Method and system for cross-tile OPC consistency

1. A method, executed by at least one processor of a computer, comprising:

receiving a layout design, the layout design being divided into a plurality of regions;

performing a plurality of optical proximity correction iterations on each of the plurality of regions to generate a modified layout design, each of the plurality of optical proximity correction iterations comprising:

performing simulation to determine edge placement errors for the edge fragments in the each of the plurality of regions,

determining intermediate edge adjustment values for the edge fragments in the each of the plurality of regions based on the edge placement errors and a layout pattern in a predetermined-size area surrounding each of the edge fragments such that edge fragments in each of the plurality of regions having the same layout pattern have the same intermediate edge adjustment value, and

generating, based on the intermediate edge adjustment values, a modified layout region for the each of the plurality of regions for a next optical proximity correction iteration in the plurality of optical proximity correction iterations after the each of the plurality of optical proximity correction iterations;

generating a final modified layout design, which is to be used for photomask manufacture, based on the modified layout design and the layout pattern surrounding each of the edge fragments in the modified layout design such that the edge fragments in different regions in the plurality of regions in the final modified layout design having the same layout pattern have a same edge adjustment value with respect to the layout design; and

storing information of the final modified layout design.

2. The method recited in claim 1 , further comprising:

processing the final modified layout design to generate mask data for a mask-writing tool to make photomasks.

3. The method recited in claim 2 , further comprising:

applying the mask data to the mask-writing tool to create photomasks.

4. The method recited in claim 1 , wherein the same edge adjustment value is an average value of edge adjustment values for the edge fragments in different regions in the plurality of regions but having the same layout pattern.

5. The method recited in claim 4 , wherein the average value is a weighted average value based on a number of the edge fragments having the same layout pattern in each of the plurality of regions.

6. The method recited in claim 1 , wherein the plurality of regions comprise rectangular or square areas.

7. One or more non-transitory computer-readable media storing computer-executable instructions for causing one or more processors to perform a method, the method comprising:

receiving a layout design, the layout design being divided into a plurality of regions;

performing a plurality of optical proximity correction iterations on each of the plurality of regions to generate a modified layout design, each of the plurality of optical proximity correction iterations comprising:

performing simulation to determine edge placement errors for the edge fragments in the each of the plurality of regions,

determining intermediate edge adjustment values for the edge fragments in the each of the plurality of regions based on the edge placement errors and a layout pattern in a predetermined-size area surrounding each of the edge fragments such that edge fragments in each of the plurality of regions having the same layout pattern have the same intermediate edge adjustment value, and

generating, based on the intermediate edge adjustment values, a modified layout region for the each of the plurality of regions for a next optical proximity correction iteration in the plurality of optical proximity correction iterations after the each of the plurality of optical proximity correction iterations;

generating a final modified layout design, which is to be used for photomask manufacture, based on the modified layout design and the layout pattern surrounding each of the edge fragments in the modified layout design such that the edge fragments in different regions in the plurality of regions in the final modified layout design having the same layout pattern have a same edge adjustment value with respect to the layout design; and

storing information of the final modified layout design.

8. The one or more non-transitory computer-readable media recited in claim 7 , wherein the method further comprises: processing the final modified layout design to generate mask data for a mask-writing tool to make photomasks.

9. The one or more non-transitory computer-readable media recited in claim 8 , wherein the method further comprises: applying the mask data to the mask-writing tool to create photomasks.

10. The one or more non-transitory computer-readable media recited in claim 7 , wherein the same edge adjustment value is an average value of edge adjustment values for the edge fragments in different regions in the plurality of regions but having the same layout pattern.

11. The one or more non-transitory computer-readable media recited in claim 10 , wherein the average value is a weighted average value based on a number of the edge fragments having the same layout pattern in each of the plurality of regions.

12. The one or more non-transitory computer-readable media recited in claim 7 , wherein the plurality of regions comprise rectangular or square areas.

13. A system, comprising:

one or more processors, the one or more processors programmed to perform a method, the method comprising:

receiving a layout design, the layout design being divided into a plurality of regions;

performing a plurality of optical proximity correction iterations on each of the plurality of regions to generate a modified layout design, each of the plurality of optical proximity correction iterations comprising:

performing simulation to determine edge placement errors for the edge fragments in the each of the plurality of regions,

determining intermediate edge adjustment values for the edge fragments in the each of the plurality of regions based on the edge placement errors and a layout pattern in a predetermined-size area surrounding each of the edge fragments such that edge fragments in each of the plurality of regions having the same layout pattern have the same intermediate edge adjustment value, and

generating, based on the intermediate edge adjustment values, a modified layout region for the each of the plurality of regions for a next optical proximity correction iteration in the plurality of optical proximity correction iterations after the each of the plurality of optical proximity correction iterations;

generating a final modified layout design, which is to be used for photomask manufacture, based on the modified layout design and the layout pattern surrounding each of the edge fragments in the modified layout design such that the edge fragments in different regions in the plurality of regions in the final modified layout design having the same layout pattern have a same edge adjustment value with respect to the layout design; and

storing information of the final modified layout design.

14. The system recited in claim 13 , wherein the method further comprises: processing the final modified layout design to generate mask data for a mask-writing tool to make photomasks.

15. The system recited in claim 14 , wherein the method further comprises: applying the mask data to the mask-writing tool to create photomasks.

16. The system recited in claim 13 , wherein the same edge adjustment value is an average value of edge adjustment values for the edge fragments in different regions in the plurality of regions but having the same layout pattern.

17. The system recited in claim 16 , wherein the average value is a weighted average value based on a number of the edge fragments having the same layout pattern in each of the plurality of regions.

18. The system recited in claim 13 , wherein the plurality of regions comprise rectangular or square areas.