Laminated interposers and packages with embedded trace interconnects
Laminated interposers and packages, with embedded trace interconnects are provided. An example process for making an interposer or package achieves vertical conductive vias in the package by depositing conductive traces on multiple wafers or panes, then laminating these substrates into a stack, thereby embedding the conductive traces. The laminated stack is sliced to dimensions of an interposer or electronic package. A side of the sliced stack is then used as the top of the interposer or package, rendering some of the horizontally laid traces into vertical conductive vias. The interposer or package can be finished or developed by adding redistribution layers on the top and bottom surfaces, and active and passive components. Electronic components can also be embedded in the laminated stack. Some of the stack layers can be active dies, such as memory controllers, memory storage arrays, and processors, to form a memory subsystem or self-contained computing device.
1. A method, comprising:
depositing conductive traces of a circuit on a planar surfaces of multiple wafers, including partitioning the circuit for each wafer into panes, each partition suitable for a pane and laying out the partitions of the circuit on successive panes of multiple wafers;
dicing the wafer and the conductive traces of the circuit to make panes;
stacking the panes to create a laminated stack of the panes;
joining the panes together, the joining comprising at least silicon dioxide to silicon dioxide joining;
conductively connecting ends of the conductive traces of the panes to complete the circuit within the panes of the laminated stack;
forming a capacitor within the laminated stack by reserving respective areas of the conductive traces on the successive layers as capacitor plates interleaved with a dielectric of the laminated panes;
connecting an active die to at least some of the conductive traces of the successive layers of the laminated stack with inter-laminate through-substrate-vias inside the laminated stack;
and
disposing the laminated stack as an interposer in a microelectronics package.
2. The method of claim 1 , further comprising building at least one a redistribution layer (RDL) on the conductively connected ends of the conductive traces at the one of more sides of the laminated stack.
3. The method of claim 1 , further comprising electrically coupling conductive traces of adjacent panes in the laminated stack with inter-laminate through-substrate-vias inside the laminated stack.
4. The method of claim 1 , further comprising thinning the panes to dispose the conductive traces at a lead spacing of a die.
5. The method of claim 1 , further comprising direct-bonding leads of a die to the conductive traces at the edges of the panes.
6. The method of claim 1 , further comprising depositing the conductive traces of a single circuit on the planar surface of the substrate; and
after dicing the substrate into the panes and stacking the panes to create the laminated stack, conductively connecting the ends of the conductive traces of the panes to restore the single circuit within the panes of the laminated stack.
7. The method of claim 1 , further comprising orienting the laminated stack on edge in the microelectronics package to dispose the conductive traces of the circuit as vertical layers.
8. The method of claim 7 , further comprising depositing second conductive traces on the planar surface of the substrate in addition to the conductive traces of the circuit, wherein after the dicing the substrate to make the panes and stacking the panes to make the laminated stack, the second conductive traces become vertical interconnects in addition to the circuit when the laminated stack is oriented on edge in the microelectronics package.