Organotin clusters, solutions of organotin clusters, and application to high resolution patterning
Organotin clusters are described with the formula R 3 Sn 3 (O 2 CR′) 5-x (OH) 2+x (μ 3 -O) with 0≤x<2; R=branched or cycloalkyl with 1 to 31 carbon atoms; R′═H or alkyl with 1 to 20 carbon atoms. Three carboxylato ligands are bridging, and two OH ligands are bridging. The remaining two carboxylato ligands are in non-bridging configurations, and the non-bridging carboxylato ligands are exchangeable in solution. Solutions of these clusters are suitable for forming radiation sensitive coatings that can be used to pattern nanometer scale structures. The radiation sensitive coatings are particularly suitable for EUV patterning.
1. A composition comprising molecular clusters represented by the formula R 3 Sn 3 (O 2 CR′) 3+x (L) 2-x (OH) 2 (μ 3 -O) with 0≤x<2; L is a ligand with the formula OR a or SR a , where R a is H or an organo group with 1 to 20 carbon atoms; R=hydrocarbyl group with 1 to 31 carbon atoms; R′═H or alkyl with 1 to 20 carbon atoms.
2. The composition of claim 1 wherein the composition is crystalline.
3. The composition of claim 2 wherein x=0.
4. The composition of claim 1 wherein R comprises a branched alkyl group.
5. The composition of claim 1 wherein R is a methyl, ethyl, i-propyl, n-butyl, s-butyl or t-butyl group, t-amyl, neopentyl or combination thereof.
6. The composition of claim 1 wherein R′ comprises H, an alkyl group with 1 to 10 carbon atoms, or a combination thereof, and wherein L is OH.
7. A method for synthesizing the composition of claim 1 , the method comprising:
in an organic solvent, reacting an alkyl tin trialkylacetylide with carboxylic acid and water.
8. A solution comprising an organic solvent and solvated organometallic clusters with the formula R 3 Sn 3 (O 2 CR′) 5-x (L) 2+x (μ 3 -O) with 0≤x<2; R=hydrocarbyl group with 1 to 31 carbon atoms; R′═H or alkyl with 1 to 20 carbon atoms, and L is a ligand with the formula —OR″, wherein R″ is H, an organo group or a combination thereof.
9. The solution of claim 8 wherein the organic solvent comprises an alcohol, ether, ester or a mixture thereof.
10. The solution of claim 9 wherein the organic solvent further comprises from about 5 v/v % to about 25 v/v % carboxylic acid.
11. The solution of claim 8 having a cluster concentration from about 1.9 mM to about 9.4 mM based on the amount of tin.
12. The solution of claim 8 wherein R comprises is a methyl, ethyl, i-propyl, n-butyl, s-butyl or t-butyl group, t-amyl, neopentyl or combination thereof.
13. The solution of claim 8 wherein R′ comprises H, an alkyl group with 1 to 10 carbon atoms, or a combination thereof, and wherein L is OH.
14. The solution of claim 8 wherein R″ comprises —R 0 OHR 1 , wherein R 0 and R 1 are independently an alkyl group with 1 to 10 carbon atoms.
15. A method for patterning a structure comprising:
exposing a substrate with a radiation sensitive coating to patterned radiation to form an exposed coating with a latent image, wherein the radiation sensitive coating was formed through the deposition of a solution comprising molecular clusters represented by the formula R 3 Sn 3 (O 2 CR′) 3+x (L) 2-x (OH) 2 (μ 3 -O) with 0≤x<2; R=hydrocarbyl group with 1 to 31 carbon atoms, R′═H or alkyl with 1 to 20 carbon atoms, and L is a ligand with the formula —OR″, wherein R″ is an organo group; and
developing the exposed coating with a suitable developing agent to form a patterned coating.
16. The method of claim 15 wherein the radiation is EUV radiation.
17. The method of claim 15 wherein R comprises a methyl, ethyl, i-propyl, n-butyl, s-butyl or t-butyl group, t-amyl, neopentyl or combination thereof.
18. The method of claim 15 wherein R′ comprises H, an alkyl group with 1 to 10 carbon atoms, or a combination thereof, and wherein L is OH.
19. The method of claim 15 wherein R″ comprises —R 0 OHR 1 , wherein R 0 and R 1 are independently an alkyl group with 1 to 10 carbon atoms.
20. The method of claim 15 wherein the developing agent comprises an organic solvent to form a negative tone pattern.