IP Library Granted Patent US 10,663,416
Granted Patent B2
US 10,663,416 · App. 16/159,977 · Granted May 26, 2020

Pattern measuring method, pattern measuring apparatus, and computer program storage device

Inventor: Hiroshi Fukuda (Tokyo, JP)
Assignee: Hitachi High-Tech Corporation
G01N23/2251H01J37/06H01J37/222H01J37/28H01J2237/24578H01L22/12
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 10,663,416
App. No.
16/159,977
Granted
May 26, 2020
Kind
B2
Abstract

The present invention is directed to a pattern measuring method and the like for deriving a roughness evaluation value from which measurement noise having a frequency component is removed. The pattern measuring method includes generating a plurality of integration signals having the different number of integration from the signals of the plurality of frames; acquiring edge position information of the pattern along an edge from the plurality of respective integration signals having the different number of integration; obtaining a difference between the edge position information and reference position information; obtaining a spectral component of a specific spatial frequency of the edge or a standard deviation based upon the difference; performing regression analysis in which a value relating to the number of integration is set as an explanatory variable, and a value relating to the spectral component or the standard deviation is set as a target variable; and outputting a value obtained by the regression analysis as a roughness index value of the pattern or a noise index value included in the signals.

Claims (74)

1. A pattern measuring method for measuring a pattern based upon detection signals obtained by scanning a beam a plurality of times on the pattern formed on a sample, the method comprising:

acquiring signals of a plurality of frames obtained by scanning the beam a plurality of times on the pattern formed on the sample;

generating a plurality of integration signals having the different number of integration from the signals of the plurality of frames;

acquiring edge position information of the pattern along an edge from the plurality of respective integration signals having the different number of integration;

obtaining a difference between the edge position information and reference position information;

obtaining a spectral component of a specific spatial frequency of the edge or a standard deviation based upon the difference;

performing regression analysis in which a value relating to the number of integration is set as an explanatory variable, and a value relating to the spectral component or the standard deviation is set as a target variable; and

outputting a value obtained by the regression analysis as a roughness index value of the pattern or a noise index value included in the signals.

2. The pattern measuring method according to claim 1 , wherein

the regression analysis of the spectral component is performed on a plurality of specific spatial frequencies.

3. The pattern measuring method according to claim 1 , wherein

the regression analysis of the spectral component is performed on a plurality of specific spatial frequencies, and the noise index value included in the signals is obtained based upon a tilt of a model of the regression analysis.

4. The pattern measuring method according to claim 1 , wherein

at least one of an evaluation value of frequency spectral density of roughness PSD_LER(f) and frequency spectral density of measurement noise PSD_noise(f)/NF is calculated by performing regression analysis using an equation below on spatial frequency spectral density PSD_obs(N, f) of the edge included in the plurality of integration signals having the different number of integration

PSD _ obs ( NF,f )= PSD _ LER ( f )+ PSD _noise( f )/ NF

NF: number of integration

f: spatial frequency.

5. The pattern measuring method according to claim 4 , wherein

a roughness evaluation value LER is calculated based upon an equation below from a plurality of the spatial frequencies f

LER =√(∫ PSD _ LER ( f ) df ).

6. A computer program storage device comprising a storage medium readable by a processor and storing a program instruction executable by the processor, wherein

the processor is configured to:

acquire detection signals of a plurality of frames obtained by scanning a beam a plurality of times on a pattern formed on a sample;

generate a plurality of integration signals having the different number of integration from the detection signals of the plurality of frames;

acquire edge position information of the pattern along an edge from the plurality of respective integration signals having the different number of integration;

obtain a difference between the edge position information and reference position information;

obtain a spectral component of a specific spatial frequency of the edge or a standard deviation based upon the difference;

perform regression analysis in which a value relating to the number of integration is set as an explanatory variable, and a value relating to the spectral component or the standard deviation is set as a target variable; and

output a value obtained by the regression analysis as a roughness index value of the pattern or a noise index value included in the signals.

7. The computer program storage device according to claim 6 , wherein

the processor is configured to:

perform regression analysis of the spectral component on a plurality of specific spatial frequencies.

8. The computer program storage device according to claim 6 , wherein

the processor is configured to:

perform regression analysis of the spectral component on a plurality of specific spatial frequencies; and

obtain the noise index value included in the signals based upon a tilt of a model of the regression analysis.

9. The computer program storage device according to claim 6 , wherein

the processor is configured to:

calculate at least one of an evaluation value of frequency spectral density of roughness PSD_LER(f) and frequency spectral density of measurement noise PSD_noise(f)/NF by performing regression analysis using an equation below on spatial frequency spectral density PSD_obs(N, f) of the edge included in the plurality of integration signals having the different number of integration

PSD _ obs ( NF,f )= PSD _ LER ( f )+ PSD _noise( f )/ NF

NF: number of integration

f: spatial frequency.

10. The computer program storage device according to claim 9 , wherein

the processor is configured to:

calculate a roughness evaluation value LER based upon an equation below from a plurality of the spatial frequencies f

LER =√(∫ PSD _ LER ( f ) df ).

11. A pattern measuring apparatus for measuring a pattern formed on a sample, comprising:

a processor;

a memory connected to the processor; and

a computer executable program code that is stored in the memory and instructs the processor to

acquire detection signals of a plurality of frames obtained by scanning a beam a plurality of times on the pattern formed on a sample;

generate a plurality of integration signals having the different number of integration from the detection signals of the plurality of frames;

acquire edge position information of the pattern along an edge from the plurality of respective integration signals having the different number of integration;

obtain a difference between the edge position information and reference position information;

obtain a spectral component of a specific spatial frequency of the edge or a standard deviation based upon the difference;

perform regression analysis in which a value relating to the number of integration is set as an explanatory variable, and a value relating to the spectral component or the standard deviation is set as a target variable; and

output a value obtained by the regression analysis as a roughness index value of the pattern or a noise index value included in the signals.

12. The pattern measuring apparatus according to claim 11 , wherein

the program code instructs the processor to

perform regression analysis of the spectral component on a plurality of specific spatial frequencies.

13. The pattern measuring apparatus according to claim 11 , wherein

the program code instructs the processor to

perform regression analysis of the spectral component on a plurality of specific spatial frequencies; and

obtain the noise index value included in the signals based upon a tilt of a model of the regression analysis.

14. The pattern measuring apparatus according to claim 11 , wherein

the program code instructs the processor to

calculate at least one of an evaluation value of frequency spectral density of roughness PSD_LER(f) and frequency spectral density of measurement noise PSD_noise(f)/NF by performing regression analysis using an equation below on spatial frequency spectral density PSD_obs(N, f) of the edge included in the plurality of integration signals having the different number of integration

PSD _ obs ( NF,f )= PSD _ LER ( f )+ PSD _noise( f )/ NF

NF: number of integration

f: spatial frequency.

15. The pattern measuring apparatus according to claim 14 , wherein

the program code instructs the processor to

calculate a roughness evaluation value LER based upon an equation below from a plurality of spatial frequencies f

LER =√(∫ PSD _ LER ( f ) df ).

Assignments (2)
CHANGE OF NAME Recorded Apr 14, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052398/0249 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 15, 2018
From: FUKUDA, HIROSHI
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 047166/0105 →
Priority Claims (1)
JP 2017-204144 · Oct 23, 2017 · national
Continuity (1)
Related Publication 20190120777A1 · Apr 25, 2019
Cited By (1)
US 12,620,550