorphous thin film in a depth direction is controlled depending on the process pressure in the chamber.

4. The method of claim 3 , wherein the length of the void increases as the process pressure in the chamber increases, and

wherein the length of the void decreases as the process pressure in the chamber decreases.

5. The method of claim 1 , wherein the flexibility of the amorphous thin film decreases as the process pressure in the chamber increases, and

wherein the flexibility of the amorphous thin film increases as the process pressure in the chamber decreases.

6. The method of claim 1 , wherein a region in which a polymer of the polymer substrate is mixed with a metal of the amorphous thin film is provided at an interface between the polymer substrate and the amorphous thin film.

7. The method of claim 1 , wherein the amorphous thin film includes an early transition metal and a late transition metal.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 26, 2018
From: JEON, SANG HUN; JUNG, MIN HYUN; RHIE, KUNG WON; YUN, CHANG JIN
To: KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION, SEJONG CAMPUS
Reel/Frame 047325/0520 →
Priority Claims (1)
KR 10-2017-0119534 · Sep 18, 2017 · national
Continuity (1)
Related Publication 20190086280A1 · Mar 21, 2019