Fabrication of self-aligned grating elements with high refractive index for waveguide displays
A lithographic patterning of a resist is performed to create a mandrel over a substrate. A deposition of one or more functional materials on the mandrel is performed. And each functional material has a respective refractive index. A selective removal of the mandrel is performed to create a plurality of grating elements formed from the one or more functional materials. The plurality of grating elements are self-aligned and form a diffraction grating. Each grating element may have a heterogenous refractive index (e.g., substantial normal to and/or parallel to a surface of the substrate). The diffraction grating may be used in a near-eye display.
1. A method comprising:
performing a lithographic patterning of a resist to create a mandrel over a substrate;
performing a spin-coating of a plurality of layers of functional materials on the mandrel to create a plurality of grating elements, each of the functional materials having a respective refractive index of a plurality of refractive indexes;
removing portions of the functional materials prior to a removal of the entire mandrel; and
removing the entire mandrel from the substrate to create a self-aligned structure without the mandrel that forms a diffraction grating with the plurality of refractive indexes.
2. The method of claim 1 , wherein performing the spin-coating of the functional materials on the mandrel, comprises:
performing, in sequence, a spin-coating of at least two of the functional materials that have different respective refractive indexes,
wherein each of the plurality of grating elements has a heterogeneous refractive index along one direction.
3. The method of claim 1 , wherein performing the spin-coating of the functional materials on the mandrel, comprises:
performing, in sequence, a spin-coating of at least of the two functional materials that have different respective refractive indexes,
wherein each of the plurality of grating elements has a heterogeneous refractive index along a vertical direction that is substantially normal to a surface of the substrate that the plurality of grating elements is deposited on.
4. The method of claim 1 , wherein the substrate includes a waveguide.
5. The method of claim 4 , wherein the diffraction grating occupies a portion of the waveguide, the method further comprising:
performing a deposition of an etch stop layer onto the portion of the waveguide prior to the performing the lithographic patterning of the resist.
6. The method of claim 4 , wherein the waveguide is part of a near-eye display.
7. The method of claim 4 , wherein the waveguide is an output waveguide.
8. The method of claim 1 , wherein the diffraction grating is a 2-dimensional diffraction grating.
9. A non-transitory computer-readable medium configured to store computer readable instructions that, when executed by a manufacturing system including a processor, cause the manufacturing system to:
perform a lithographic patterning of a resist to create a mandrel over a substrate;
perform a spin-coating of a plurality of layers of functional materials on the mandrel to create a plurality of grating elements, each of the functional materials having a respective refractive index of a plurality of refractive indexes;
remove portions of the functional materials prior to a removal of the entire mandrel; and
remove the entire mandrel from the substrate to create a self-aligned structure without the mandrel that forms a diffraction grating with the plurality of refractive indexes.
10. The computer-readable medium of claim 9 , further comprising instructions to:
perform, in sequence, a spin-coating of at least two of the functional materials that have different respective refractive indexes,
wherein each of the plurality of grating elements has a heterogeneous refractive index along one direction.
11. The computer-readable medium of claim 9 , further comprising instructions to:
perform, in sequence, a spin-coating of at least two of the functional materials that have different respective refractive indexes,
wherein each of the plurality of grating elements has a heterogeneous refractive index along a vertical direction that is substantially normal to a surface of the substrate that the plurality of grating elements is deposited on.
12. The computer-readable medium of claim 9 , wherein the substrate includes a waveguide.
13. The computer-readable medium of claim 12 , wherein the diffraction grating occupies a portion of the waveguide, and further comprising instructions to:
perform a deposition of an etch stop layer onto the portion of the waveguide prior to the performing the lithographic patterning of the resist.
14. The computer-readable medium of claim 12 , wherein the waveguide is part of a near-eye display.
15. The computer-readable medium of claim 12 , wherein the waveguide is an output waveguide.
16. The computer-readable medium of claim 9 , wherein the diffraction grating is a 2-dimensional grating.