Passivation for a semiconductor light emitting device
In embodiments of the invention, a passivation layer is disposed over a side of a semiconductor structure including a light emitting layer disposed between an n-type region and a p-type region. A material configured to adhere to an underfill is disposed over an etched surface of the semiconductor structure.
1. A device comprising:
a semiconductor structure comprising a light emitting layer between an n-type region and a p-type region, the semiconductor structure divided into a plurality of light-emitting devices (LEDs) separated by a gap between adjacent LEDs of the plurality of LEDs,
each of the plurality of LEDs comprising an n-contact electrically coupled to the n-type region; and
a multilayer stack at least in the gap between the adjacent LEDs, the multilayer stack comprising at least a first layer having a first refractive index and a second layer having a second refractive index.
2. The device of claim 1 , wherein the multilayer stack comprises one of a reflecting layer and a passivating layer.
3. The device of claim 1 , wherein the n-contact is on an exposed portion of the n-type region and the multilayer stack is disposed on top of the exposed portion of the n-type region.
4. The device of claim 3 , further comprising a metal bonding layer coupled to the exposed portion of the n-type region.
5. The device of claim 1 , wherein the multilayer stack comprises at least one of an insulating layer, a dielectric layer, AlN, TiN, SiO2, SiNxOy, SiNx, and Si3N4.
6. The device of claim 1 , further comprising a p-contact on the p-type region and a guard layer on the p-contact.
7. The device of claim 1 , wherein the multilayer stack is configured to prevent contaminants from contacting the semiconductor structure.
8. The device of claim 1 , wherein, for each of the plurality of LEDs, a portion of the n-contact is exposed adjacent the gap, and the multilayer stack is adjacent the exposed portion of the n-contact and adjacent at least one surface of the n-type region.
9. The device of claim 8 , wherein the multilayer stack is in contact with the exposed portion of the n-contact and the at least one surface of the n-type region.
10. The device of claim 8 , wherein the at least one surface is at least one of a side surface and a bottom surface of the n-type region.
11. The device of claim 1 , wherein the gap between the adjacent LEDs is between 1 and 10 microns wide.
12. The device of claim 11 , wherein the gap between the adjacent LEDs is approximately 5 microns wide.
13. The device of claim 1 , wherein the first layer and the second layer comprise a pair of layers, and the multilayer stack comprises a plurality of the pair of layers.
14. The device of claim 1 , wherein the first layer and the second layer comprise materials selected such that the multilayer stacks reflects light from the light-emitting layer incident on the multilayer stack.