IP Library Granted Patent US 11,065,334
Granted Patent B2
US 11,065,334 · App. 16/190,011 · Granted Jul 20, 2021

Boron-10 containing biocompatible nanostructures

Inventors: Anil U. Mane (Naperville, IL); Jeffrey W. Elam (Elmhurst, IL)
Assignee: UChicago Argonne, LLC
A61K41/0095C07F5/027B82Y5/00
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Quick Facts
Patent No.
US 11,065,334
App. No.
16/190,011
Granted
Jul 20, 2021
Kind
B2
Abstract

A method comprises providing a plurality of nanostructures comprising a base material. The plurality of nanostructures are exposed to a first material at a first deposition temperature. The plurality of nanoparticles are exposed to a second material at a second deposition temperature, and exposed to a Boron-10 ( 10 B) containing material at a third deposition temperature so as to form a 10 B-metal oxide based composite nanostructure.

Claims (11)

1. A method, comprising:

providing a plurality of nanostructures comprising a base material comprising Fe 2 O 3 ;

exposing the plurality of nanostructures to a first material comprising trimethylaluminum (Al(CH 3 ) 3 ) (TMA) at a first deposition temperature in the range of 100° C. to 300° C.;

exposing the plurality of nanostructures to a second material at a second deposition temperature in the range of 100° C. to 300° C.; and

exposing the plurality of nanostructures to a Boron-10 ( 10 B) containing material comprising trimethyl borate (TMB) at a third deposition temperature in the range of 100° C. to 300° C. so as to form 10 B-metal oxide composite nanostructures comprising an atomic percent concentration of oxygen in the range of 50 atomic % to 60 atomic % and an atomic percentage of aluminum in the range of 25 atomic % to 40 atomic %.

2. The method of claim 1 , wherein the 10 B-metal oxide composite nanostructure comprises 10 B x —Al y O z —Fe 2 O 3 , where x>0, y>0 and z>0.

3. The method of claim 1 , wherein providing the plurality of nanostructures comprises:

exposing a plurality of nanoparticles to a first base material precursor at a fourth deposition temperature; and

exposing the plurality of nanoparticles to a second base material precursor at a fifth deposition temperature,

wherein a layer of the base material is deposited on each of the plurality of nanoparticles.

4. The method of claim 1 , wherein the 10 B-metal oxide composite nanostructures comprising an atomic percent concentration of boron in the range of 1 atomic % to 10 atomic %.

Assignments (2)
CONFIRMATORY LICENSE Recorded Nov 22, 2019
From: UCHICAGO ARGONNE, LLC
To: UNITED STATES DEPARTMENT OF ENERGY
Reel/Frame 051089/0670 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 12, 2019
From: MANE, ANIL U.; ELAM, JEFFREY W.
To: UCHICAGO ARGONNE, LLC
Reel/Frame 050983/0988 →
Continuity (1)
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