Dose Map Optimization for Mask Making
A method and a non-transitory computer-readable storage medium for optimizing a dose map for a multi-beam mask writer includes simulating, by a processor, a substrate pattern based on a design pattern and the dose map associated with the design pattern, and updating a value of the dose map based on a comparison between the substrate pattern and the design pattern. An apparatus for optimizing a dose map for a multi-beam mask writer includes a processor and a memory coupled to the processor configured to store instructions to simulate a substrate pattern based on a design pattern and the dose map associated with the design pattern, and update a value of the dose map based on a comparison between the substrate pattern and the design pattern.
1 . A method for optimizing a dose map for a multi-beam mask writer, comprising:
simulating, by a processor, a substrate pattern based on a design pattern and the dose map associated with the design pattern; and
updating a value of the dose map based on a comparison between the substrate pattern and the design pattern.
2 . The method of claim 1 , wherein simulating the substrate pattern based on the design pattern and the dose map associated with the design pattern comprises:
simulating a mask pattern based on the design pattern and the dose map; and
simulating the substrate pattern based on the mask pattern.
3 . The method of claim 2 , wherein the mask pattern and the substrate pattern are pixelated.
4 . The method of claim 1 , wherein the value of the dose map comprises at least one of a coordinate of an e-beam shot associated with the dose map, an intensity value of the e-beam shot, an exposure time of the e-beam shot, and an energy exposure value of the e-beam shot.
5 . The method of claim 1 , wherein the comparison between the substrate pattern and the design pattern comprises a similarity value indicative of similarity between the substrate pattern and the design pattern.
6 . The method of claim 5 , wherein the similarity value is determined based on distances between points of the substrate pattern and respective corresponding points in the design pattern.
7 . The method of claim 5 , wherein updating the value of the dose map based on the comparison between the substrate pattern and the design pattern comprises:
based on a determination that the similarity value is greater than or equal to a predetermined threshold, updating the value of the dose map; and
based on a determination that the similarity value is smaller than the predetermined threshold, outputting the dose map for mask making.
8 . An apparatus for optimizing a dose map for a multi-beam mask writer, comprising:
a processor; and
a memory coupled to the processor, the memory configured to store instructions which when executed by the processor become operational with the processor to:
simulate a substrate pattern based on a design pattern and the dose map associated with the design pattern; and
update a value of the dose map based on a comparison between the substrate pattern and the design pattern.
9 . The apparatus of claim 8 , wherein the memory storing the instructions operational with the processor to simulate the substrate pattern based on the design pattern and the dose map associated with the design pattern further comprises instructions which when executed by the processor become operational with the processor to:
simulate a mask pattern based on the design pattern and the dose map; and
simulate the substrate pattern based on the mask pattern.
10 . The apparatus of claim 9 , wherein the mask pattern and the substrate pattern are pixelated.
11 . The apparatus of claim 8 , wherein the value of the dose map comprises at least one of a coordinate of an e-beam shot associated with the dose map, an intensity value of the e-beam shot, an exposure time of the e-beam shot, and an energy exposure value of the e-beam shot.
12 . The apparatus of claim 8 , wherein the comparison between the substrate pattern and the design pattern comprises a similarity value indicative of similarity between the substrate pattern and the design pattern.
13 . The apparatus of claim 12 , wherein the similarity value is determined based on distances between points of the substrate pattern and respective corresponding points in the design pattern.
14 . The apparatus of claim 12 , wherein the memory storing the instructions operational with the processor to update the value of the dose map based on the comparison between the substrate pattern and the design pattern further comprises instructions which when executed by the processor become operational with the processor to:
based on a determination that the similarity value is greater than or equal to a predetermined threshold, update the value of the dose map; and
based on a determination that the similarity value is smaller than the predetermined threshold, output the dose map for mask making.
15 . A non-transitory computer-readable storage medium, comprising instructions for optimizing a dose map for a multi-beam mask writer, which instructions when executed by a processor become operational with the processor to:
simulate a substrate pattern based on a design pattern and the dose map associated with the design pattern; and
update a value of the dose map based on a comparison between the substrate pattern and the design pattern.
16 . The non-transitory computer-readable storage medium of claim 15 , wherein the instructions operational with the processor to simulate the substrate pattern based on the design pattern and the dose map associated with the design pattern further comprise instructions which when executed by the processor become operational with the processor to:
simulate a mask pattern based on the design pattern and the dose map; and
simulate the substrate pattern based on the mask pattern.
17 . The non-transitory computer-readable storage medium of claim 15 , wherein the value of the dose map comprises at least one of a coordinate of an e-beam shot associated with the dose map, an intensity value of the e-beam shot, an exposure time of the e-beam shot, and an energy exposure value of the e-beam shot.
18 . The non-transitory computer-readable storage medium of claim 15 , wherein the comparison between the substrate pattern and the design pattern comprises a similarity value indicative of similarity between the substrate pattern and the design pattern.
19 . The non-transitory computer-readable storage medium of claim 18 , wherein the similarity value is determined based on distances between points of the substrate pattern and respective corresponding points in the design pattern.
20 . The non-transitory computer-readable storage medium of claim 18 , wherein the instructions operational with the processor to update the value of the dose map based on the comparison between the substrate pattern and the design pattern further comprise instructions which when executed by the processor become operational with the processor to:
based on a determination that the similarity value is greater than or equal to a predetermined threshold, update the value of the dose map; and
based on a determination that the similarity value is smaller than the predetermined threshold, output the dose map for mask making.