Systems and methods for controlling directionality of ions in an edge region by using an electrode within a coupling ring
Systems and methods for controlling directionality of ion flux at an edge region within a plasma chamber are described. One of the systems includes a radio frequency (RF) generator that is configured to generate an RF signal, an impedance matching circuit coupled to the RF generator for receiving the RF signal to generate a modified RF signal, and a plasma chamber. The plasma chamber includes an edge ring and a coupling ring located below the edge ring and coupled to the first impedance matching circuit to receive the modified RF signal. The coupling ring includes an electrode that generates a capacitance between the electrode and the edge ring to control the directionality of the ion flux upon receiving the modified RF signal.
1. A coupling ring for placement within a plasma chamber, comprising:
an insulator material having an annular shape, wherein the insulator material has a plurality of surfaces including a top surface and a bottom surface;
an electrode between the top surface of the insulator material and the bottom surface of the insulator material; and
a hole formed in the insulator material to extend from one of the plurality of surfaces of the insulator material to the electrode, wherein the hole is configured to receive a connector for electrically coupling radio frequency power to the electrode, wherein the connector is a power pin that is configured to be coupled to a feed ring, wherein the feed ring is configured to be coupled to a radio frequency transmission line to receive radio frequency power.
2. The coupling ring of claim 1 , wherein the electrode is configured to be coupled to one or more additional connectors for coupling the radio frequency power to the electrode.
3. The coupling ring of claim 2 , wherein each of the one or more additional connectors is a power pin that is coupled to the feed ring.
4. The coupling ring of claim 1 , wherein the hole extends from the one of the plurality of surfaces of the insulator material to an undersurface of the electrode, wherein the radio frequency power is electrically coupled to the undersurface of the electrode.
5. The coupling ring of claim 4 , wherein the electrode is configured to be coupled to one or more additional connectors for coupling the radio frequency power to the undersurface of the electrode.
6. The coupling ring of claim 1 , wherein the insulator material is ceramic, or glass, or a composite polymer, or aluminum oxide.
7. The coupling ring of claim 1 , wherein the top surface of the insulator material is located adjacent to an edge ring of the plasma chamber, and the bottom surface of the insulator material is located adjacent to an insulator ring of the plasma chamber.
8. The coupling ring of claim 1 , wherein the electrode is a mesh electrode, wherein the mesh electrode includes multiple crossings of wires to form a net-like structure.
9. The coupling ring of claim 1 , wherein the electrode is a ring-shaped electrode and is flat.
10. The coupling ring of claim 1 , wherein the plurality of surfaces of the insulator material includes an inner side surface and an outer side surface, wherein the electrode is located between the inner side surface and the outer side surface.
11. A coupling ring for placement within a plasma chamber, comprising:
a body having an annular shape and a plurality of surfaces including a top surface and a bottom surface;
an electrode embedded within the body, wherein the electrode is located at a first distance below the top surface of the body and at a second distance above the bottom surface of the body; and
an opening in the body extending from the one of the plurality of surfaces of the body to the electrode, wherein the opening is configured to receive a connection for electrically coupling to the electrode, wherein the connection is a power pin that is configured to be coupled to a feed ring, wherein the feed ring is configured to be coupled to a radio frequency transmission line to receive radio frequency power.
12. The coupling ring of claim 11 , wherein the electrode is configured to be coupled to one or more additional connections for electrically coupling to the electrode.
13. The coupling ring of claim 12 , wherein each of the one or more additional connections is a power pin that is coupled to the feed ring.
14. The coupling ring of claim 11 , wherein the opening in the body extends from the one of the plurality of surfaces of the body to an undersurface of the electrode, wherein the connection is electrically coupled to the undersurface of the electrode.
15. The coupling ring of claim 14 , wherein the electrode is configured to be coupled to one or more additional connections for electrically coupling to the undersurface of the electrode.
16. The coupling ring of claim 11 , wherein the body is fabricated from an insulator material.
17. The coupling ring of claim 11 , wherein the top surface of the body is located adjacent to an edge ring of the plasma chamber, and the bottom surface of the body is located adjacent to an insulator ring of the plasma chamber.
18. The coupling ring of claim 11 , wherein the electrode is a mesh electrode, wherein the mesh electrode includes multiple crossings of wires to form a net-like structure.
19. The coupling ring of claim 11 , wherein the electrode is a ring-shaped electrode and is flat.
20. The coupling ring of claim 11 , wherein the plurality of surfaces of the body includes an inner side surface and an outer side surface, wherein the electrode is located between the inner side surface and the outer side surface.