IP Library Granted Patent US 10,637,208
Granted Patent B1
US 10,637,208 · App. 16/179,651 · Granted Apr 28, 2020

Silicon photonics based tunable laser

Inventors: Radhakrishnan L. Nagarajan (Santa Clara, CA); Masaki Kato (Palo Alto, CA); Nourhan Eid (Santa Clara, CA); Kenneth Ling Wong (Santa Clara, CA)
Assignee: INPHI CORPORATION
H01S5/0687H01S5/021H01S5/026H01S5/028H01S5/0224H01S5/02268H01S5/0612H01S5/1007H01S5/142H01S5/34306H01S5/40
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Quick Facts
Patent No.
US 10,637,208
App. No.
16/179,651
Granted
Apr 28, 2020
Kind
B1
Abstract

A tunable laser device based on silicon photonics includes a substrate configured with a patterned region comprising one or more vertical stoppers, an edge stopper facing a first direction, a first alignment feature structure formed in the patterned region along the first direction, and a bond pad disposed between the vertical stoppers. Additionally, the tunable laser includes an integrated coupler built in the substrate located at the edge stopper and a laser diode chip including a gain region covered by a P-type electrode and a second alignment feature structure formed beyond the P-type electrode. The laser diode chip is flipped to rest against the one or more vertical stoppers with the P-type electrode attached to the bond pad and the gain region coupled to the integrated coupler. Moreover, the tunable laser includes a tuning filter fabricated in the substrate and coupled via a wire waveguide to the integrated coupler.

Claims (14)

1. A tunable laser device based on silicon photonics comprising:

a substrate configured with a patterned region comprising one or more vertical stoppers, an edge stopper facing a first direction, a first alignment feature structure formed in the patterned region along the first direction, and a bond pad disposed between the vertical stoppers;

an integrated coupler built in the substrate located at the edge stopper;

a laser diode chip including a gain region covered by a P-type electrode and a second alignment feature structure formed beyond the P-type electrode, the laser diode chip being flipped to rest against the one or more vertical stoppers with the P-type electrode attached to the bond pad and the gain region coupled to the integrated coupler; and

a tuning filter fabricated in the substrate and coupled via a wire waveguide to the integrated coupler;

wherein the tunable filter comprises a wire waveguide having a straight section coupled to at least two ring resonators followed by a reflector section, the strain section being directly coupled to the integrated coupler to receive a light from the gain region of the laser diode chip, the at least two ring resonators having slightly different radii to allow the light being tuned in an extended wavelength range of synthesized spectrum, and the reflector section being characterized with at least 90% reflectivity of the light;

wherein the tunable filter further comprises at least three thin-film resistor heaters placed on the substrate respectively and at least partially over the at least two ring resonators and the reflector section.

2. The tunable laser device of claim 1 wherein the substrate is a silicon-on-insulator substrate with the patterned region being formed a step lower than rest surface region and the edge stopper being part of the step along a second direction to be against with an edge of the laser diode chip.

3. The tunable laser device of claim 1 wherein the second alignment feature structure and the first alignment feature structure are configured as mutually engaged fiducials to fix the laser diode chip in position on the substrate using an image recognition system.

4. The tunable laser device of claim 1 wherein the gain region comprises an InP based waveguide configured for generating a laser light between a first end facet and a second end facet, the integrated coupler comprises a Si/SiN based waveguide aligned with the first end facet to pass the laser light with a coupling loss being substantially controlled within 3 dB.

5. The tunable laser device of claim 4 wherein the Si/SiN based waveguide comprises a SiN fork shape structure embedded in a rectangular Si waveguide, the SiN fork shape structure including an SiN nanotaper sandwiched in full length laterally by two SiN linear stripes up to an end of the Si/SiN based waveguide that is aligned with the first end facet.

6. The tunable laser device of claim 4 wherein the Si/SiN based waveguide comprises a SiN trident shape structure embedded in a Si rectangular waveguide, the SiN trident shape structure including an SiN nanotaper sandwiched in partial length laterally by two SiN symmetrical nanotapers that are extended up to an end of the Si/SiN based waveguide that is aligned with the first end facet.

7. The tunable laser device of claim 1 wherein the straight section comprises SiN material, the at least two ring resonators and the reflector section comprise Si material.

8. The tunable laser device of claim 1 wherein the thin-film resistor heaters placed over the at least two ring resonators are configured to tune the light in the extended wavelength range at least from 1530 nm to 1570 nm and the thin-film resistor heater placed over the reflector section is configured to tune phase of the light to match a round trip cavity lasing condition between two end facet of the gain region of the laser diode chip.

Assignments (4)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 27, 2021
From: CAVIUM INTERNATIONAL
To: MARVELL ASIA PTE LTD.
Reel/Frame 057336/0873 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 25, 2021
From: MARVELL TECHNOLOGY CAYMAN I
To: CAVIUM INTERNATIONAL
Reel/Frame 057279/0519 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 23, 2021
From: INPHI CORPORATION
To: MARVELL TECHNOLOGY CAYMAN I
Reel/Frame 056649/0823 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 5, 2018
From: NAGARAJAN, RADHAKRISHNAN L.; KATO, MASAKI; EID, NOURHAN; WONG, KENNETH LING
To: INPHI CORPORATION
Reel/Frame 047415/0455 →
Cited By (3)
US 12,468,102 US 12,548,978 US 12,681,337